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Benzoic acid

Manufactured by Fujifilm
Sourced in Japan

Benzoic acid is a white crystalline solid that is commonly used as a preservative and antimicrobial agent in various industries. It has a chemical formula of C6H5COOH and a melting point of 122.4°C. Benzoic acid is a versatile compound that can be utilized in various applications, including food, pharmaceuticals, and personal care products.

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4 protocols using benzoic acid

1

Catalytic valorization of biomass-derived compounds

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d(+)‐glucose (98 %, Kishida), d(−)‐fructose (99 %, Wako), d(+)‐mannose (99 %, Wako), d(+)‐xylose (99 %, Wako), dl‐glycelaldehyde (>90 %, Sigma‐Aldrich), glycolic acid (97 %, Wako), formic acid (98 %, Wako), hydrogen peroxide (30 %, Wako), and benzoic acid (99.5 %, Wako) were used for the reactions and the analysis. Calcium oxide (CaO, 99.9 %, Wako), hydroxide (Ca(OH)2, 90 %, Kishida), carbonate (CaCO3, 99.95 %, Wako), and phosphate (Ca3(PO4)2, 98 %, Wako) were used as catalysts. Other metal oxides, MgO (99.9 %, Wako), SrO (95 %, Kishida), BaO (90 %, Wako), Sc2O3 (99.9 %, Kojundo), Y2O3 (99.99 %, Wako), La2O3 (99.99 %, Wako), CeO2 (99.9 %, Wako), TiO2 (anatase, 98.5 %, Wako), Nb2O5 (99.9 %, Kojundo), Ta2O5 (99.9 %, Wako), Cr2O3 (Wako), SnO2 (98 %, Wako) and ZnO (99.9 %, Wako) were also used as catalysts. Mg‐Al hydrotalcite (Mg/Al=3) was prepared by a conventional coprecipitation method[39] using Mg(NO3)2 ⋅ 6H2O (99 %, Wako), Al(NO3)3 ⋅ 9H2O (98 %, Wako), Na2CO3 (99.5 %, Kishida) and NaOH (98 %, Kishida).
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2

Synthesis of MoS2 Nanostructures

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All chemicals were analytical grade and used without further purification. Thiourea (CSN2H4, extra pure AR 99%, SRL), hexaammonium heptamolybdate tetrahydrate (NH4)6Mo7O24·4H2O, (extrapure AR 99%, SRL), hydrochloric acid (HCl, 37%, SRL), sodium hydroxide (NaOH, 97%, SRL), potassium persulphate (K2S2O8, 97%, WAKO) and benzoic acid (C7H6O2, 99.5%, WAKO).
In a typical synthesis, 0.8 mol CSN2H4 and 0.02 mol (NH4)6Mo7O24·4H2O were dissolved in 72 mL of deionized water and stirred for 2 h. After the pH of the solution was adjusted to 5, the solution was transferred to a Teflon-lined stainless steel autoclave and maintained at 180 °C for 24 h. Then, the autoclave was cooled to room temperature and the obtained solution was centrifuged with water and ethanol. Finally, the resultant black precipitate was dried at 60 °C for 24 h. For the synthesis of MoS2 with different pH value, the initial pH of the reaction solution was adjusted to 1, 3, 11, and 13 by adding 4 M of HCl and 1.6 M of NaOH. The resultant samples were termed as S1, S2, S3, S4 and S5 for pH values 1, 3, 5, 11 and 13 respectively.
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3

Analytical Determination of Pesticides and Metabolites

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Cadusafos (S, S‐di‐sec‐butyl O‐ethyl phosphorodithioate, purity 99.8%), prothiofos [(2,4‐dichlorophenoxy)‐ethoxy‐propylsulfanyl‐sulfanylidene‐λ5‐phosphane, purity 99.3%], 2,4‐dichlorophenol (100 µg/mL in MeOH), glyphosate (5.0 mg/mL in H2O), diazinon (purity 99.6%), benzoic acid (purity 99.5%), ultrapure water, acetonitrile, and formic acid of analytical grade were purchased from FUJIFILM Wako Pure Chemical Corporation. 4‐Nitrophenol (purity 100%) was purchased from Sigma‐Aldrich, and 4‐nitro‐m‐cresol (purity 98.0%) was purchased from Tokyo Chemical Industry Co., Ltd. 3,4,5‐Trihydroxy‐6‐(2,4‐dichlorophenoxy) oxane‐2‐carboxylic acid (purity 99.9%), (2,4‐dichlorophenyl) hydrogen sulfate (purity 99.9%), and 2‐methylsulfonylbutane (purity 99.9%) were synthesized by Hayashi Pure Chemical Ind., Ltd. PierceTM LTQ Velos electrospray ionization (ESI)‐positive ion calibration solution and PierceTM ESI‐negative ion calibration solution were purchased from Thermo Fisher Scientific Co., Ltd.
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4

Purification of Ionic Liquids and Organic Compounds

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1-Ethyl-3-methylimidazolium bis(trifluoromethanesulfonyl)amide ([C2mim][NTf2]; Tokyo Chemical Industry Co., Japan), benzoic acid (Wako Chemicals, Osaka, Japan), and bis(trifluoromethanesulfonyl)amide acid (HNTf2; Kanto Chemical, Japan)) were used as received. 1-propylimidazole (C3im; Tokyo Chemical Industry Co., Japan) and m-cresol (Kanto Chemical, Hiratsuka, Kanagawa, Japan) were distilled prior to use to eliminate impurities. Bis[4-(3-aminophenoxy)-phenyl]sulfone (3BAPPS; Tokyo Chemical Industry Co., Tokyo, Japan) was recrystallized with an ethanol/water mixture prior to use. 1,4,5,8-Naphthalene-tetracarboxylic dianhydride (NTDA; Sigma-Aldrich, St. Louis, MO, USA) was dispersed in dimethylformamide (DMF), followed by refluxing at 60 °C for 1 day to remove impurities miscible in DMF. The resulting solid was washed several times with acetone and vacuum-dried. 2,2-Benzidinedisulfonic acid (BDSA; Tokyo Chemical Industry Co., Tokyo, Japan) was dissolved in aqueous solution with an excess amount of triethylamine. The resulting solid impurities were removed by filtration. 1 M H2SO4 aqueous solution was successively added to the solution and pure BDSA precipitated as a white solid. The obtained white solid was washed several times with water and vacuum-dried.
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