Aptms

APTMS (purity: 96%), 2-cyanoethyltriethoxysilane (CETES) (purity: 97%), EDC (purity: 98%), tetramethylsilane (TMS) (purity: 99%), and tris(2,4-pentanedionato)chromium(III) [Cr(acac)₃] (purity: 98%) were purchased from Tokyo Chemical Industry Co., Ltd. (Tokyo, Japan). HOTf (purity: 99%) was obtained from Kanto Chemical Co., Inc. (Tokyo, Japan). Sodium hydroxide (NaOH) (purity: 97%), NHS (purity: 95%), and potassium bromide (KBr) (purity: 99%) were purchased from Nacalai Tesque Inc. (Kyoto, Japan). Dimethyl sulfoxide (DMSO) (purity: 99%) and other solvents were obtained from FUJIFILM Wako Pure Chemical Co., Ltd. (Osaka, Japan). The DMSO used in the preparation of POSS polyamide was simply dehydrated by adding molecular sieves 3A, which had been dried in an oven at 100 °C for over 1 day. Other reagents and solvents were used without further purification.

APTMS, MAPTMS, DMAPTMS, TMTESPAC, tris(2,4-pentanedionato)chromium(III) [Cr(acac)₃], and tetramethylsilane (TMS) were purchased from Tokyo Chemical Industry Co., Ltd. (Tokyo, Japan). HNTf₂ was purchased from Kanto Chemical Co., Inc. (Tokyo, Japan). 2,5-Dihydroxybenzoic acid (DHB) was purchased from Bruker Daltonik Gmbh (Bremen, Germany). Other reagents and solvents were purchased from FUJIFILM Wako Pure Chemical Co., Ltd. (Osaka, Japan). All reagents and solvents were used without further purification.