Sineg
The SiNeg is a silicon nitride-based thin film deposition equipment used for the fabrication of semiconductor devices and microelectronic components. It is designed to deposit high-quality silicon nitride films on various substrates with precise control over thickness and composition.
Lab products found in correlation
11 protocols using sineg
Targeted Silencing of NOX4 in Cells
Transfection and DNA Damage Induction
Unless differently indicated, DNA damage was induced by treating cells with etoposide (20 μM Merck), NCS (8,8 nM, Merck), UV (20 J/m2), gemcitabine (10 μM, Merck), hydroxyurea (1 mM), camptothecin (20 μM, Merck) and nocodazole (80 ng/ml, Merck) for different time points. DRB (Merck) was used concentrated at 20 μM. MG132 (Merck) was added 20 min before etoposide treatment, at the concentration of 5 μM, unless otherwise indicated. CHX (Sigma) was used at 10 μg/ml.
Silencing MyD88 and TLR4 in SKOV-3 Cells
Molecular Regulation of PHLDA1 Expression
Molecular Regulation of PHLDA1 Expression
Autophagy regulation by CHOP inhibitors
Investigating Ferroptosis Sensitivity
Silencing STRAP Genes in Cells
Stable MDCK Cell Lines with α-Catulin Knockdown
siRNA and shRNA Mediated MKRN1 Knockdown
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