We carried out powder XRD (Miniflex 600, Rigaku), Raman spectroscopy (iXR raman in Nexsa XPS system, Thermo Scientific, Korea Basic Science Institute-Jeonju Center), XPS (Nexsa XPS system, Thermo Scientific, Korea Basic Science Institute-Jeonju Center), and field-emission scanning electron microscopy (FE-SEM, Gemini SEM 300, ZEISS, Jena, Germany) analyses. In addition, the BET surface area of the samples was measured using nitrogen adsorption/desorption measurements (Belsorp mini X, MicrotracBEL Corp., Osaka, Japan). To confirm the deposition of the HQ-RMs, we performed Fourier transform infrared spectroscopy (FT-IR, TENSOR27, Bruker, NCIRF, Seoul National University-National Center for Inter-University Research Facilities, Billerica, MA, USA) analysis. The electrochemical capacitive behavior of the as-prepared MSCs was estimated using a potentiostat (PGSTAT302N, Metrohm, Autolab). The specific capacitance of the carbon electrodes was calculated by the GCD discharge curves. The specific areal capacitance was calculated by the discharge time and current density (mA/unit area), and the calculated specific areal capacitance was divided by the electrode thickness to evaluate the specific volumetric capacitance of the samples.
Nexsa xps system
Manufactured by Thermo Fisher Scientific
Sourced in United States, United Kingdom, Germany
The Nexsa XPS system is a state-of-the-art surface analysis instrument manufactured by Thermo Fisher Scientific. It is designed to perform X-ray Photoelectron Spectroscopy (XPS) analysis, which is a powerful technique for studying the chemical composition and electronic structure of materials at the surface level. The Nexsa XPS system offers high-performance analysis capabilities, including advanced imaging and depth profiling, to provide users with comprehensive surface characterization data.
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Lab products found in correlation
S 4800, by Hitachi (2 mentions)
Avantage data system software, by Thermo Fisher Scientific (1 mentions)
Nova nanosem 450, by Thermo Fisher Scientific (1 mentions)
Hr evolution raman spectrometer, by Horiba (1 mentions)
Tecnai g2 t20 s twin, by Thermo Fisher Scientific (1 mentions)
Uv 2600, by Shimadzu (1 mentions)
Smartlab diffractometer, by Rigaku (1 mentions)
Nicolet magna 560 ftir spectrometer, by Thermo Fisher Scientific (1 mentions)
Ultima 4 x ray diffractometer, by Rigaku (1 mentions)
Quanta 3d feg, by Thermo Fisher Scientific (1 mentions)
Jem 2100f, by JEOL (1 mentions)
Geminisem 300, by Zeiss (1 mentions)
Miniflex 600, by Rigaku (1 mentions)
Tensor 27, by Bruker (1 mentions)
Pgstat302n, by Metrohm (1 mentions)
Chirascan cd spectrometer, by Applied Photophysics (1 mentions)
Uv 1650pc, by Shimadzu (1 mentions)
Cs 1000, by Konica Minolta (1 mentions)
D max 2200 pc, by Rigaku (1 mentions)
Ls 100, by Konica Minolta (1 mentions)
14 protocols using nexsa xps system
1
Comprehensive Material Characterization of MSCs
2
Phase Composition Analysis of Catalysts
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The phase composition of immobilized catalysts before and after the use was carried out by a NEXSA XPS system (Thermo Fisher Scientific, East Grinstead, UK) with a monochromatized Al Kα source (400 μm diameter).
3
Teic Functionalization of Titanium Surfaces
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In parallel with the studies conducted above, Ti discs were exposed to 500 µg/ml solution of Teic in 50 mM MES, pH 5.47 and left, under ambient conditions from 30 min up to 3 h. To analyse elements on the surface of Ti and functionalised samples, XPS spectra were taken by using NEXSA XPS system (ThermoFisher, Waltham, MA, US). A monochromatic X-ray source (Al-Kα) beam was used for the data collection. The calculation of the atomic percentages was performed using Avantage Data System software (ThermoFisher, Waltham, MA, US).
