It 100 la
The IT-100 LA is an electron beam lithography system designed for high-resolution nanoscale patterning. It features an electron beam column that delivers a focused electron beam for direct write lithography on various substrates. The core function of the IT-100 LA is to enable the precise and controlled exposure of resist materials for the fabrication of nanostructures and devices.
Lab products found in correlation
2 protocols using it 100 la
Comprehensive Characterization of Novel Material
Characterization of Layered Double Hydroxides
were obtained
with a Rigaku Rint-2500 diffractometer under the following conditions:
40 kV, 30 mA, and Cu Kα radiation. The powder samples were recorded
with a step of 0.04°(2θ) in the range from 1.5 to 80°
with a scanning rate of 0.5°/min. FTIR spectra were obtained
with an FT/IR-460 Plus spectrometer (JASCO) using the KBr disk method.
The morphology of the LDH sheets was investigated using scanning electron
microscopy (SEM, JEOL IT-100 LA). TG analyses were determined using
a TG8120 thermobalance (Rigaku) with a heating rate of 10 °C/min
under air flow. The UV–vis absorption spectra of the solutions
were collected on a Shimadzu UV-3100PC spectrophotometer with the
measurement range between 190 and 320 nm. UV analyses on solid samples
(powder form) were performed on a Jasco V-750 spectrophotometer with
the wavelength range between 190 and 900 nm and the use of BaSO4 as a reference. The solution and solid-state fluorescence
spectra were recorded on a Jasco V-750 spectrophotometer with the
use of an excitation wavelength at 450 nm.
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