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17 protocols using dxr microscope

1

Comprehensive Materials Characterization

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The microstructures
and morphologies of the materials were determined using a transmission
electron microscope (TEM, JEM, 2011F). The crystal structures were
evaluated using a powder X-ray diffraction (XRD) meter (Smart Lab
9KW) with Cu Kα radiation. Raman spectroscopy was performed
using a Thermo DXR Microscope with 532 nm excitation laser wavelength.
PHI 5000 Versa Probe, ULVAC-PHI with an Al Kα X-ray source (1486.6
eV), was used to measure X-ray photoelectron spectroscopy (XPS). The
TGA curves were obtained using a SHIMADZU DTG-60H thermo balance in
air with a 5 °C min–1 heating rate from 50
to 600 °C.
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2

Structural Characterization of TQBQ-COF Material

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The structure of the resultant TQBQ-COF material was examined by solid-state 13C NMR with Inova 400 MHz Spectrometer (Varian Inc., USA), and Fourier transform infrared spectroscopy (FTIR, Bruker 5700 TENSOR П) in range of 400–4000 cm−1. Powder XRD (Rigaku MiniFlex600 × -ray generator, Cu Kα radiation, λ = 1.54178 Å), high-resolution transmission electron microscopy (HRTEM) and the selected area electron diffraction (SAED) pattern (Taols F200X G2) were applied to investigate the crystallinity and the microstructure of the TQBQ-COF powder. The elemental distributions of the TQBQ-COF material and the relevant electrodes before and after discharge/charge were characterized by scanning electron microscopy-Energy dispersive spectrum mapping (SEM-EDS), elemental analysis (EA, vario EL CUBE), and X-ray photoelectron spectroscopy (XPS, Perkin Elmer PHI 1600 ESCA), respectively. The morphologies of the TQBQ-COF material and the relevant electrodes were observed by scanning electron microscopy (SEM, JEOL JSM7500F), transmission electron microscopy (TEM, Taols F200X G2), and N2 adsorption/desorption measurement (BEL Sorp mini). Moreover, Raman (DXR Microscope, Thermo Fisher Scientific with excitation at 532 nm) and TG-DSC analyzer (NETZSCH, STA 449 F3) were separately carried out to examine the structure and the stability of TQBQ-COF material, respectively.
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3

Characterization of Nanomaterials

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Scanning electron microscopy (SEM) was conducted with a Zeiss LEO 1550 at 5.00 keV. Raman micro-mapping was performed with a Thermo Fisher DXR microscope (455 nm, 6 mW, 10 s × 3 exposure time, 100× objective, 500 nm step size). X-ray photoelectron spectroscopy (XPS) measurements were performed with a Thermo Fisher Scientific K-alpha XPS system using a Al Kα X-ray source (1486.7 eV).
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4

Raman and Photoluminescence Spectroscopy Protocol

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Raman spectroscopy was conducted in a Thermo Fisher DXR microscope equipped with a 455 nm laser. Measurements were made using an incident power of 5 mW and a 50× objective, and 5 acquisitions with 10 s exposure time were collected for each Raman spectrum. Photoluminescence spectra were obtained using a custom spectroscopy setup built from a Nikon Eclipse Ti-U inverted microscope. The excitation source was a 407 nm diode laser from Integrated Optics. The light was focused to a diffraction limited spot on the sample with a TU Plan Fluor objective from Nikon (×100, 0.9 NA) resulting in an incident power of 30 µW. The emitted fluorescent light was collected with the same objective, and the spectra were recorded using a Shamrock 303i Spectrometer equipped with a 450 nm longpass filter (FELH0450 from Thorlabs) and an electronically cooled Newton 970 EMCCD. A total of five acquisitions with 1 s exposure time each were collected for each PL spectrum.
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5

DNTT Film Characterization Techniques

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Morphology, physical phase, and chemical structure characterizations on the DNTT films are performed before and after plasma treatment. AFM measurements are carried out on a Dimension ICON (Bruker). XRD measurements are carried out on a MiniFlex600 (Rigaku). DNTT films are deposited on a quartz plate for the measurement of the UV-vis absorption spectrum (a Lambda 750) and deposited on Au-coated Si for the measurements of the Raman spectrum (a DXR Microscope with a 532 nm laser), and IR spectrum (Nicolet IN10, Thermo Fisher Scientific). For the UV-Vis test, the samples are loaded into a quartz colorimetric ware and sealed by silicone grease. A 50 nm DNTT film is deposited on highly doped Si in a vacuum thermal evaporation system and transferred under the protection of N2 to a N2 glovebox connected to an X-ray photoelectron spectrometer (ESCALAB-250Xi, Thermo Fisher Scientific).
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6

