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Escalab 250 spectrometer

Manufactured by Thermo Fisher Scientific
Sourced in United States, China, United Kingdom

The ESCALAB 250 is a high-performance X-ray photoelectron spectrometer (XPS) designed for surface analysis. It provides accurate and reliable data on the chemical composition and electronic structure of solid surfaces. The ESCALAB 250 utilizes a high-performance monochromated X-ray source and an advanced electron energy analyzer to deliver precise and reproducible results.

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59 protocols using escalab 250 spectrometer

1

Structural Characterization of Nanomaterials

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The morphologies and composition of samples were characterized by high-resolution transmission electron microscopy (HRTEM; JEOL, JEM-2100F, 200 kV) equipped with an energy-dispersive X-ray spectrometry (EDS) instrument. Atomic structural characterization of the samples was measured using a spherical aberration corrected transmission electron microscope (TEM; Titan-G2, 300 kV). During the TEM measurements, electron exposures employed should be very low to minimize irradiation damage. X-ray diffraction (XRD) patterns were collected on an X-ray diffractometer (Bruker D8, Cu Kα, λ = 1.5406 Å, 40 kV, and 40 mA) with a counting time of 8 s, recorded with 2θ ranging from 15° to 70°. X-ray photoelectron spectroscopy (XPS) measurements were performed using a Thermo VG Scientific ESCALAB 250 spectrometer (Al Kα, 200 W). The XAFS (Ta L3-edge and Co K-edge) spectra were collected at beamline BL14W1 of the Shanghai Synchrotron Radiation Facility. It should be noted that the samples were kept under an argon atmosphere before all of the above characterizations to avoid oxidation.
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2

Nanomaterial Characterization via TEM, SEM, XRD, XPS

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Transmission electron microscopy (TEM) and high-resolution TEM (HRTEM) images of the Pt NBs were acquired on Talos G2 F20 and JEOL JEM-2100F instruments, manipulated with an accelerating voltage of 200 kV. Scanning electron microscopy (SEM) studies were performed using a Hitachi S4800 system. XRD analyses were performed on a Model D/max-rC X-ray diffractometer using Kα radiation (λ = 0.15406 nm). XPS measurements were conducted on a Thermo VG Scientific ESCALAB 250 spectrometer with Al Kα radiation. The binding energy was calibrated by means of the C 1s binding energy at 284.6 eV.
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3

Comprehensive Nanomaterial Characterization Techniques

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Transmission electron microscope (TEM) and atomic fluorescence microscopy (AFM) images were taken on a JEOL JEM 2100 TEM at an accelerating voltage of 200 kV and Agilent atomic force microscope, respectively. UV-visible absorption was carried out using an “Evolution” spectrophotometer. Fluorescence spectroscopy was performed on an LS 55 PerkinElmer spectrophotometer. The Fourier transform infrared spectral (FTIR) investigation was recorded on a 8900 Shimadzu HYPER. Experiments were performed by preparing KBr pellets in the frequency range of 400–4000 cm−1. X-ray photoelectron spectroscopy (XPS) analysis was performed by an ESCALAB 250 spectrometer (Thermo-VG Scientific Co., U.S.A.) with an ultrahigh vacuum generator. Powder X-ray diffraction (XRD) was analyzed by PANalytical-EMPYREAN.
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4

Comprehensive Characterization of Material Samples

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The morphology and particle size of the samples were investigated using a JEOL JEM-2010 transmission electron microscopy (TEM) operated at an accelerating potential of 200 kV. Scanning electron microscopy (SEM) images were captured on a Hitachi S-4800 scanning electron microscope, operating at 5 kV. X-ray diffraction (XRD) patterns were performed on Model D/max-rC X-ray diffractometer using Cu Kα radiation source (λ = 1.5406 Å) and operating at 40 kV and 100 mA. X-ray photoelectron spectroscopy (XPS) measurements were carried out on a Thermo VG Scientific ESCALAB 250 spectrometer with a monochromatic Al Kα X-ray source (1486.6 eV photons). The binding energy was calibrated with respect to C1s at 284.6 eV. The compositions of the catalysts were determined using the energy dispersive X-ray (EDX) technique. The Brunauer-Emmett-Teller (BET) specific surface area and pore size distribution were measured at 77 K using a Micromeritics ASAP 2050 system. Fourier transform infrared (FTIR) spectrum was recorded with a Nicolet 520 SXFTIR spectrometer. The UV-vis spectra were recorded at room temperature on a UV3600 spectrophotometer. Thermal analysis was performed on a Perkin Elmer thermogravimetric analyzer under air atmosphere with a heating rate of 10 °C min−1.
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5

Comprehensive Material Characterization by XRD, SEM, TEM, and XPS

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X-ray diffraction (XRD) measurement was performed on X-ray powder diffractometer with a Cu Kɑ radiation (λ = 1.5406 Å). Scanning electron microscopy (SEM) images were collected on Hitachi S5500 scanning electron microscope. Transmission electron microscope (TEM) and high-resolution transmission electron microscope (HRTEM) images were collected using a JEOL JEM2100F (accelerating voltage of 200 kV). Element dispersive spectroscopy (EDS) measurements and line scans profiles were performed on FEI Tecnai G2 F20 microscope, an accessory built on the JEOL JEM-2100F. All XPS analyses were carried out with Thermo VG Scientific ESCALAB 250 spectrometer (Al Kα radiator).
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6

