S1813 photoresist

Manufactured by MicroChem

Sourced in United States

S1813 is a positive photoresist material used in semiconductor and microelectronic device fabrication. It is designed for use in microlithography processes. The core function of S1813 photoresist is to act as a light-sensitive material that can be selectively exposed and developed to create patterns on a substrate surface.

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Lab products found in correlation

2 protocols using s1813 photoresist

MWCNT-SU-8 Nanocomposite Biosensor

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Standard multi-walled carbon nanotubes (MWCNTs) with diameter range of 5–20 nm and length 1–10 µm was purchased from Reinste Nano Ventures Pvt. Ltd. (New Delhi, India). An epoxy-based negative photoresist, SU-8 series formulation (cyclopentanone based), was obtained from Micro Chem, Newton, MA, USA. SU-8 is available in several viscosities, SU-2002 being the lowest and SU-2150 being the highest. For our experimentation SU-8 2015 is procured as it suits our viscosity requirements. S1813 photoresist was also procured from Micro Chem, Newton, MA, USA. Phosphate buffered saline tablets (PBS), 1-Ethyl-3-(3-dimethylaminopropyl) carbodiimide (EDC), N-Hydroxysuccinimide (NHS), chloroform, Bovine Serum Albumin (BSA), Myoglobin from equine skeletal muscle and monoclonal antibody myoglobin purchased from Sigma Aldrich, India. Ultra pure DI water (18.2 MΩ·cm) was used throughout.

Durga Prakash M., Vanjari S.R., Sharma C.S, & Singh S.G. (2016). Ultrasensitive, Label Free, Chemiresistive Nanobiosensor Using Multiwalled Carbon Nanotubes Embedded Electrospun SU-8 Nanofibers. Sensors (Basel, Switzerland), 16(9), 1354.

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Fabrication of Microfluidic Devices

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Chemicals and materials were obtained from the following sources and used without further purification: 2'-Deoxyadenosine-5'-monophosphate (Alfa Aesar); Thymidine-5'-monophosphate disodium salt (Alfa Aesar); 2'-Deoxycytidine-5'-monophosphate (Alfa Aesar); 2'-Deoxyguanosine-5'-monophosphate disodium salt hydrate (Alfa Aesar); potassium chloride (1 and 3 m, Sigma-Aldrich); Tris-EDTA (100×, Sigma-Aldrich); Tris-Borate-EDTA (10×, Sigma-Aldrich); silver (Ag) wires (>99%, Sigma-Aldrich); S1813 photoresist (MicroChem); MF319 developer (MicroChem); potassium hydroxide (KOH) pellets (Fisher Scientific); hydrofluoric acid (HF) (Sigma-Aldrich); Fluorolink MD 700 (Solvay); 2-hydroxy-2-methylpropiophenone (Sigma-Aldrich); NOA72 (Norland Products); poly(ethylene glycol) diacrylate (PEGDA) (Mn = 250, Sigma-Aldrich); 2,2-dimethoxy-2-phenylacetophenone (Sigma-Aldrich); Si wafers (P/B, resistivity 5-10 Ωcm, orientation of (100), and 525 ± 25 μm thickness) (WaferPro); polyethylene terephthalate (PET) with 250 μm thickness (Goodfellow); polymethylmethacrylate (PMMA) with a thickness of 250 μm (Goodfellow); polymethylmethacrylate (PMMA) of 1 mm thickness (ePlastics).

Choi J., Jia Z., Riahipour R., McKinney C.J., Amarasekara C.A., Weerakoon-Ratnayake K.M., Soper S.A, & Park S. (2021). Label Free Identification of Single Mononucleotides by Nanoscale Electrophoresis. Small (Weinheim an der Bergstrasse, Germany), 17(42), e2102567.

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