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Epma 1600

Manufactured by Shimadzu
Sourced in Japan

The EPMA-1600 is an electron probe micro-analyzer (EPMA) produced by Shimadzu. It is designed to perform quantitative elemental analysis of solid samples with high accuracy and precision. The core function of the EPMA-1600 is to determine the chemical composition of materials at the micro-scale level.

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4 protocols using epma 1600

1

Comprehensive Material Characterization

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X-ray diffraction (XRD) patterns of samples were obtained on PANalytical X’ Pert PRO (PANalytical, Netherlands) by using Cu Kα radiation (λ = 0.15418 nm). The morphologies of the products were observed by the scanning electron microscopy (SEM, Hitachi H-800). The qualitative and semi-quantitative element analysis of the particle sample was tested by using the energy dispersive spectroscopy (EDS, EPMA-1600, Shimadzu Corporation) and X-ray photoelectron spectroscopy (XPS, Axis Ultra, Shimadzu Corporation). The elemental composition of the whole particle was tested by using the atomic absorption spectrometer (AAS, PE-AA400, PerkinElmer Corporation) after dissolving in HNO3.
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2

Measuring Mineral Compositions in Igneous Rocks

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Chemical compositions of olivine and clinopyroxene phenocrysts and chrome spinel hosted by olivine were measured by a Shimadzu electron probe microanalyzer (EPMA 1600) at the CAS Key Laboratory of Crust-Mantle Materials and Environments (CA-CMME) of the University of Science and Technology of China (USTC). Back-scattered electron images were used to check the homogeneity of the minerals. During the quantitative analysis of clinopyroxene (cpx) phenocrysts and spinel inclusions in olivine, the operating conditions were the following: 15 kV accelerating voltage, 20 nA beam current and 1 μm spot size. Only the spinel grains located in the central zone of the host olivine phenocrysts were analysed. For olivine, the analytical method described by ref. 19 (link) was used, employing an accelerating voltage of 20 kV, a beam current of 300 nA and a spot size of 5 μm. Natural minerals and synthetic oxides were used as standards, and a programme based on the ZAF procedure was used for all data correction. All the analysed points in cpx phenocrysts were set within thefourier-transform infrared spectroscopy (FTIR) analysis region. Some electron probe micro-analyses (EPMA) of cpx were conducted with a JEOL electron probe microanalyzer in the Hefei University of Technology. Analytical conditions were similar to those used in USTC.
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3

Fluoride-Induced Enamel Surface Changes

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Changes in the constituents of enamel surface caused by fluoride uptake due to fluoride treatment were analyzed on days 7, 14, 21, and 28 by conducting quantitative analysis of principal components of teeth (Ca and P) using electron probe microanalysis (EPMA, EPMA-1600, Shimadzu, Kyoto, Japan) (1 per group). In the EPMA, 10 µm beam size, 15 kV acceleration voltage, and 20 nA electron beam current were applied, and the quantitative analysis was conducted at four points.
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4

Comprehensive Characterization of NSHG/S8/NiCF Composite

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The surface morphology of the electrodes was examined using field emission scanning electron microscopy (FESEM, JSM6335F, JEOL, Japan). The microstructure of the NSHG/S8/NiCF composite was investigated by high resolution transmission electron microscope (HR-TEM, JEM-2011, JEOL, Japan). The NSHG/S8/NiCF composite was sonicated in ethanol for 5 min and the suspension was dropped in a 200 mesh Cu grid. The elemental mapping of sulfur cathodes was performed using electron probe micro-analyzer (EPMA-1600, Shimadzu, Japan). The stress–strain curve of CuCF and NiCF was obtained using an Instron 5565 A tester. In situ resistance–strain measurements were carried out by a two-probe method through a Keithley 2400 sourcemeter. The chemical structure and composition were investigated by high-resolution X-ray photoelectron spectroscopy (XPS, Axis Ultra, Kratos) with a monochromated Al-Kα (1486.6 eV) excitation source. Raman spectroscopy was performed using a BaySpec Nomadic Raman system with a laser wavelength of 532 nm.
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