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Supra 40vp system

Manufactured by Zeiss
Sourced in Germany

The SUPRA 40VP system is a scanning electron microscope (SEM) designed and manufactured by Zeiss. It is a high-performance imaging and analysis tool used for the examination of a wide range of materials and specimens at the micro- and nanoscale. The SUPRA 40VP system provides high-resolution imaging capabilities, enabling detailed visualization and characterization of surface topography, composition, and other structural features.

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2 protocols using supra 40vp system

1

Microstructural Evolution of Heat-Treated Alloy

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The microstructural evolution with respect to heat treatment duration was analyzed using field-emission scanning electron microscopy (FE-SEM, SUPRA 40VP system, Zeiss, Oberkochen, Land Baden-Württemberg, Germany). Surface polishing with colloidal silica was performed to prepare the samples for microstructural examination, followed by electrolytic etching in a 10 wt% NaOH electrolyte solution under 5 V for 30 s [21 (link),32 (link),33 (link)]. The etched microstructures were observed and the volume fractions of the phases were determined according to ASTM E1245 [34 ].
The chemical composition and phase analyses were conducted using energy-dispersive spectroscopy (EDS, SUPRA 40VP system, Zeiss, Land Baden-Württemberg, Germany) and X-ray diffraction (XRD, D8 VENTURE, Stanford, CA, USA), respectively. The elucidation of the chemical composition by EDS analysis may not have accurately detected invasive elements such as nitrogen because of the small size of N atoms. The N chemical composition was calculated using the following formula:
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2

Nanoparticle Characterization by SEM and TEM

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Scanning electron microscopy was carried out using a Zeiss SUPRA 40VP system. Samples were prepared by spreading 2 μL of the nanoparticle suspension in water on a silicon substrate. The sample was dried under ambient conditions and then sputter-coated with a gold-platinum alloy (15 s, 20 mA). Micrographs were acquired using the InLens mode with an accelerating voltage of 10 kV. Particle sizes were measured on micrographs acquired at a magnification of 200 000× using the Olympus Analysis software package. To ensure size measurement accuracy, at least 250 measurements were made per sample. For transmission electron microscopy measurements, a 4 μL aliquot of sample was adsorbed onto a holey carbon-coated grid (Lacey, Tedpella), blotted with Whatman 1 filter paper and plunge-frozen into liquid ethane at −180 °C using a vitrobot (FEI). Frozen grids were transferred onto a Talos electron microscope (FEI) using a Gatan 626 cryo-holder. Electron micrographs were recorded at an accelerating voltage of 200 kV using a low-dose system (50 e Å−2) and keeping the sample at −175 °C. Defocus values were −3 μm. Micrographs were recorded on a 4 × 4 K Ceta CMOS camera.
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