Axis ultra xps system
The Axis Ultra XPS system is a high-performance X-ray photoelectron spectroscopy (XPS) instrument manufactured by Shimadzu. It is designed to provide comprehensive surface analysis capabilities for a wide range of materials. The Axis Ultra XPS system features advanced technology and precise control to enable detailed characterization of surface composition and chemical states.
Lab products found in correlation
11 protocols using axis ultra xps system
Hydrothermal Synthesis of Graphene Hydrogel
Electrochemical Deposition and Analysis of Pt Monolayer
Characterization of Cubic Boron Nitride Nanodiamonds
Characterization of BC, GBC, and PcS@GBC Nanocomposites
The Gaussian09 program package was used to perform the density functional theory (DFT) calculation [32 ]. The B3LYP-D3 with a 6-31G(d) basis set was used for the geometry optimization.
X-ray Photoelectron Spectroscopy Analysis
X-ray Photoelectron Spectroscopy Analysis
X-ray Photoelectron Spectroscopy Analysis
Characterization of Graphene Oxide Nanosheets
XPS and EDX Analysis of ITO Thin Films
Multimodal Characterization of Thin Films
X-ray diffraction (XRD) and X-ray reflectivity (XRR) measurements were conducted using a Rigaku Smartlab X-ray diffractometer using a Cu K-a source. For XRD measurement, annealed bi-layer samples and annealed tri-layer samples were used. A 20 nm layer of sputtered and ALD HfO 2 film were used for XRR density measurements. X-ray photoelectron spectroscopy (XPS) was performed using Kratos Axis Ultra XPS system with a monochromatic Al source at room temperature.
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