Comprehensive Characterization of Ni@NiO/CdS Nanostructures

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The sample morphologies were studied using an XL 30 ESEM FEG field-emission scanning electron microscope (FESEM; FEI Company). X-ray diffraction patterns were obtained by scanning the sample in the 2θ range of 20° and 80° at a scanning rate of 10° min−1 using a Rigaku D/Max-2550 diffractometer with Cu-Kα radiation (λ = 1.54056 Å; 40 kV, 350 mA). UV-vis diffuse reflectance spectra (UV-vis DRS) of the samples were obtained using a UV-vis-NIR spectrophotometer (Shimadzu UV-3600) in the absorption range of 300 to 800 nm. Transmission electron microscopy (TEM) and high-resolution transmission electron microscopy (HRTEM) images were obtained using a TECNAIG2 TEM microscope (FEI Company). X-ray photoelectron spectra (XPS) of the Ni@NiO/CdS samples were obtained using a Thermo VG Scientific Escalab 250 spectrometer. Furthermore, the photoinduced charge characteristics of Ni@NiO/CdS were studied via SPV and transient photoelectronic voltage (TPV) measurements on home-made instruments; moreover, the TPV instrument used a laser light as the illuminant. The light wavelength was 355 nm and the pulse width was 5 ns as the illuminant. Data storage was performed using a digital oscilloscope.
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7

Characterization of Catalytic Nanomaterials

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Transmission electron microscopy (TEM) images and energy-dispersive X-ray spectroscopy (EDX) elemental mapping patterns were taken using a JEOL JEM-2100F transmission electron microscopy operated at 200 kV. The samples were prepared by placing a drop of the colloidal solution or catalyst powder dispersion in ethanol solution (99%) on a carbon film coated Cu grid (3 mm, 300 mesh), followed by drying under ambient conditions. X-ray diffraction (XRD) patterns were obtained on a Model D/max-rC X-ray diffractometer using Cu Ka radiation source (λ = 1.5406 Å) and operating at 40 kV and 100 mA. High-resolution X-ray photoelectron spectroscopy (XPS) was carried out on a Thermo VG Scientific ESCALAB 250 spectrometer with an Al Kα radiator. The binding energy was calibrated by means of the C 1s peak energy of 284.6 eV.
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8

Comprehensive Characterization of Nanomaterials

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Transmission electron microscopy (TEM) was carried out by JEOL 2010 F electron microscope (Tokyo, Japan) at an operating voltage of 200 kV. X-ray diffraction (XRD) measurements were carried out using a D/max 2550 VB+/PC X-ray diffractometer (Rigaku Cop., Tokyo, Japan) with Cu Kg radiation (λ = 0.154056 nm) at 40 kV. Dynamic light scattering (DLS) and zeta potential measurements were determined on Malvern Zetasizer (Nano ZS model ZEN3600, Worcestershire, UK). X-ray photoelectron spectroscopy (XPS) analysis was taken on an ESCALAB 250 spectrometer (Thermo-VG Scientific, Waltham, MA). Fourier-transform infrared spectroscopy (FTIR) spectra were obtained from a Nicolet Nexus 870 spectrometer (Nicolet Instruments Inc, USA). UV-Vis spectra were recorded on a UV3600 instrument (Shimadzu Corporation, Japan). Mn concentrations of samples were determined by inductively coupled plasma atomic emission spectrometer (ICP-AES, Agilent Technologies, Palo Alto, CA). NIR laser was acquired on a 660 nm laser device (Shanghai Connect Fiber Optics Company) and the temperature was recorded on a DT-8891E thermocouple linked to a digital thermometer (Shenzhen Everbest Machinery Industry, Shenzhen, China). Confocal laser florescence scanning images were obtained by Leica TCS SP2 microscope (CLSM, Leica Microsystems, Mannheim, Germany).
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9

Comprehensive Material Characterization Methods

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Transmission electron microscopy (TEM) was carried out on a JEOL-2100F transmission electron microscope operating at 200 kV. Scanning electron microscopy (SEM) was carried out on a Zeiss Supra 40 field-emission scanning microscope at an acceleration voltage of 5 kV. N2 adsorption-desorption analyses were conducted using a Micrometritics ASAP 2020 accelerated surface area analyzer at 77 K, using Barrett-Emmett-Teller (BET) calculations for the surface area. Before measurements, the samples were degassed in a vacuum at 120 °C for at least 6 h. Fourier transform infrared (FTIR) spectra were measured on a Bruker Vector-22 FTIR spectrometer from 4000 to 400 cm−1 at room temperature. Power X-ray diffraction (PXRD) data were recorded on a Philips X’Pert PRO SUPER X-ray diffractometer equipped with graphite-monochromatized Cu Kα radiation. X-ray photoelectron spectroscopic (XPS) study was performed on an ESCALAB 250 spectrometer (Thermo-VG Scientific). The magnetization curve was measured with a superconducting quantum interference device (SQUID) magnetometer (Quantum Design MPMS XL).
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10

Structural Characterization of Materials

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The X-ray powder diffraction (XRD) was carried out on a D/max-rC X-ray diffractometer with Cu Kα radiation (λ = 1.5406 Å) to investigate the crystallinity of the samples. To examine the morphologies of the samples, transmission electron microscopy (TEM) images and scanning electron microscope (SEM) images were captured on a JEOL JEM-2100F with an accelerating voltage of 200 kV and JEOL JSM7500F (Tokyo, Japan), respectively. The high-angle annular dark-field scanning TEM (HAADF-STEM, Tokyo, Japan) images and energy dispersive X-ray spectroscopy (EDS) elemental mapping/line scan were performed on a JEOL-2100F FETEM at 200 KV. X-ray photoelectron spectroscopy (XPS) was carried out using a Thermo VG Scientific ESCALAB 250 spectrometer (Waltham, MA, USA).
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