X-ray diffraction patterns were recorded using Advance D8 system with CuKα radiation instrument (Bruker, USA). The recording spectral range was set at 0–60° (2θ) using the Cu-target X-ray tube and Xe-filled detector.
D8 advance system
Manufactured by Bruker
Sourced in Germany, United States
The D8 Advance system is a X-ray diffractometer designed for high-performance powder and thin-film analysis. It features advanced optics and a robust design to provide reliable and accurate measurements.
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Lab products found in correlation
Uv 3600, by Shimadzu (2 mentions)
Jsm 7100f, by JEOL (2 mentions)
Mira3, by TESCAN (1 mentions)
Mfp 3d, by Oxford Instruments (1 mentions)
Scanning electron microscope, by JEOL (1 mentions)
Phi 5802, by Physical Electronics (1 mentions)
Tecnai g2 f20, by Thermo Fisher Scientific (1 mentions)
S 4800, by Thermo Fisher Scientific (1 mentions)
Phi 5600, by PerkinElmer (1 mentions)
U 3900h spectrophotometer, by Hitachi (1 mentions)
Fls100, by Edinburgh Instruments (1 mentions)
Zetasizer nano s90, by Malvern Panalytical (1 mentions)
Jem arm200f, by JEOL (1 mentions)
Jem 3010, by JEOL (1 mentions)
Sigma 300 system, by Zeiss (1 mentions)
Quantum 2000 scanning esca microprobe, by Physical Electronics (1 mentions)
Davinci design, by Bruker (1 mentions)
Escalab 250xi xps instrument, by Thermo Fisher Scientific (1 mentions)
Su3500, by Techcomp (1 mentions)
Nicolet is50 spectrometer, by Thermo Fisher Scientific (1 mentions)
14 protocols using d8 advance system
1
X-ray Diffraction Protocol for Material Analysis
2
Characterization of Pristine C60 Fullerene
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The morphology image of pristine C60 was obtained by a field emission SEM (TESCAN MIRA3, accelerating voltage: 15 kV). Powder XRD data for pristine C60 were collected on Bruker Advance D8 system with Cu Kα radiation (λ = 1.5418 Å). TEM images were acquired using Cs‐corrected Environmental TEM operated at 80 kV. Other characterization details are provided in Supporting Information.
3
In Situ Characterization of Catalysts
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Different tailor-made cells were customized for different in situ characterizations. For all in situ characterization techniques, a graphite rod was used as the counter electrode, and Ag/AgCl/saturated KCl was used as the reference electrode. N2- or Ar-saturated LiCl solutions with different concentrations were used as the electrolyte. The electrolyte was continuously bubbled with N2 at a flow rate of 30 sccm using a mass flow controller. For in situ FTIR measurements, a glassy carbon electrode coated with the catalyst was used as the working electrode. The in situ FTIR spectra were recorded by FTIR spectroscopy (NEXUS-870, Nicolet Instrument Co., USA). For in situ Raman and in situ XRD measurements, carbon paper coated with the catalyst was used as the working electrode. In situ XRD spectra were acquired using a Bruker D8 Advance system (Germany). In situ Raman spectra were recorded on a Horiba Jobin Yvon HR evolution instrument (France).
4
Synthesis and Characterization of Pb3Bi2S2 Thin Films
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Pd Bi S thin films were grown on a Si(111) substrate using pulsed laser deposition ( KrF excimer , = 248 nm) in Argon atmosphere. A polycrystalline target was prepared by the solid state reaction of stoichiometric amounts of high purity starting materials in a vacuum sealed quartz tube. The laser ablation was performed on the polycrystalline target under the growth conditions of 1.8 J/cm laser fluence at low repetition rate of 1 Hz36 (link). The as-grown PBS thin-films (S0) were post annealed for 30 min in Argon atmosphere at C (S1) and C (S2). An x-ray diffractometer (Bruker D8 Advance system with Cu-K radiation) was used to determine the crystallographic phase of PBS thin-films. The stoichiometry of PBS thin films was confirmed using energy dispersive spectroscopy in a scanning electron microscope from JEOL. The surface morphology and average film thickness were measured using an atomic force microscope (AFM) from Asylum Research (model:MFP3D). The longitudinal and Hall resistances were measured in a Quantum Design Physical Property Measurement System (PPMS-ECII) equipped with a 9 T magnet.
5
Characterization of Electrode Morphology
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The morphologies of pristine and cycled electrodes were observed by a field emission scanning electron microscope (FE-SEM, HITACHS4800) equipped with an argon (Ar)-filled box, which could protect samples from air. The nitrogen adsorption and desorption isotherms were collected by the Brunauer–Emmett–Teller method at 77 K with Micromeritcs ASAP 2020 analyzer and the corresponding pore size distributions were calculated based on the Barrett-Joyner-Halenda model. X-ray photoelectron spectroscopy (XPS, Physical Electronics PHI5802) measurements were conducted to analyze the surface chemical components of electrode. X-ray diffraction (XRD) patterns of sacrificial cathode agents were tested using the Bruker D8 Advance system using Cu Kα radiation (λ = 0.154 nm).
