Solver p47

The morphology of HPMC-CeO₂NPS-5FU particles deposited from an alcohol solution onto silicon was studied by atomic force microscopy in the semi-contact mode on a Solver P47 (NT-MDT) instrument (Zelenograd, Russia) at room temperature.

Peculiarities of surface relief of films were analyzed by an atomic force microscope (multimode scanning probe microscope Solver P-47, NT-MDT, Zelenograd, Russia). The average roughness (Ra) and the mean square roughness (Rq) were calculated in 10 points as the arithmetic average of the absolute values of the height variations, 5 the highest and 5 the deepest points of the mean profile line, using standard equations. Sections of 20 × 20 μm were investigated, then 2 × 2 μm areas of local maxima and minima were selected and analyzed with a higher resolution re-analysis, and the roughness of each sample was calculated, as the average of 3 measurements.

The orientation and phase of these films were investigated by XRD (Bruker D8 discover diffractometer) in a scan range of 2θ = 20°–60° using a step time of 1 s and a step size of 0.05°. The Cu K_α radiation (λ = 1.5406 Å) was run under a voltage of 40 kV and a current of 20 mA. A tapping mode AFM (NT-MDT Solver P47) was employed to explore the surface topography and determine the surface roughness (root-mean-square, R_rms) of the YbTaO₄ films annealed at three temperatures. The R_rms roughness of these samples was estimated in scanning areas of 3 × 3 μm². The film composition of YbTaO₄ films was analyzed using XPS (Thermo VG Scientific Microlab 350 system) with a monochromatic Al K_α source (1486.7 eV). The binding energy scale of each element was calibrated by setting the main hydrocarbon peak at a binding energy of 285 eV (C 1 s).