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Zepto plasma system

Manufactured by Diener Electronic
Sourced in Germany

The Zepto Plasma System is a compact and versatile laboratory instrument designed for plasma treatment applications. It generates a controlled plasma environment for surface modification and activation. The system's core function is to produce a stable and consistent plasma discharge, which can be used for various material processing tasks in a research or industrial setting.

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7 protocols using zepto plasma system

1

Deep-UV Micropatterning for Cell Adhesion

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Micropatterning was performed using a deep-UV light technique to normalize cell shape and adhesion area, as previously described (Azioune et al, 2009 (link)). Glass coverslips (square 22 × 22 mm, 1.5, VWR; or round 25 mm, 1.5; Thermo Fisher Scientific) were activated with plasma (Zepto Plasma System, Diener Electronic) for 2 min. After plasma treatment, coverslips were incubated with 0.2 mg/ml PLL(20)-g [3,5]-PEG(2) (SuSoS) in 10 mM Hepes at pH 7.4, for 1 h, at RT. Coverslips were washed three times with water, and left to dry before being placed on a synthetic quartz photomask (Delta Mask), previously activated with deep-UV light (PSD-UV; Novascan Technologies) for 5 min, using 3 μl of Milli-Q water to seal it to the mask. The coverslips were then irradiated through the photomask with the UV lamp for 5 min and left to dry before being incubated with FBN (25 μg/ml; F1141; Sigma-Aldrich), in 100 mM NaHCO3 at pH 8.6, for 30 min, at RT. Whenever possible, 5 μg/ml Alexa Fluor 647–conjugated fibrinogen (Thermo Fisher Scientific) was added to the FBN mix in order to visualize the pattern surfaces. Cells were added to the freshly incubated coverslips and allowed to spread for 15 min, before removing excess cells and new culture medium was added, and cells were left to fully adhere for another 12–16 h.
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2

Surface Preparation and Plasma Treatment

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Initially, surfaces were cut into 1.0 × 1.0 cm2 substrates and cleaned with ethanol (analytical grade, POCH S.A., Gliwice, Poland) in an ultrasonic bath to remove organic contaminents. Afterwards, the investigated surfaces were exposed to oxygen radio frequency (RF) plasma (Zepto plasma system, 40 Hz, 100 W, Diener Electronic, Ebhausen, Germany, 15 min at 50 W). The high hydrophilic character of the substrates after the treatment using plasma indicates the formation of a significant amount of polar surface silanols important to manufacture the covalent attachment of modifiers to the investigated surfaces [36 ].
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3

Micropatterning for Cell Morphology Control

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10-µm-width line micropatterns to control individual cell shape and adhesion pattern were produced as follows: glass coverslips (22 × 22 mm, no. 1.5, Van Waters and Rogers) were activated with plasma (Zepto Plasma System, Diener Electronic) for 1 min and incubated with 0.1 mg/ml of PLL(20)-g[3,5]-PEG(2) (SuSoS) in 10 mM Hepes at pH 7.4 for 1 h at room temperature. After rinsing and air-drying, the coverslips were placed on a synthetic quartz photomask (Delta Mask), previously activated with deep-UV light (PSD-UV, Novascan Technologies) for 5 min. 3 µl of MiliQ water was used to seal each coverslip to the mask. The coverslips were then irradiated through the photomask with the UV lamp for 5 min. Afterward, coverslips were incubated with 25 µg/ml of fibronectin (Sigma-Aldrich) and 5 µg/ml of Alexa 647–conjugated fibrinogen (Thermo Fisher Scientific) in 100 mM NaHCO3 at pH 8.6 for 1 h at room temperature. Cells were seeded at a density of 50,000 cells/coverslip and allowed to spread for ~10–15 h before imaging. Nonattached cells were removed by changing the medium ~2–5 h after seeding.
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4