Multimodal Characterization of Materials

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Powder XRD patterns were collected on a Rigaku X-ray diffractometer (MiniFlex600) with Cu Kα radiation. SEM images were obtained on Field-emission JEOL JSM-7500F microscope. TEM and HRTEM images were taken on Philips Tecnai G2 F20. ABF-STEM was performed on Titan Cubed Themis G2 300 (FEI) at an acceleration voltage of 200 kV. The XAS data were collected on BL14W1 beamline of Shanghai Synchrotron Radiation Facility and analyzed with software of Ifeffit Athena62 . ICP-AES measurements were conducted on a PerkinElmer Optima 8300. XPS was tested on a Perkin Elmer PHI 1600 ESCA system. Raman spectra were obtained on confocal Thermo-Fisher Scientific DXR microscope using 532 nm excitation. TGA was measured by a Netzsch STA 449 F3 Jupiter analyzer.
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7

Comprehensive Spectroscopic Analysis of Materials

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FTIR spectra were recorded on a Nicolet iS20 FTIR spectrometer ranging from 4000 to 400 cm−1 under ATR mode. Raman spectra were conducted on a Thermo Fischer DXR Microscope. The 2H-NMR spectra were obtained on a Bruker AVANCE III HD 500 NMR spectrometer with deuterated D2O as the field frequency lock. X-ray photoelectron spectroscopy (XPS) measurements and depth profile XPS were performed on a Versa probe III (PHI 5000) spectrometer. Analysis was performed using CASA XPS. All the XPS spectra were calibrated to the adventitious hydrocarbon carbon peak at 284.8 kV.
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8

Comprehensive Characterization of Nanomaterials

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Powder XRD patterns were characterized using X-ray diffractometer (Japan Rigaku Rotaflex) by Cu Kα radiation (λ = 1.5418 Å). SEM tests were recorded on Nova NanoSEM 450. TEM and HAADF-STEM images were performed on FEI TF30. Spherical aberration-corrected TEM images were characterized on a JEM ARM200F thermal-field emission microscope with a probe spherical aberration corrector. XPS data was tested by a model of ESCALAB250. Inductively coupled plasma-optical emission spectrometer (ICP-OES) was characterized on PerkinElmer AVIO 500. In-situ Raman experiments were conducted with a Raman spectrometer (Thermo Fisher, DXR Microscope) with a ×50 visible objective. The wavenumber of the excitation light source was 532 nm. Atomic force microscope (AFM, Bruck Dimension Icon) was utilized to analyze the thickness of the product. X-ray absorption fine structure spectra (XAFS) of Ni, Fe, and Ru K-edge were collected at BL07A1 beamline of National Synchrotron Radiation Research Center (NSRRC). The data were collected in fluorescence mode using a Lytle detector.
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9

Multi-Technique Characterization of Electrolyte Structure

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Raman spectroscopy for the electrolyte structure was conducted on Horiba LabRAM HR Evolution microscope. Raman spectroscopy for low temperature and in situ batteries was tested by confocal Thermo-Fisher Scientific DXR microscope. Both of them used a 532 nm excitation laser. DSC was carried out in METTLER TOLEDO DSC3 in the procedure of +25~−150 °C with a cooling rate of 10 K min−1, constant temperature for 2 mins and –150~+25 °C with a heating rate of 5 K min−1. The polarizing microscope was using Olympus BX51TRF. The refrigerating system for low-temperature characterizations is Linkam THMS600. NMR was characterized on Bruker ASCEND400. XPS was conducted on X-ray Photoelectron Spectrometer (Axis Ultra DLD) with an excitation source of Al Kα X-ray.
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10

Graphene Characterization on Oxidized Copper

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Graphene domains were observed after Cu oxidation by a Nikon Eclipse L200N microscope. Scanning electron microscopy (SEM) (Zeiss Supra VP 60, 5 kV) was used to characterize the morphology of graphene transferred on Cu grids. Transmission electron microscopy (TEM) (Tecnai G2 F20, operated at 200 kV) then was used to characterize the nano/microvoids defects of the as-transferred graphene domain. Raman spectroscopy was performed with a Thermo Fisher DXR microscope under ambient conditions using a 532 nm excitation laser source. The nominal spot size is 700 nm. The power of the laser is kept below 1 mW. X-ray photoelectron spectroscopy (XPS) was performed on oxidized Cu grown with graphene with an Escalab 220i-XL from Thermo Scientific. A monochromatized Al K-Alpha X-ray source with photon energy 1486.7 eV was used as photon source.
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