For AFM measurements, a Dimension ICON3 scanning probe microscope (Bruker AXS S.A.S.) was used in ScanAsyst mode (non-contact) in air under ambient conditions using aluminium coated silicon cantilevers (OLTESPA-R3). The concentrated dispersions were diluted with IPA to optical densities <0.1 at 300 nm. A drop of the dilute dispersions (15 μL) was flash-evaporated on pre-heated (175 °C) Si/SiO2 wafers. After deposition, the wafers were rinsed with ∼15 mL of water and ∼15 mL of IPA and dried with compressed nitrogen. Typical image sizes ranged from 12 × 12 μm2 for larger nanosheets to 3 × 3 μm2 for small nanosheets at scan rates of 0.5–0.8 Hz with 1024 lines per image. Previously published length corrections were used to correct lateral dimensions from cantilever broadening and pixilation effects by calibration using transmission electron microscopy (TEM).26,65 (link)
Dimension icon3 scanning probe microscope
Manufactured by Bruker
The Dimension ICON3 is a scanning probe microscope (SPM) designed for high-resolution imaging and characterization of surfaces. It provides precise topographical and electrical measurements at the nanoscale level. The instrument features advanced technology for accurate and stable sample scanning, enabling users to obtain detailed information about the physical and electronic properties of a wide range of materials.
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Lab products found in correlation
3 protocols using dimension icon3 scanning probe microscope
1
AFM Characterization of Nanosheet Dispersions
2
AFM Characterization of Nanosheets
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For atomic force microscopy, a Dimension ICON3 scanning probe microscope (Bruker AXS S.A.S.) was used in ScanAsyst mode (non-contact) in air under ambient conditions using aluminium coated silicon cantilevers (OLTESPA-R3). The concentrated dispersions were diluted with isopropanol to optical densities < 0.1 at 300 nm. A drop of the dilute dispersions (15 μL) was flash-evaporated on pre-heated (175 °C) Si/SiO2 wafers (0.5x0.5 cm2) with an oxide layer of 300 nm. After deposition, the wafers were rinsed with ∼ 50 mL of water and ∼ 50 mL of isopropanol and dried with compressed nitrogen. Typical image sizes ranged from 20x20 μm2 for larger nanosheets to 5x5 μm2 for small nanosheets at scan rates of 0.5–0.8 Hz with 1024 lines per image. Step height analysis was used to convert the apparent AFM thickness to layer number as discussed in the main manuscript. Previously published length corrections were used to correct lateral dimensions from cantilever broadening [38] (link).
3
Atomic Force Microscopy of Nanosheets
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For AFM measurements, a Dimension ICON3 scanning probe microscope (Bruker AXS S.A.S.) was used in ScanAsyst mode (non-contact) in air under ambient conditions using aluminum-coated silicon cantilevers (OLTESPA-R3). The concentrated dispersions were diluted with isopropanol to optical densities <0.1 at a wavelength of 300 nm. A drop of the dilute dispersions (15 μL) was flash-evaporated on pre-heated (175 °C) Si/SiO2 wafers (0.5x0.5 cm 2 ) with an oxide layer of 300 nm thickness. After deposition, the wafers were rinsed with ~15 mL of water and ~15 mL of isopropanol and dried with compressed nitrogen. Typical image sizes ranged from 20x20 μm 2 for larger nanosheets to 5x5 μm 2 for small nanosheets and were acquired at scan rates of 0.5-0.8 Hz with 1024 lines per image. Previously published length corrections were used to correct lateral dimensions from cantilever broadening.
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