To characterize PLGA microparticles in size and morphology, scanning electron microscopy (SEM; Zeiss Sigma 500VP microscope) was used to capture images of the samples. PLGA microparticles are usually affected by the high-energy electron beam that induces heat-associated particle degradation during the imaging process. One way to overcome the particle degradation issue is to reduce the beam energy. Therefore, the SEM images were taken at a low beam energy level (1 keV). Then, MATLAB was employed to analyze the microparticle images to determine the mean size and size distribution of PLGA microparticles. The MATLAB code is designed on the Circular Hough Transform based algorithm for identifying circles in images and reporting their radius and center location.55 –57 (link) The MATLAB code was set to detect an average of 100 circles in images for each sample, report back their radius and center location, and then draw and overlay circles on the microparticles using the built-in MATLAB function viscircles. For each sample, 6–9 SEM images were used.
Sigma 500 vp microscope
Manufactured by Zeiss
Sourced in Germany, United States
The SIGMA 500 VP microscope is a versatile and high-performance electron microscope designed for advanced imaging and analysis. It features a field emission electron source, multiple imaging modes, and a range of detectors to provide detailed information about the structure and composition of materials at the nanoscale level.
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Lab products found in correlation
Drx 500 nmr spectrometer, by Bruker (1 mentions)
Chloroform, by Merck Group (1 mentions)
Cephalexin, by Merck Group (1 mentions)
Inspect s50 microscope, by Thermo Fisher Scientific (1 mentions)
V 750 uv vis spectrophotometer, by Jasco (1 mentions)
Ft ir 4600, by Jasco (1 mentions)
Fp 8300 spectrophotometer, by Jasco (1 mentions)
Miniflex powder diffractometer, by Rigaku (1 mentions)
Clotrimazole, by Merck Group (1 mentions)
4 protocols using sigma 500 vp microscope
1
Characterizing PLGA Microparticle Size and Morphology
2
Cephalexin Schiff Base Synthesis and Characterization
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Polystyrene (Mw = 250,000), cephalexin, aryl aldehydes, chloroform (CHCl3), and glacial acetic acid (AcOH) were purchased from Merck (Schnelldorf, Germany). The carbon, hydrogen, nitrogen, and sulfur content were determined on a Vario EL III elemental analyzer (Elementar Americas, Ronkonkoma, NY, USA). Fourier transform infrared (FTIR; 400–4000 cm−1) spectra were recorded on a Jasco FTIR-8400 spectrometer (Jasco, Tokyo, Japan). 1H (500 MHz) and 13C NMR (125 MHz) spectra were recorded on a Bruker DRX-500 NMR spectrometer (Bruker, Zürich, Switzerland) in deuterated dimethyl sulfoxide (DMSO-d6). UV irradiation (light intensity of 6.43 × 10−9 ein dm−3 s−1 and λmax of 365 nm) of the PS films was performed at 25 °C using an accelerated weather-meter QUV tester (Q-Panel Company, Homestead, FL, USA). The surface of cephalexin Schiff bases was examined by scanning electron microscopy (SEM) using an Inspect S50 microscope (FEI Company, Czechia, Czech Republic). Optical inspection of the PS surface was carried out using a Meiji Techno microscope (Tokyo, Japan). A SIGMA 500 VP microscope (ZEISS Microscopy, Jena, Germany) was used for field emission Scanning electron microscopy (FESEM), and a Veeco 70 instrument (Veeco Instruments Inc., Plainview, NY, USA) for the atomic force microscopy (AFM). The samples were dried using a SQ-15-VAC-16 vacuum oven (MRC Laboratory-Instruments, Essex, UK).
3
Comprehensive Material Characterization Protocol
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The phase purity of the as-prepared materials were characterized by XRD, Rigaku Miniflex powder diffractometer) with Cu Kα as radiation source (λ = 1.54 Å, 30 kV, 50 mA). The functional groups associated with the bending and stretching mode of vibration of the materials were specified by JASCO FT-IR-4600, using KBr reference. The exterior surface morphology and structural features of the materials were obtained by FESEM by using ZEISS Sigma 500 VP microscope. The internal structure and morphology of the material was explored under the TEM and HR-TEM analysis by using JEOL 2100. The XPS measurement was taken at an X-ray photoelectron spectrometer (ESCALAB 250XI) with X-ray source as nonmonochromatized Mg Kα and energy of 0.8 eV. The optical absorption measurements were recorded by JASCO-V-750 UV–Vis spectrophotometer. The PL emission spectra were recorded by applying excitation energy of 320 nm using JASCO-FP-8300 spectrophotometer. The surface area of the MgCr-LDH based samples were measured by N2 adsorption–desorption Brunauere–Emmett–Teller (BET) measurements using NOVA Quantachrome TouchWin v1 0.22. The pore size distribution and pore volume were obtained by applying the BJH model. PEC measurements of samples were carried out by potentiostat–galvanostat (IviumStat) terminal.
4
PVC Photostability with Metal Oxide NPs
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PVC (molecular weight = ca. 233,000; degree of polymerization = ca. 800) was sourced from Petkim Petrokimya (Istanbul, Turkey). Clotrimazole (98%), metal oxide NPs (98–99%), and analytical grade solvents were obtained from Merck (Gillingham, UK). The diameters of titanium oxide (TiO2), copper oxide (CuO), cobalt oxide (Co3O4), chromium oxide (Cr2O3), and nickel oxide (NiO) were 15, 56, 15,50, and 31 nm, respectively. IR spectra were recorded on an FTIR Shimadzu 8400 spectrophotometer (Tokyo, Japan). The films were irradiated using UV light (λmax = 313 nm; light intensity = 6.2 × 10−9 Einstein dm−3 × s−1) at 25 °C using an accelerated weather tester (Q-Panel Company; Homestead, FL, USA). The tester has two fluorescent lamps (40 watts) on the sides and the films were placed at a distance of 10 cm from the sources and oriented parallel to the lamps. To ensure uniform irradiation, the polymeric materials were rotated regularly. Optical images of the surface of PVC films were recorded on a Meiji Techno microscope (Tokyo, Japan). A SIGMA 500 VP microscope (Carl Zeiss Microscopy; White Plains, NY, USA) was used to record the scanning electron microscopy (SEM) images and the energy dispersive X-ray (EDX) maps of the films. A Veeco instrument (Plainview, NY, USA) was used to obtain the atomic force microscopy (AFM) images.
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