The nanoscale patterns on a recordable Blu-ray disk (after recording of data and removal of the cover layer) or a semiconductor wafer were observed on a Philips XL30 SEM operating at an accelerating voltage of 10 kV without gold coating. The wafer pattern with 45-nm features was obtained by sputter-coating the wafer with gold at a current of 30 mA for 180 s (BalTec SCD005). To observe the bottom surface of the mSIL, it was detached from the observed sample using double-sided adhesive tape. AFM images were taken on a Bruker MultiMode 8 AFM (Veeco Instruments) in tapping mode.
Multimode 8 afm
Manufactured by Veeco
The MultiMode 8 AFM is an atomic force microscope (AFM) system developed by Veeco. It is designed to provide high-resolution imaging and measurement capabilities for a wide range of samples and applications. The MultiMode 8 AFM allows users to study the topography, properties, and interactions of materials at the nanoscale level.
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5 protocols using multimode 8 afm
1
Nanoscale Patterns in Blu-ray and Semiconductors
2
AFM Analysis of tNGs Aqueous Solutions
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AFM measurements were recorded on a MultiMode 8 AFM equipped with a Nanoscope V controller (Veeco Instruments, Santa Barbara, California). The data were analyzed using NanoScope Analysis 1.3 software and statistical analyses were performed on 10 µm x 10 µm images. The tNGs aqueous solutions (2.5 mg/mL) were air dried on a Mica sheet. Samples were measured with Nano World tips, Soft Tapping Mode (SNK-10), with resonance frequency of 56-75 kHz and force constant of 0.24 N/m.
3
Morphological Analysis of AEMs and MEAs
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The surface and cross-section morphologies of AEMs and MEAs were observed using a scanning electron microscope (SEM, FE-SEM S-4800, Hitachi, Japan) at 15 kV. Membrane and MEA samples for observing the cross-section morphologies were fractured in liquid nitrogen, and all samples were coated with a thin platinum layer using an ion sputtering system (E-1045, Hitachi). Atomic force microscopy (AFM) was used to observe the surface microphase separation of AEMs on a MultiMode 8 AFM (Veeco) with a NanoScope V controller. AEMs were tested in OH− form in the dry state.
4
AFM Imaging of ds RNA-DNA Hybrids
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For AFM imaging of the ds RNA–DNA hybrid structures, 30 μl of 0.1 mg ml−1 polyornithine (Sigma) solution was added to freshly cleaved mica and stand for 3 min to increase the binding to the structures before applying the samples. Then the mica was rinsed with 1 ml water and dried with compressed air. An aliquot of 5 μl of each sample (about 5 nM) in 1 × TAE-Mg buffer (11 mM MgCl2, 40 mM Tris, 20 mM acetic acid, 1 mM EDTA, pH 8.0) was applied to the treated mica and stand for 1 min. Then the mica was rinsed with 1 ml water and dried with compressed air. AFM imaging was performed on a Veeco MultiMode 8 AFM in the ScanAsyst in air mode using the scanayst-air tips (Veeco). The AFM images were processed with the software Gwyddion.
5
tNG Characterization by Atomic Force Microscopy
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AFM measurements were recorded by a tapping mode with a MultiMode 8 AFM equipped with a Nanoscope V controller from Veeco Instruments, Santa Barbara, California. The data was analyzed using NanoScope Analysis 1.3 software and statistical analysis were performed in a 10 µm × 10 µm image. The tNGs aqueous solutions (2.5 mg mL -1 ) were air dried on a Mica sheet. Samples were analyzed by Nano World tips, Soft Tapping Mode (SNK-10), with a resonance frequency of 56-75 kHz and a force constant of 0.24 N m -1 .
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