SEM was carried out using a FEI Quanta 200F Environmental scanning electron microscope and AFM was carried out using a VEECO Dimension 3000 atomic force microscope. EDX analysis was carried out using an x-act Oxford Instrument system coupled with the SEM.
Dimension 3000
Manufactured by Veeco
Sourced in United States
The Dimension 3000 is an atomic force microscope (AFM) designed for high-resolution surface imaging and analysis. It provides precise, nanometer-scale topographical data of samples. The Dimension 3000 is a versatile tool for research and development applications across various industries.
Automatically generated - may contain errors
Lab products found in correlation
K alpha xps system, by Thermo Fisher Scientific (3 mentions)
Sylgard, by Dow (2 mentions)
Hsq resist, by Dow (2 mentions)
X act, by Oxford Instruments (1 mentions)
Uv 2550, by Shimadzu (1 mentions)
Smartlab, by Rigaku (1 mentions)
Picoplus, by Agilent Technologies (1 mentions)
Xl30s feg, by Philips (1 mentions)
Sem leo, by Zeiss (1 mentions)
Jsm 6700f, by JEOL (1 mentions)
11 protocols using dimension 3000
1
Nanoscale Structural Characterization
2
Graphene Surface Characterization via AFM, Contact Angle, XPS, and Raman
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The surface roughness due to the functionalization of graphene with MPT64 Ab and 1,5-DAN was analyzed using atomic force microscopy (AFM) (Digital Instruments Dimension 3,000, Veeco, Plainview, NY, United States). A contact-angle measurement system (optical system, SPVT-2000) was used to analyze the surface tension of graphene functionalized with MTP64 Ab and 1,5-DAN. Chemical binding information for the graphene surface was acquired by XPS (K-Alpha XPS system, ThermoFisher Scientific, MA, United States) with incident beams generated by an Al X-ray source (hν = 1,486.6 eV) and a pass energy of 50 eV. UV–Vis spectrophotometry (UV-2550, Shimadzu, Kyoto, Japan) was used to study the optical properties of MTP64 Ab-conjugated and 1,5-DAN-functionalized graphene on quartz substrates. Raman spectra and mapping analysis of the graphene surface were conducted using a Raman system (InVia, Renishaw, Derbyshire, United Kingdom) to confirm the uniformity of the MTP64 Ab and 1,5-DAN functionalization. Large-area Raman mapping images were created from 196 spectra (30 × 30 μm2 area) with a 2.5 μm measurement spacing in both the horizontal and vertical directions.
3
Structural Characterization of Porous Germanium
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Cross-section images were obtained using scanning electron microscopy (SEM) (LEO 1540 XB®) to observe the porous structure before and after reorganization. An acceleration tension of 20 keV was used. The surface roughness of the porous layers and the Ge NMs was measured by atomic force microscopy (AFM) with a Veeco Dimension 3000® in tapping mode, with a scan size of 10 × 10 μm2. The mapping of PGe layers was performed by ellipsometry using a J. A. Woollam Co. VASE (R) instrument (500–900 nm). 49 measurement points were measured in the radial pattern with a distribution of 22.5° and a radial spacing of 1.25 cm. The crystalline quality of the Ge NMs was evaluated using a high-resolution transmission electron microscope (HRTEM, Talos 200X) and high-resolution X-ray diffractometer (SMARTLAB, Rigaku).
4
Atomic Force Microscopy of Amyloid Fibrils
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All imaging experiments were
carried out at room temperature in air with a Dimension 3000, Veeco,
Woodbury, NY, and a PicoPlus, Agilent atomic force microscope. Images
were acquired in the tapping mode with silicon (Si) cantilevers (spring
constant of 20–100 N/m) and operated below their resonance
frequency (typically 230–410 kHz). The images were flattened.
The contrast and brightness were adjusted for optimum viewing conditions.
Amyloid samples produced in solution were deposited on the surface
of freshly cleaved mica (Good Fellow) for 5 min (HEWL) and 30 min
(Aβ(1–40)). The mica pieces were washed 3 times with
200 μL of DI water and dried in a flow of N2 gas
at room temperature. The samples with surface-directed fibrils were
taken out from DI water and dried with a flow N2 gas prior
to imaging.
carried out at room temperature in air with a Dimension 3000, Veeco,
Woodbury, NY, and a PicoPlus, Agilent atomic force microscope. Images
were acquired in the tapping mode with silicon (Si) cantilevers (spring
constant of 20–100 N/m) and operated below their resonance
frequency (typically 230–410 kHz). The images were flattened.
The contrast and brightness were adjusted for optimum viewing conditions.
Amyloid samples produced in solution were deposited on the surface
of freshly cleaved mica (Good Fellow) for 5 min (HEWL) and 30 min
(Aβ(1–40)). The mica pieces were washed 3 times with
200 μL of DI water and dried in a flow of N2 gas
at room temperature. The samples with surface-directed fibrils were
taken out from DI water and dried with a flow N2 gas prior
to imaging.