4
Comprehensive Characterization of ReS2 Thin Films
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The microstructural characterization was carried out by using a field emission scanning electron microscope (FESEM)-FEI (now Thermo Fisher Scientific) – Nova NanoSEM 450 and high-resolution transmission electron microscope (HRTEM) – Tecnai G2 T20 S-TWIN, FEI (now Thermo Fisher Scientific) operated at 200 kV. The TEM sample was prepared by directly drop casting the extensively sonicated suspended solution of the ReS2 grown on Si/SiO2 substrate in acetone on a 3 mm carbon-coated copper grid. The crystal structure and phase purity of ReS2 were analyzed by using X-ray diffraction (Rigaku SmartLab diffractometer). A Horiba HR-Evolution Raman spectrometer was used to record the Raman and photoluminescence spectra. A Thermo Scientific Nexsa XPS System was used to detect the elemental composition, chemical state and electronic state of the elements present in the material. The optical absorption characteristics of the as-grown ReS2 on Si/SiO2 substrate was evaluated from diffuse reflectance spectroscopy (DRS) using a UV-Vis spectrophotometer (SHIMADZU-UV 2600) after calibrating it with a cleaned Si/SiO2 substrate as the reference.
5
Comprehensive Characterization of Photocatalytic Materials
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Crystalline nature, phase composition, and phase identification were conducted using a Rigaku Ultima IV X-ray diffractometer (Tokyo, Japan) using Cu Kα radiation (λ = 1.54051 Å) operated at 40 mA current and 40 kV voltage. The Fourier transform infrared (FT-IR) spectrum was carried out in a KBr dispersion in the range of 4000–400 cm−1 using a Nicolet Magna-560 FT-IR spectrometer (Thermo, Waltham, MA, USA). The band gap energy (Eg) of the samples was identified using V670 UV-Vis diffuse reflectance spectroscopy (Jasco, Tokyo, Japan). Field Emission Scanning Electron Microscope (FE-SEM) equipped with energy-dispersive X-ray spectroscopy (EDS) was used to determine the images and elemental composition of the samples (Hitachi S-4800, Tokyo, Japan). A Horiba system (FL3-22-1551C-3012-FL, Kyoto, Japan) was employed to record the photoluminescence (PL) spectra of the photocatalysts. X-ray photoelectron spectroscopy (XPS) was performed using the Nexsa XPS system (ThermoFisher Scientific, Abingdon, UK). TOC-SSM5000A and TOC-VCPH analyzers from Shimadzu (Kyoto, Japan) were used for the determination of organic carbon (TOC) in solid and liquid samples, respectively.
6
XPS Analysis of Cured and Recycled Compounds
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X-ray photoelectron spectroscopy (XPS) analysis of CR, cured compounds and recycled compounds was carried out using the Thermo Scientific Nexsa XPS System. The analysis method consisted of using a laser spot size of 100 µm for each acquisition, and each sample was subject to ion beam etching for 30 s, using ion energy of 2000 eV in cluster mode. For each sample a survey scan was performed in the binding energy range of −10 to 1350 eV, with a step size of 1 eV, acquiring 10 scans with a dwell time of 10 ms. Subsequently, a high resolution element spectra for sulfur, oxygen, magnesium, carbon and chlorine was recorded with a 0.1 eV energy step size and pass energy of 50 eV, by performing 10 scans with a dwell time of 50 ms. The survey spectra interpretation was performed using Avantage software. Multipeak analyzing method was used to perform deconvolution of the high resolution spectra and peak identification was conducted by comparing the experimental values to the literature [24 ].
7
Micro-Raman Spectroscopy of Ge-MoS2 Heterojunction
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Micro-Raman spectroscopy of the Ge-MoS2 heterojunction was performed using a LabRAM HR Raman system with a spatial resolution of 1 μm and excitation wavelength of 532 nm. The sample for the lateral TEM analysis was prepared using a focused ion beam system (Quanta 3D FEG, FEI). TEM was performed using a high-resolution TEM (JEM-2100F, JEOL) with an operating voltage of 200 kV. XPS was performed using a Nexsa XPS system (Thermo Fisher Scientific) with an Al Kα source (1486.6 eV) operating at 300 W. The base pressure of the XPS system was 5.0 × 10−9 mbar. The spot size of the x-ray was 100 μm. Every scan of the data was repeated 10 times to obtain a precise peak position. The high-resolution spectra of the C 1s, Mo 3d3/2, Mo 3d5/2, and Ge 3d peaks were collected in steps of 0.1 eV with a pass energy of 20 eV.