Micropatterning for Cell Shape Control

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Micropatterns to control individual cell shape and adhesion pattern were produced as previously described (Azioune et al., 2009 (link)). Briefly, glass coverslips (22 × 22 mm No. 1.5, VWR) were activated with plasma (Zepto Plasma System, Diener Electronic) for 1 min and incubated with 0.1 mg/ml PLL(20)-g[3,5]-PEG(2) (SuSoS) in 10 mM HEPES at pH 7.4, for 1 h, at RT. After rinsing and air-drying, the coverslips were placed on a synthetic quartz photomask (Delta Mask), previously activated with deep-UV light (PSD-UV, Novascan Technologies) for 5 min; 3 µl of MiliQ water were used to seal each coverslip to the mask. The coverslips were then irradiated through the photomask with the UV lamp for 5 min. Afterward, coverslips were incubated with 25 μg/ml FBN (Sigma-Aldrich) and 5 μg/ml Alexa 546– or 647–conjugated fibrinogen (Thermo Fisher Scientific) in 100 mM NaHCO3 at pH 8.6, for 1 h, at RT. Cells were seeded at a density of 50,000 cells/coverslip and allowed to spread for ∼10–15 h before imaging. Nonattached cells were removed by changing the medium ∼2–5 h after seeding.
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5

Micropatterning Cells with Fibronectin

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Micro-patterns to control individual cell shape and adhesion pattern were produced as previously (Azioune et al. 2009). Briefly, glass coverslips (22 X 22mm No. 1.5, VWR) were activated with plasma (Zepto Plasma System, Diener Electronic) for 1 min and incubated with 0.1 mg/ml of PLL(20)-g[3,5]-PEG(2) (SuSoS) in 10 mM HEPES at pH 7.4, for 1 h, at RT. After rinsing and air-drying, the coverslips were placed on a synthetic quartz photomask (Delta Mask), previously activated with deep-UV light (PSD-UV, Novascan Technologies) for 5 min. 3 µl of MiliQ water were used to seal each coverslip to the mask. The coverslips were then irradiated through the photomask with the UV lamp for 5 min. Afterwards, coverslips were incubated with 25 μg/ml of fibronectin (Sigma-Aldrich) and 5 μg/ml of Alexa546 or 647-conjugated fibrinogen (Thermo Fisher Scientific) in 100 mM NaHCO3 at pH 8.6, for 1 h, at RT. Cells were seeded at a density of 50.000 cells/coverslip and allowed to spread for ~10-15h before imaging. Non-attached cells were removed by changing the medium ~2h-5h after seeding.
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6

Characterization and Evaluation of Urban Air Pollutants

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NIST1648a is a standard urban air pollutant material with a fully known particle size distribution and chemical composition, which was described in the certificate of analysis [32 ]. NIST1648a was subjected to 2 h of treatment with cold plasma using the Plasma Zepto system (Diener Electronic GmbH, Ebhausen, Germany), which removes most of the organic matter [33 (link)]. Organic components were removed at the Faculty of Chemistry of the Jagiellonian University in Kraków. The acronym, LAp120, was formed for the obtained material with a reduced content of organic carbon (from 9.12 to 1.68 wt%) [23 (link)].
Both NIST1648a and LAp120 were suspended in PBS, and the suspensions were sonicated for 3 min in an ultrasonic water bath immediately before being added to cell cultures. Our previous experiments showed that PM at a final concentration of 1 µg/mL of the culture medium caused only slight changes in the viability and metabolic activity parameters of the RAW 264.7 cells after both 4–6 and 48 h of exposure. On the other hand, PM at a final concentration of 100 µg/mL caused clear changes after both short-term (4–6 h) and long-term (48 h) exposure [23 (link)]. Thus, the abovementioned concentrations of PM and exposure times were used in this work.
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7

Characterization of Urban Air Pollution Reference Material

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NIST1648a is a high-quality reference material of urban air pollution collected in St. Louis. The elemental composition of this dust was fully analyzed and provided on the Certificate of Analysis supplied with the dust [20 ]. The Plasma Zepto system (Diener Electronic GmbH, Ebhausen, Germany) was used for the removal of organics. Samples of dust were treated with a low-temperature plasma for up to 120 min (referred to as LAp120), and the decrease in the content of organic carbon was monitored using an elemental analyzer (Elementar, Vario Micro Cube) and a total organic carbon analyzer (Shimadzu, TOC-V series equipped with the Total Nitrogen accessory) [21 (link)]. Morphological characterization of NIST1648a- and plasma-treated samples was performed by applying scanning electron microscopy (SEM), with a Tescan Vega3 LMU microscope equipped with an LaB6 cathode and EDS detector (Oxford Instruments, X-act, Silicon Drift Detector, SDD 10 mm2).
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