High-resolution SEM-EDS images were obtained by FE-SEM (JSM 7800 F PRIME with Dual EDS, JEOL) and EDS (Aztec, Oxford) with an accelerating voltage of 15 kV. SEM analyses of hydroxide precursors and cathode materials were carried out on a TE-SEM (Genesis-1000, EMCRAFT) with an accelerating voltage of 10 kV. Cross-section SEM-EDS images were obtained by FE-SEM (JSM 7100F, JEOL) and EDS (Aztec, Oxford) with an accelerating voltage of 15 kV. The Li2CO3 powder sample was casted on Al foil with PVDF binder and polished by a cross-section polisher (SM-09010, JEOL).
Sm 09010
Manufactured by JEOL
Sourced in Japan
The SM-09010 is a high-performance scanning electron microscope (SEM) manufactured by JEOL. It is designed to provide high-resolution imaging and analysis of a wide range of materials. The core function of the SM-09010 is to generate detailed, high-magnification images of samples by scanning them with a focused electron beam.
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Lab products found in correlation
Jsm 7800 f prime with dual eds, by JEOL (1 mentions)
Jsm 7100f, by JEOL (1 mentions)
Jsm 6500f, by JEOL (1 mentions)
Contourgt k0, by Bruker (1 mentions)
Jem 2100f, by JEOL (1 mentions)
Jib 4500, by JEOL (1 mentions)
Gemini sem300, by Oxford Instruments (1 mentions)
Ultim max 65, by Oxford Instruments (1 mentions)
Jsm 7600f, by JEOL (1 mentions)
7 protocols using sm 09010
1
SEM-EDS Characterization of Cathode Materials
2
Characterization of Stainless Steel Foils
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25-µm thick stainless steel foils (S316, Precision brand) of 27 × 17 mm2 (Fig. 1a ) were used for all experiments. Chemical composition was determined using X-ray fluorescence spectrometer (XRF, Thermo Scinetific Niton XL3t GOLDD+) and carbon and sulphur analyser (ELTRA CS-800): 0.40% Si, 1.53% Mn, 16.0% Cr, 10.5% Ni, 0.34% Cu, 1.46% Mo, 0.13% V, 0.030% C, <0.005% S and Fe rest in mass fraction. SEM images were recorded using JEOL JSM-6500F at 15 kV. Cross section of S2 was performed by JEOL SM-09010 polisher. Surface roughness was measured using 3D optical interferometric microscope Bruker Contour GT-K0.
3
Influence of Bonding Temperature on Au/Si Joints
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In order to evaluate the influence of bonding temperature on the bond quality, the shear strengths of Au/Si-material joints bonded at 300–500 °C with a pressure of 5 MPa were measured with a strain rate of 30 mm/min. The shear strength was evaluated as the average value of three joints, and the error bars were determined as the standard deviation values. The joint microstructures were observed using a stereomicroscope (Olympus SZX7). The cross-sectioned joints were prepared by using a cross-section polisher (JEOL SM-09010) and observed using a scanning electron microscope (SEM; Hitachi S-3000H). The interfacial microstructure between the sintered Ag layer and the Si-materials was investigated using transmission electron microscopy (TEM; JEOL JEM-2100F) combined with energy dispersive X-ray spectroscopy (EDS). Thin foil samples for TEM observations were prepared using a focused ion beam method (FIB; JEOL JIB-4500).
4
Microstructure and Composition Analysis of Catalysts
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For EDX measurements, a cross-section of the monolith was polished with an ion cross-section polisher (JEOL, SM-09010) in order to obtain a plane surface. To increase the conductivity of the surface, gold was sputtered onto it. The microstructure and chemical composition of the catalyst were then analyzed by means of a scanning electron microscope (SEM) (Zeiss, Gemini SEM300) equipped with an EDX-detector (UltimMax 65, Oxford instruments). The images were acquired at 20 kV with a scan time of 2 ms/pixel. The EDX data were then processed by AZtec software (V. 5.1, Oxford Instruments).
5
Microstructure and Electrical Resistance Analysis of NCA Electrodes
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The microstructure and Gr distribution were observed using field-emission scanning electron microscopy (SEM, JSM-7600F, JEOL Ltd., Tokyo, Japan). The samples were cross-sectioned using a cross-section polisher (SM-09010, JEOL Ltd., Tokyo, Japan). The in-plane resistance of NCA electrodes was measured using an electrode resistance measurement system (RM2610, Hioki, Nagano, Japan). The electrical resistance distribution inside the cross-sectioned electrodes was measured in scanning spreading resistance microscopy (SSRM) mode using atomic force microscopy (AFM, NX-10, Park systems, Suwon, Korea) equipped with a diamond-coated probe (CDT-NCHR, NANOSENSORS™, Neuchatel, Switzerland) with a nominal force constant of 80 N m−1 over a scan area of 10 × 10 µm2. By applying appropriate bias voltages (~1.5 V), the current passing through samples (between the tip and sample base, Al current collector) was recorded using a logarithmic current amplifier in SSRM mode.
6
Argon Ion Beam Polishing for SEM Analysis
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The measurements were carried out on cylindrical cement blocks allowed to harden for one week (see section 2.2). Then, a 1 mm 2 polished cross-section of the samples was obtained using a JEOL cross section polisher SM09010, by applying an argon ion beam accelerated by a voltage from 4.5 to 6 kV perpendicular to the surface of each specimen for 4 to 8 hours. SEM observation of those samples was performed using a Field Emission Gun Scanning Electron Microscope (Jeol 7600F). Images were acquired on a back scattered electron mode with a 8 pA beam current and a 8 kV accelerated voltage.
7
Cross-sectional SEM Imaging of Samples
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The measurements were carried out on the samples used for the permeability measurements (see section 2.3). Then, a 1 mm 2 polished cross-section of the samples was obtained using a JEOL cross section polisher SM09010, by applying an argon ion beam accelerated by a voltage up to 6 kV perpendicular to the surface of each specimen for 6 hours. SEM observation of those samples were performed using a Field Emission Gun Scanning Electron Microscope (Jeol 7600F). Images were acquired on a back scattered electron mode with a 9 pA beam current and a 10 kV accelerated voltage.
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