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6 protocols using agilent cary 5000 uv vis nir spectrophotometer

1

Comprehensive Material Characterization Protocol

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The D8 advance X-ray diffractometer of Brooke spectroscopic instrument company, Germany, using a radiation source Cu (Kα = 1.54178 nm, 40 kV and 15 mA) with a scanning rate of 10 (°) min−1, continuous scanning mode, wide-angle scanning range is 5–90° and small-angle scanning range is 0.5–8.0°. Autosorb-IQ2-MP automatic physical static analyzer of Cantor instrument company, the liquid nitrogen temperature is 77 K. SU8010 field emission scanning electron microscope of Hitachi company, Japan, with accelerating voltage of 15 kV and working distance of WD = 4 mm, JEM-2100F high resolution transmission electron microscope of Japan Electronics Co., Ltd., accelerating voltage 200 kV. Inductively coupled plasma emission spectra of Optima 8000 produced by Perkin Elmer company, USA, with wavelengths of 160 nm–190 nm. Agilent Cary 5000 UV Vis NIR spectrophotometer, Agilent Technologies, USA.
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2

Characterization of Nanowire Arrays

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The morphology and size distribution of the products were characterized by a LEO-1530 field-emission SEM (Carl Zeiss AG, Oberkochen, Germany) with an accelerating voltage of 20.0 kV. Chemical composition of the specimens was analyzed using an EDS as attached on the SEM. Structural quality of the nanowire arrays was evaluated by an X’Pert PRO XRD (PANalytical Instruments, Almelo, Netherlands) with Cu Kα radiation (λ = 1.54056 Å). The PL spectra of the samples were collected on a Hitachi F-7000 fluorescence spectrophotometer (Hitachi, Tokyo, Japan) with an excitation wavelength of 325 nm. Optical reflectance measurements were performed on an Agilent Cary-5000 UV-vis-NIR spectrophotometer (Agilent Technologies, Sta. Clara, CA, USA). All the measurements were carried out at room temperature in normal conditions.
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3

Multimodal Characterization of Nanomaterials

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Absorption spectra were obtained using an Agilent Cary 5000 UV-Vis-NIR spectrophotometer (Agilent). Fluorescence and photoluminescence excitation spectroscopy were obtained with a Horiba NanoLog spectrofluorometer (Horiba). TEM images were acquired using a JEOL 2010 LaB6 high-resolution microscope (JEOL). ICP-OES was performed using a PerkinElmer Optima 2000DV instrument (PerkinElmer). Single-particle fluorescence microscopy was performed using a Zeiss Axio Observer.Z1 inverted microscope (Zeiss) with a 100 × , 1.45 NA Plan-Fluar objective with halogen lamp illumination. In vitro multiphoton fluorescence measurements were performed using a Zeiss 710 confocal scanning Axio Observer.Z1 inverted microscope (Zeiss) with a 10 × , 0.30 NA Plan-Neofluar objective with tunable Mai-Tai Ti-Sapphire laser excitation. Additional details are provided in Supplementary Note 5.
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4

Characterizing Transparent Conductive Films

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The sheet resistances
of the TCFs were measured using a four-point probe (Jandel Engineering
Ltd., U.K., tip radius 250 μm, tip spacing 1 mm, loading 60
g) connected to a multimeter (HP 3458, Hewlett Packard), and UV–vis–NIR
absorption spectra were measured using an Agilent Cary 5000 UV–vis–NIR
spectrophotometer (Agilent Technologies, Inc.). The deposited TCFs
on the borosilicate glass were hole doped28 (link) by drop-casting nitric acid (HNO3, 70%, ACS reagent grade)
on the film, waiting for 60 s, and washing the film with deionized
water. The deposited TCFs on a borosilicate glass were hole doped
using a 16 mM solution of gold(III) chloride29 (link) (AuCl3, ≥99.99%, Sigma-Aldrich) in acetonitrile
(99.999%, Sigma-Aldrich). The solution was drop-casted on the film,
left in place for 5 min, and washed off with acetonitrile.
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5

Multimodal Characterization of Novel Materials

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PANalytical X’Pert Pro X-ray diffractometer (Malvern Panalytical Ltd., Malvern, UK) with a Cu–Kα radiation at range from 10° to 60° (exposure time of 2 h) was applied to determine structure and crystallinity. The obtained diffraction patterns were juxtaposed with standards from the Inorganic Crystal Structure Database (ICSD). Fourier-transform infrared spectroscopy (FTIR, Biorad 575C spectrophotometer, Hercules, CA, USA) in a frequency range of 4000–400 cm−1 was used to determine the functional groups of the obtained materials. This was performed using independent replicates. The UV–Vis spectra were recorded on an Agilent Cary 5000 UV–Vis-NIR spectrophotometer (Agilent Technologies, Santa Clara, CA, USA) with a spectral bandwidth of 1 nm in the range of 200 to 800 nm (50,000–12,500 cm−1). The morphology, element concentration, and mapping were performed using a scanning electron microscope (SEM, FEI Nova NanoSEM 230, Hillsboro, OR, USA) with an energy-dispersive X-ray spectrometer (EDS, Genesis XM4, Austin, TX, USA). The EDS spectra were recorded three times for each sample and the calculated value was an average result.
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6

Spectroscopic Characterization of Transparent and Opaque Samples

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Ultra-violet and Visible spectroscopy was carried out both in transmittance and reflectance modes, given that both transparent and opaque samples were under study. Spectra obtained in transmittance mode were collected using an Agilent Cary 5000 UV-Vis-NIR spectrophotometer (Agilent Technologies, Santa Clara, CA, USA), version 1.12, in a spectral range from 250–800 nm, at a scan rate of 600 nm/min, data interval of 1 nm and acquisition average time of 0.1 s. PMMA samples were placed in a specially designed holder (to ensure analysis was always performed in the same area) and analyzed in 0° angle (perpendicular to the light beam). Spectra obtained in reflectance mode were collected in a Shimadzu UV2501PC spectrophotometer (Kyoto, Japan) equipped with an integrating sphere, in a spectral range from 240–900 nm, at very slow option scan rate, and data interval of 1 nm. BaSO4 was used as reference sample. All spectra were collected as absorption (Abs) spectra.
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