In situ electrochemical measurements during PLD deposition (i-PLD) were conducted with an Alpha-A High Performance Frequency Analyzer equipped with an Electrochemical Test Station POT/GAL 30V/2A setup (both Novocontrol Technologies, Germany). For i-PLD measurements, a sample was placed on the PLD heater and covered with a corundum mask (cutout 0.45 × 0.45 cm2) to prevent short circuiting of the working electrode and counter electrode via the edges of the sample during the subsequent film deposition. The working electrode was brought into contact with a PtIr-needle and the counter electrode via platinum paste brushed onto the heater. A sketch of the measurement setup can be found in
Impedance measurements were typically conducted in a frequency range from 106 to 10−1 Hz (if needed for resolving the electrode feature, the frequency range was extended to 10−2 Hz), with an AC amplitude of 10 mV root-mean-square, and a resolution of 5 or 10 points per frequency decade. In many cases, oxygen partial pressure and temperature were kept at 600 °C and 0.04 mbar O2 for deposition; in some cases pressure and temperature were varied for a more detailed impedance characterisation.