Mg no3 2
Manufactured by Fujifilm
Mg(NO3)2 is a chemical compound consisting of magnesium and nitrate ions. It is a white, crystalline solid that is commonly used in various laboratory applications. The core function of Mg(NO3)2 is to serve as a source of magnesium and nitrate ions in chemical reactions and analyses.
Automatically generated - may contain errors
Lab products found in correlation
Hydrogen peroxide, by Fujifilm (1 mentions)
Glycolic acid, by Fujifilm (1 mentions)
Benzoic acid, by Fujifilm (1 mentions)
Formic acid, by Fujifilm (1 mentions)
D mannose, by Fujifilm (1 mentions)
Al no3 3, by Fujifilm (1 mentions)
D fructose, by Fujifilm (1 mentions)
D xylose, by Fujifilm (1 mentions)
2 protocols using mg no3 2
1
Catalytic valorization of biomass-derived compounds
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d (+)‐glucose (98 %, Kishida), d (−)‐fructose (99 %, Wako), d (+)‐mannose (99 %, Wako), d (+)‐xylose (99 %, Wako), dl ‐glycelaldehyde (>90 %, Sigma‐Aldrich), glycolic acid (97 %, Wako), formic acid (98 %, Wako), hydrogen peroxide (30 %, Wako), and benzoic acid (99.5 %, Wako) were used for the reactions and the analysis. Calcium oxide (CaO, 99.9 %, Wako), hydroxide (Ca(OH)2, 90 %, Kishida), carbonate (CaCO3, 99.95 %, Wako), and phosphate (Ca3(PO4)2, 98 %, Wako) were used as catalysts. Other metal oxides, MgO (99.9 %, Wako), SrO (95 %, Kishida), BaO (90 %, Wako), Sc2O3 (99.9 %, Kojundo), Y2O3 (99.99 %, Wako), La2O3 (99.99 %, Wako), CeO2 (99.9 %, Wako), TiO2 (anatase, 98.5 %, Wako), Nb2O5 (99.9 %, Kojundo), Ta2O5 (99.9 %, Wako), Cr2O3 (Wako), SnO2 (98 %, Wako) and ZnO (99.9 %, Wako) were also used as catalysts. Mg‐Al hydrotalcite (Mg/Al=3) was prepared by a conventional coprecipitation method[39] using Mg(NO3)2 ⋅ 6H2O (99 %, Wako), Al(NO3)3 ⋅ 9H2O (98 %, Wako), Na2CO3 (99.5 %, Kishida) and NaOH (98 %, Kishida).
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2
Electrodeposition of Mg(OH)x on ITO Substrates
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Aqueous solutions were prepared
using reagent-grade chemicals and
deionized water (>10 MΩ cm) purified by the Millipore Elix
Advantage5
system. Sn-doped In2O3-coated glass (ITO, Geomatec
Co., Ltd., ≤10 Ω sq–1) and n-type single-crystal
Si(100) wafer (Canosis Co., Ltd., 525-μm-thick Sb-doped Si,
≤0.02 Ω cm) were used as a substrate. Prior to the electrodeposition,
ITO and Si substrates (10 mm × 30 mm) were treated with a UV–ozone
cleaner and then rinsed with deionized water. The electrodeposition
of Mg(OH)x on the ITO substrate was carried
out galvanostatically in an aqueous solution containing 50 mM (M =
mol dm–3) Mg(NO3)2 (Wako Pure
Chemical Industries) at room temperature with a potentio/galvanostat
(Hokuto Denko, HABF5001) by applying different current densities of
0.5, 1.0, 5.0, 10.0, 20.0, 40.0, and 60.0 mA cm–2 at the total electrical charge of 0.5 C cm–2.
using reagent-grade chemicals and
deionized water (>10 MΩ cm) purified by the Millipore Elix
Advantage5
system. Sn-doped In2O3-coated glass (ITO, Geomatec
Co., Ltd., ≤10 Ω sq–1) and n-type single-crystal
Si(100) wafer (Canosis Co., Ltd., 525-μm-thick Sb-doped Si,
≤0.02 Ω cm) were used as a substrate. Prior to the electrodeposition,
ITO and Si substrates (10 mm × 30 mm) were treated with a UV–ozone
cleaner and then rinsed with deionized water. The electrodeposition
of Mg(OH)x on the ITO substrate was carried
out galvanostatically in an aqueous solution containing 50 mM (M =
mol dm–3) Mg(NO3)2 (Wako Pure
Chemical Industries) at room temperature with a potentio/galvanostat
(Hokuto Denko, HABF5001) by applying different current densities of
0.5, 1.0, 5.0, 10.0, 20.0, 40.0, and 60.0 mA cm–2 at the total electrical charge of 0.5 C cm–2.
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