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Axis ultra xps system

Manufactured by Shimadzu

The Axis Ultra XPS system is a high-performance X-ray photoelectron spectroscopy (XPS) instrument manufactured by Shimadzu. It is designed to provide comprehensive surface analysis capabilities for a wide range of materials. The Axis Ultra XPS system features advanced technology and precise control to enable detailed characterization of surface composition and chemical states.

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11 protocols using axis ultra xps system

1

Hydrothermal Synthesis of Graphene Hydrogel

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G and GO nanosheets were obtained from the Nanjing XFNANO Materials Tech Co., Ltd., China. The single layer G was prepared by thermal exfoliation reduction and hydrogen reduction. GO was synthesized using Hummer's method. The physicochemical properties of G and GO are provided in Figures 1, 2 and S1–3. G 0.02 g was suspended in 200 ml pure water (18.2 Ω/cm) by ultrasonic apparatus running for 40 min at 400 W. Next, suspended G was placed in a light incubator maintaining 3000 Lx irradiation, 24°C temperature, and 80% humidity. The hydration was conducted for 120 days. During the hydration, pure water was complemented to keep the volume at 150–200 ml. Finally, water was evaporated and then lyophilized to collect HGR. XPS measurements were conducted using an Axis Ultra XPS system (Kratos) with a monochromatic Al Kα X-ray source (1486.6 eV). The spectra were analyzed using Casa-XPS V2.3.13 software. The peak deconvolutions were performed using Gaussian components after a Shirley background subtraction. AFM and TEM were performed on Veeco Nanoscope 4 and JEM-2010 FEF, respectively.
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2

Electrochemical Deposition and Analysis of Pt Monolayer

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A Zennium Zahner electrochemistry workstation with a QCM was used for electrochemical deposition and analysis. The Pt deposition was done using a constant voltage mode. For the Pt monolayer deposition, a pulse duration of 5 s was set for each deposition cycle, whereas on the basis of the J-t curve (Fig. 2), the effective deposition lasted for ~0.2 s. The cyclic voltammetry (CV) and Tafel analysis were conducted in a nitrogen-purged H2SO4 solution with a scan rate of 50 mV s−1. The catalysts were cycled many times by CV until a stable CV curve developed. Chronopotentiometry was carried out at a constant current density of 10 mA cm−2 for Pt monolayer/Au NF/Ni foam. A Pt sheet was used as the counter electrode, and a calomel electrode was used as the reference (sweep rate, 50 mV s−1). A Kratos Axis Ultra XPS system was used with a monochromatic Al-Kα source.
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3

Characterization of Cubic Boron Nitride Nanodiamonds

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Raman characterizations were performed using a HORIBA LabRam system equipped with a 60-mW 532-nm green laser. Scanning electron microscopy (SEM) images were acquired using a XL30-FEG system. Atomic force microscopy (AFM) images were obtained using a Veeco AFM D3100 system. Size distribution and density of c-BN NDs samples grown on Co foil were obtained using ImageJ software. X-ray photoelectron spectroscopy (XPS) was carried out using a Kratos AXIS ULTRA XPS system equipped with an Al Kα monochromatic X-ray source and a 165-mm mean radius electron energy hemispherical analyzer. X-ray diffraction (XRD) (Philips, PW1730) was performed at θ–2θ configuration and using Cu Kα radiation (λ = 1.5405 Å, 40 kV, 40 mA). Transmission electron microscopy (TEM) images were acquired using a FEI/Philips CM-30 TEM. Cross-sectional TEM samples were prepared using the focused ion beam technique. C-BN NDs sample was originally covered by a carbon layer of 26 nm, followed by an Ir layer of about 6 nm, and further protected by electron-beam and ion-beam deposited Pt layers of 41 nm and 1.5 μm, respectively.
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4

Characterization of BC, GBC, and PcS@GBC Nanocomposites

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The morphologies and compositions of pure BC, GBC, and PcS@GBC nanocomposites were monitored by field emission scanning electron microscopy (FESEM, Serion, FEI, USA) and X-ray photoelectron spectroscopy (XPS). XPS spectra of all samples were recorded on a Kratos Axis Ultra XPS system with Al (mono) Kα irradiation (hν = 1486.6 eV). The binding energy peaks of all the XPS spectra were calibrated by placing the principal C 1s binding energy peak at 284.6 eV. The functional groups of PcS, graphene, PcS–graphene mixture, and PcS–graphene nanohybrid were characterized by Fourier transform infrared spectra (FT-IR, Brucker Optics, Switzerland). Each spectrum of FT-IR was taken by 32 scans at a nominal resolution of 4 cm−1.
The Gaussian09 program package was used to perform the density functional theory (DFT) calculation [32 ]. The B3LYP-D3 with a 6-31G(d) basis set was used for the geometry optimization.
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5

X-ray Photoelectron Spectroscopy Analysis

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XPS measurements are conducted at room temperature using Kratos Axis Ultra XPS system with a monochromatic Al source.
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6

X-ray Photoelectron Spectroscopy Analysis

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XPS measurements are conducted at room temperature using Kratos Axis Ultra XPS system with a monochromatic Al source.
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7

X-ray Photoelectron Spectroscopy Analysis

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XPS measurements are conducted at room temperature using Kratos Axis Ultra XPS system with a monochromatic Al source.
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8

Characterization of Graphene Oxide Nanosheets

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GO nanosheets were obtained from Nanjing XFNANO Materials Tech Co., Ltd., China. XPS measurements were conducted using the Axis Ultra XPS system (Axis Ultra DLD, Kratos) with a monochromatic Al Kα X-ray source (1486.6 eV). The spectra were analyzed with Casa-XPS V2.3.13 software. Samples were prepared and dispersed in absolute ethanol, and atomic force microscopy (AFM) and field emission TEM measurements were then conducted on a Veeco Nanoscope 4 or JEM-2010 FEF, respectively. UV spectra were obtained using a TU-1901 spectrophotometer with UVWin5 software. The size distribution was detected through wide-angle light scattering (BI-200SM, Brookhaven). Raman spectrometry (Thermo Scientific, DXR) with a 514 nm laser was used to analyze GO structure.
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9

XPS and EDX Analysis of ITO Thin Films

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Surface elemental characterisation was performed with a Kratos Analytical Ltd. AXIS Ultra XPS system using a monochromated Al-Kα1 X-ray beam excitation source ( 1486.6eV ) in an ultra-high vacuum chamber (base pressure 10-9bar ). The relative elemental abundance across the entire depth of the ITO thin films was determined from EDX measurements with the FEI™ Talos sTEM.
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10

Multimodal Characterization of Thin Films

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Scanning transmission electron microscope (STEM) measurements were taken using a Thermo Fisher Talos F200X G2 at the University of Michigan. A 200 kV field emission gun (FEG) scanning transmission electron microscope operated. The Velox software was used for STEM images and energydispersive X-ray spectroscopy (EDS) data acquisitions. The TEM specimen was prepared using a Thermo-Fisher Helios 650 Xe Plasma Focused Ion Beam (FIB). The final beam condition was set at 12 keV and 10 pA for the polishing of the specimen.
X-ray diffraction (XRD) and X-ray reflectivity (XRR) measurements were conducted using a Rigaku Smartlab X-ray diffractometer using a Cu K-a source. For XRD measurement, annealed bi-layer samples and annealed tri-layer samples were used. A 20 nm layer of sputtered and ALD HfO 2 film were used for XRR density measurements. X-ray photoelectron spectroscopy (XPS) was performed using Kratos Axis Ultra XPS system with a monochromatic Al source at room temperature.
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