Dimension edge afm
The Dimension Edge AFM is an atomic force microscope (AFM) designed for high-resolution imaging and characterization of surfaces and nanoscale materials. It provides accurate topographical data and analysis of sample properties at the nanometer scale.
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12 protocols using dimension edge afm
Dry-Transfer of WSe2 Flakes
FTIR and AFM Analysis of CS/Au Bilayer Films
Quantifying Protein Transfer Using AFM
PEG Thin Film Characterization by AFM
Atomic Force Microscopy of AZO NPs-Induced Membrane Alterations
The cells were seeded on coverslips and incubated for 48 h. A control group was separated and fixed, while the cells exposed to AZO NPs were allowed to interact for further 24 h using a 5 µg/mL solution of AZO NPs. After exposure, the media was removed, and cells were fixed in 10% buffered paraformaldehyde and dried with ethanol at increasing concentrations. Finally, analysis of all the cells (control and exposed groups) was performed using Atomic Force Microscopy to investigate morphology changes in the cells.
Comprehensive Physicochemical Characterization of Materials
recorded on a Bruker Tensor 27 spectrometer using the attenuated total
reflectance mode. The spectral width ranged from 400 to 4000 cm–1, with a resolution of 4 cm–1 and
an accumulation of 32 scans. A PerkinElmer STA 6000 simultaneous analyzer
was used for the thermal analysis. All samples were heated from 30
to 750 °C with a ramp of 20 °C/min in an air atmosphere.
A Malvern Zetasizer Nano series with a 4 mW 632.8 nm laser was used
to determine the average diameter and surface charge of the samples
in aqueous suspension (∼0.1 wt %) at pH 7. A JEOL 6480LV scanning
electron microscope and a Bruker Dimension Edge AFM was used to record
the micrographs. Samples for the scanning electron microscopy (SEM)
analysis were suspended in deionized water, and then a drop was placed
onto a carbon-coated copper grid under an air atmosphere until dryness
was achieved. In the case of atomic force microscopy (AFM), a diluted
solution of the sample was spin-coated at 3000 rpm for 20 s in a silicon
substrate (1–10 Ω cm) from the International Wafer Service,
Inc. A TriStar II 3020 surface area analyzer was used to determine
the specific surface area of the samples by applying the Brunauer–Emmett–Teller
(BET) method. The degassing temperature was set at 120 °C for
8 h under a N2 flow.
Characterization of Graphene Quantum Dots and Polymer Films
AFM Imaging of DNA on Functionalized Mica
Analyzing Ceramic Surface Hardness Modifications
DNA Imaging on Modified Mica Surfaces
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