5
Fabrication and Characterization of Nanofluidic Devices
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The nanofluidic devices were fabricated by replication in polydimethylsiloxane (PDMS) of patterned master stamps (51 (link),52 (link)). The nanochannels were made in hydrogen silsesquioxane (HSQ) resist (Dow Corning, Midland, MI, USA) using a lithography process with proton beam writing (53 (link)). An array of nanochannels is connected to two loading reservoirs through a superposing set of microchannels made in SU-8 resist with UV lithography. The heights and widths of the ridges in the master stamps were measured with atomic force microscopy (Dimension 3000, Veeco, Woodbury, NY) and scanning electron microscopy, respectively. Two stamps were made featuring nanochannels of length 60 μm and rectangular cross-sections of 150 × 250 and 200 × 300 nm2, respectively. The stamp was coated with a 5-nm thick teflon layer to guarantee perfect release of the replicated PDMS chips (54 ). The stamps were replicated in PDMS followed by curing with a curing agent (Sylgard, Dow Corning) at 338 K for 24 h. The PDMS replica was sealed with a glass coverslip, after both substrates were plasma oxidized (Harrick, Ossining, NY).
6
AFM Imaging of DNA Fragments
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DNA fragments were purchased from Thermo Scientific (1000 bp, Waltham, MA, USA) and New England Biolabs (10 000 bp, Ipswich, MA, USA). All imaging experiments were done at room temperature in air with a Veeco Dimension 3000 atomic force microscope (Woodbury, NY). Images were acquired in the tapping mode with silicon (Si) cantilevers (spring constant of 20–100 N/m) and operated below their resonance frequency (typically 230–410 kHz). The images were flattened, and the contrast and brightness were adjusted for optimal viewing conditions. A 20-μl droplet was spotted onto a silica surface. After 10 min to allow for DNA adsorption onto the surface, the specimens were developed by flushing them with ultra pure water followed by drying in a stream of N2 gas.
7
Characterization of HZONCE Morphology
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To investigate the morphology of HZONCE, an atomic force microscope (AFM, Dimension-3000, Veeco, Plainview, NY, USA) was used. The transparency of HZONCE was investigated by using a diode array UV visible spectrophotometer (UV-vis, 8452A, HP, Palo Alto, CA, USA). Dielectric property was measured by using an inductance, capacitance and resistance (LCR) meter (4284A, Agilent, Santa Clara, CA, USA). To measure the piezoelectric charge constant and Young’s modulus, the quasi-static pull test was used [24 (link)]. Figure 2 shows the pull test system. The pull test system consists of a linear motor (GB-BA/SR128-015, Sony, Minato, Tokyo, Japan) for longitudinal pulling, load cell (UU-K0101, Dacell, Cheangiu-Si, Chungcheong buk-Do, South Korea) to measure pulling force, and picoammeter (6487, Keithley, Solon, OH, USA) to measure induced piezoelectric charge. Samples were prepared to 6 × 1 cm2 size. To collect piezoelectric charge, 4 × 1 cm2 aluminum electrodes were deposited on both sides of samples. Pulling speed was set to 0.0005 mm/s.
8
Characterization of P3HT-NF/PDMS Composite
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The surface morphology of the P3HT-NF/PDMS composite was characterized using an optical microscope (Zeiss, Axioscope AI) and an AFM (Veeco Dimension 3000) under the tapping mode. The microstructures of the stretchable electrodes were characterized by a SEM (XL-30SFEG, Philips). The electric output characteristics of the devices were measured by using a Stanford SR570. Cyclic mechanical stretching and releasing tests were performed by using a linear motor.
9
Morphology Visualization and Surface Characterization
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To visualize the morphology of different printed layers consisting of substrate, EAP, and electrodes, image acquisition via Scanning Electron Microscopy (SEM) was performed. Observation tests were conducted on the cross section of the samples using SEM LEO (ZEISS) equipment (ZEISS, Rueil Malmaison, France). These observations clearly give better comprehension regarding the interaction between the layers’ interface, allowing us to validate the print quality, which is essential for the developed design.
To evaluate the finish and the roughness of the surface of the electroactive layer (i.e., made of copolymer crystalized by vacuum annealing), microscopic images were generated via atomic force microscopy (AFM) using the three masks A, B, and C (cf.,Table 1 ). The experimental setup is based on a commercial AFM (Veeco Dimension 3000, Houghton, Michigan, USA) that generates numerical images acquired via tapping-mode AFM.
To evaluate the finish and the roughness of the surface of the electroactive layer (i.e., made of copolymer crystalized by vacuum annealing), microscopic images were generated via atomic force microscopy (AFM) using the three masks A, B, and C (cf.,
10
Fabrication of Nanofluidic Devices via PDMS Replication
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The channel systems were fabricated by replication in polydimethylsiloxane (PDMS) of patterned master stamps (29 (link),30 ). The nanochannel part of the stamps was made in hydrogen silsesquioxane (HSQ) resist (Dow Corning, Midland, MI, USA) using a lithography process with proton beam writing (31 (link)). An array of nanochannels is connected to two loading reservoirs through a superposing set of microchannels made in SU-8 resist with UV lithography. The heights and widths of the ridges in the master stamps were measured with atomic force microscopy (Dimension 3000, Veeco, Woodbury, NY, USA) and scanning electron microscopy, respectively. Two stamps were made featuring nanochannels of length 60 μm and rectangular cross-sections of 150 × 250 and 200 × 300 nm2, respectively. The stamp was coated with a 5 nm thick teflon layer for perfect release of the replicated PDMS chips (32 ). The stamps were replicated in PDMS followed by curing with a curing agent (Sylgard, Dow Corning) at 338 K for 24 h. The replicas were sealed with a glass coverslip, after both substrates were plasma oxidized (Harrick, Ossining, NY, USA).
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