6
Comprehensive Material Characterization Protocol
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The morphologies and the corresponding elemental maps of the samples were characterized on the Hitachi S-4800 scanning electron microscope (SEM) and FEI Tecnai G2 F20 transmission electron microscope (TEM). X-ray diffraction (XRD, Bruker D8 Advance system, Cu-Kα, λ = 1.5418 Å) was used to identify the crystal phase of the samples. The chemical elements and bonding characterizations were analyzed on an X-ray photoelectron spectroscopy (XPS, PerkinElmer model PHI 5600). The thermogravimetric analysis (TGA) curves were surveyed on a STA499F5 analyzer. The nitrogen adsorption/desorption isotherms and surface areas were conducted by Brunauer–Emmett–Teller analysis on a physical & chemical adsorption system (ASAP 2460) at the constant temperature of 77 K. The ultraviolet-visible (UV-vis) absorption test was recorded on the U-3900H spectrophotometer (Hitachi, Japan). The optical images were taken using a Sony camera.
7
Characterization of Upconversion Nanoparticles
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Particle sizes of a series of UCNPs were determined by dynamic light scattering (DLS) (Zetasizer Nano-S90, Malvern Instruments Ltd., Worcestershire, UK) at a 90° scattering angle, and particle sizes (mean ± sd) of representative UCNPs from TEM images were also calculated using OriginPro® software (OriginLab®). Irradiation by an 808 nm laser (Laserlab CO, Gyeonggi-do, R. O. Korea) was used to identify the fluorescence emission of UCNPs. Morphology of Core@shell UCNPs was examined by ultrahigh-resolution analytical electron microscopy (HR-TEM) (JEM-3010, JEOL Ltd., Tokyo, Japan). Element composition of materials was captured by TEM and energy dispersive X-ray spectroscopy (EDS; JEM-ARM200F, JEOL Ltd., Tokyo, Japan). Crystal structures of core and core@shell nanoparticles were confirmed by X-ray powder diffraction (XRD) using a D8 ADVANCE system with Davinci (Bruker AXS GmbH, Karlsruhe, Germany) equipped with Cu Ka radiation and a high speed LynxEye detector. Samples were analyzed over the 2θ range of 5–65° with 0.02° increments at a rate of 6°/min. Upconversion emission spectra were collected over the range of 380–780 nm using a photoluminescence spectrophotometer (FLS100, Edinburgh Instruments, UK) at the 808 nm excitation wavelength.
8
Comprehensive Materials Characterization Protocol
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FT-IR (Fourier transform infrared) spectra were recorded on a PerkinElmer 1710 spectrometer (KBr disc) in the wavenumber range of 400–4000 cm−1. XRD (X-ray diffraction) patterns were recorded on a Bruker D8 Advance system using Cu Kα radiation with 2θ = 5°–80°. XPS (X-ray photoelectron spectroscopy) analysis was conducted on a Physical Electronics Quantum 2000 Scanning ESCA Microprobe (Mono Al-Kα, hν = 1486.6 eV). The pass energy of the full-spectrum scan was 100 eV, and the pass energy of the narrow-spectrum scan was 60 eV. The XPS spectra were calibrated based on the surface contamination C 1s (284.8 eV). The residual Hf in the reaction liquid was tested by ICP-OES (inductively coupled plasma optical emission spectroscopy, Agilent 720). SEM (scanning electron microscopy) images were obtained using a ZEISS SIGMA300 system. The powder samples were bonded on conductive adhesive for the SEM measurements. HR-TEM (high-resolution transmission electron microscopy) images were obtained using an FEI TALOS F200C system, with a resolution of 0.16 nm. The TEM samples were dispersed in absolute ethanol after ultrasonic vibration and deposited on a carbon-coated copper grid.
9
Comprehensive Material Characterization Protocol
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Film X-ray diffraction (XRD) (Bruker D8 Advance system) measurement was performed using Cu Kα radiation (λ = 1.5416 Å) with a 40 kV beam voltage and a 30 mA beam current. Scanning electron microscopy (SEM) was performed using a JEOL, JSM-7100F instrument. The transmittance and absorbance (ABS) characteristics were recorded using a UV–Vis-near-infrared (NIR) spectrometer (UV-3600, Shimadzu) in the wavelength range of 300–900 nm with an integrated sphere attachment. The photoluminescence (PL) was measured by using a FluroMate (FS-2) fluorescence Sperctrometer. The photovoltaic performance (SUN 2000) was achieved using a xenon lamp under an AM 1.5 filter at 100 mW/cm2 illuminations in open circuit conditions. The resistances of the PSCs were obtained using the Iviumsoft program. Electrochemical impedance spectroscopy (EIS) was performed in a frequency range from 1 MHz to 100 mHz using a SUN 2000 Instrument under an alternating current voltage with a perturbation amplitude of 10 mV was applied in the EIS measurements.
10
Wide-Angle X-Ray Diffraction Analysis
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A diffractometer of Bruker’s
″DAVINCI design″, the D8 ADVANCE system, was used to
capture wide-angle X-ray diffractograms. A copper source was used
to generate X-rays (Cu-Kα radiation; 1.5604 Å). The sample
was scanned in the range of 5-80o 2θ with a continuous
scanning rate of 5° 2θ/min.
″DAVINCI design″, the D8 ADVANCE system, was used to
capture wide-angle X-ray diffractograms. A copper source was used
to generate X-rays (Cu-Kα radiation; 1.5604 Å). The sample
was scanned in the range of 5-80o 2θ with a continuous
scanning rate of 5° 2θ/min.
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