8
Characterization of Nanoparticles by Advanced Techniques
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TEM images were recorded on a JOEL
JEM-F200 Cold-FEG S/TEM operating at an acceleration voltage of 200
kV. Nanoparticles dispersed in DI water were diluted with ethanol
before being drop-cast on holey carbon/Cu TEM grids. XRD spectra were
recorded in a Panalytical Xpert Pro diffractometer with a Cu Kα
radiation source (1.5418 Å). XPS measurements were carried out
with a Thermo Scientific NEXSA XPS system equipped with an Al Kα
X-ray source. UV–vis absorbance measurements were carried out
on a PerkinElmer LAMBDa 35 V-Vis spectrometer. CD measurements were
carried out with a Chirascan CD spectrometer from Applied Photophysics.
JEM-F200 Cold-FEG S/TEM operating at an acceleration voltage of 200
kV. Nanoparticles dispersed in DI water were diluted with ethanol
before being drop-cast on holey carbon/Cu TEM grids. XRD spectra were
recorded in a Panalytical Xpert Pro diffractometer with a Cu Kα
radiation source (1.5418 Å). XPS measurements were carried out
with a Thermo Scientific NEXSA XPS system equipped with an Al Kα
X-ray source. UV–vis absorbance measurements were carried out
on a PerkinElmer LAMBDa 35 V-Vis spectrometer. CD measurements were
carried out with a Chirascan CD spectrometer from Applied Photophysics.
9
Characterization of ZnMgO Nanoparticles for Optoelectronic Applications
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X-ray diffraction (XRD; D/Max-2200pc; Rigaku, Tokyo, Japan) was used to confirm the formation of the ZnMgO NP-based ETLs (comprising ZnO NPs, Zn.9Mg0.1O NPs, or ZnMgO NPs with an A/B core/shell structure), with Cu-Kα radiation applied to the centrifuged ZnMgO NPs. Field-emission transmission electron microscopy (FE-TEM) (Tecnai F30 S-Twin; JEOL Ltd., Tokyo, Japan) was used to determine the actual particle size of the ZnMgO-based ETLs. XPS measurements were conducted using a Nexsa XPS system (ThermoFisher Scientific, Waltham, MA, USA) and UPS analysis with a He (I) 21.22-eV gas discharge lamp, to characterize the O 1s level and valence band maximum (VBM) of the ZnMgO-based ETL thin films, respectively. The transmittance and reflectance were measured using a spectrophotometer (UV-1650PC; Shimadzu Corp., Kyoto, Japan), with normally incident monochromatic light at the sample surface side. Current density–voltage–luminance (J–V–L) was evaluated using a computer-controlled source meter (2400; Keithley Instruments, Cleveland, OH, USA) and luminance meter (LS100; Konica Minolta, Tokyo, Japan). Electroluminescence (EL) spectra were recorded using a spectroradiometer (CS1000; Konica Minolta).
10
XPS Analysis of Activated Carbon Surfaces
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The elemental surface composition of activated carbon samples was analyzed with x-ray photoelectron spectroscopy (XPS) Nexsa XPS system (Thermo-Scientific, Massachusetts, USA) using Al Kα radiation operating at 72 W (beam diameter 400 µm) and an integrated flood gun. “Standard Lens Mode”, CAE analyzer Mode, a dwell time of 10 ms, pass energy of 200 eV, and an energy step size of 1 eV were used for the survey spectra. The surface of the specimens was cleaned by sputtering for 60 s with Ar-clusters (1000 atoms, 6000 eV, 1 mm raster size) prior to analysis. High-resolution spectra of C, O, N, and K were recorded with 50 passes at a pass energy of 50 eV, a dwell time of 50 ms and an energy step size of 0.1 eV. Quantification and analysis were executed with the software Thermo Avantage (v5.9914, Build 06617) using Smart background.
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