For negative-tone patterning, aZIF films were exposed to an electron beam using a Thermo Fisher Helios G4 UC DualBeam microscope operating at 20 kV accelerating voltage and 400 pA beam current. The areal doses were 80 mC cm–2 for all the patterns. After exposure, the aZIF films were developed in deionized water for 24 h and blow dried in a stream of nitrogen gas.
For positive-tone patterning, the aZIF films were first placed in a 60 ml PFA vessel with a bed of 0.2 g of 4,5-dichloroimidazole and heated at 75 °C for 1.5 h. The 4,5-dichloroimidazole-treated aZIF was then exposed to an electron beam using a Thermo Fisher Helios G4 UC DualBeam microscope operating at 20 kV accelerating voltage and 100 pA beam current. The areal doses were 2 mC cm–2 for all the patterns. After exposure, the aZIF films were immersed in n-methyl-2-pyrrolidone (NMP) and acetone each for 10 s and blow dried in a stream of nitrogen gas.
For positive-tone patterning, the aZIF films were first placed in a 60 ml PFA vessel with a bed of 0.2 g of 4,5-dichloroimidazole and heated at 75 °C for 1.5 h. The 4,5-dichloroimidazole-treated aZIF was then exposed to an electron beam using a Thermo Fisher Helios G4 UC DualBeam microscope operating at 20 kV accelerating voltage and 100 pA beam current. The areal doses were 2 mC cm–2 for all the patterns. After exposure, the aZIF films were immersed in n-methyl-2-pyrrolidone (NMP) and acetone each for 10 s and blow dried in a stream of nitrogen gas.