The surface topography of isolated SnS was analyzed by AFM (Digital Instruments, USA) in tapping mode with controller Nanoscope IIIa. The isolated dispersion of SnS was drop‐casted on a pre‐cleaned Si substrate and vacuum dried before measurement. The vacuum‐dried sample was placed on the AFM stage to scan. The AFM imaging was performed at ambient conditions, that is, a temperature of 25 ± 1 °C, and relative humidity of 50–60%. Pertinent scanning parameters were as follows: scan rate for all measurements – (1.08 Hz for Figure 1b ), (1.70 Hz for Figure 1c ); aspect ratio: 1:1; resolution: 512 samples/line, 512 lines. The FFT images are analyzed in NanoScope Analyses 1.5 software, Bruker, USA.
Nanoscope iiia
Manufactured by Digital Instruments
Sourced in United States, Italy
The Nanoscope IIIa is a scanning probe microscope that uses atomic force microscopy (AFM) to image and analyze surfaces at the nanoscale. It provides high-resolution topographical information about a sample's surface features.
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Lab products found in correlation
Multilab 2000, by Thermo Fisher Scientific (3 mentions)
Jsm 7500f, by JEOL (2 mentions)
D max 2500, by Rigaku (2 mentions)
Multimode atomic force microscope, by Digital Instruments (2 mentions)
Ultraviolet visible spectrophotometer, by Agilent Technologies (1 mentions)
Nano z, by Malvern Panalytical (1 mentions)
Acetone, by Merck Group (1 mentions)
Cary 1e uv vis spectrophotometer, by Agilent Technologies (1 mentions)
Escalab220i xl spectrometer, by VG Scientific (1 mentions)
S 4800, by JEOL (1 mentions)
Autopore 4 9500 porosimeter, by Micromeritics (1 mentions)
Dimension 3000, by Digital Instruments (1 mentions)
Labram aramis spectrometer, by Horiba (1 mentions)
Jsm 7600f microscope, by JEOL (1 mentions)
Nch 50 point probe, by NanoWorld (1 mentions)
Jem 2200f, by JEOL (1 mentions)
Smartlab3, by Rigaku (1 mentions)
4200 scs, by Agilent Technologies (1 mentions)
Alpha 300r confocal raman microscope, by WITec (1 mentions)
Cypher es environmental afm, by Oxford Instruments (1 mentions)
71 protocols using nanoscope iiia
1
Atomic Force Microscopy Topography of SnS
2
Multifaceted Characterization of Cystamine-Conjugated Graphene Oxide
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A field emission scanning electron microscope (FE-SEM; JSM-7500F; JEOL, Tokyo, Japan), and an atomic force microscope (AFM; Nanoscope IIIa, Digital Instruments, Tonawanda, NY, USA) with a J scanner were used to assess the morphology of cystamine-conjugated GO and the cells. An Escalab MK II photoelectron spectrometer (VG Scientific Ltd., East Sussex, UK) was used for X-ray photoelectron spectroscopy (XPS) measurements. A Varian ultraviolet-visible spectrophotometer was used for measuring absorbance. A Varian 3100 Fourier transform infrared (FT-IR) (Excalibur series) spectrophotometer was used for FT-IR spectra measurements. A ZetaSizer (Nano-Z; Malvern Instruments, Malvern, UK) was used for zeta potential measurement.
3
AFM Characterization of Organic Molecules
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AFM measurements were performed using two commercial instruments, a Nanoscope IIIa (Digital Instruments, Inc., Milano, Italy) and XE-100 (PSIA, Inc., Santa Clara, CA, USA), operating in ambient air and a nitrogen atmosphere. A hygrometer (Tecpel co., Ltd., Taipei, Taiwan) was used to measure humidity and temperature. Adhesion and lateral force measurements in ambient air were mainly performed with PSIA equipment. The lateral force and topography of organic molecule patterns in air were imaged in contact mode using silicon AFM probes (NSC36; PSIA, Inc., Santa Clara, CA, USA) with soft cantilevers (nominal spring constant of 0.6 N/m) and sharpened conical tips (nominal curvature radius of 10 nm).
The experiments in environmental controlled conditions such as constant humidity and nitrogen atmosphere were performed with the Nanoscope IIIa. The adhesion and lateral forces of organic molecule monolayers were measured in contact mode using triangular silicon nitride cantilevers (NPS, 15 nm radius) with a nominal force constant of 0.58 N/m (manufacturer’s specification). The gold ball tip was used to increase the surface area to be modified by peptides for measuring mixed organic molecule monolayers. Its scanning mode was contact mode and the gold ball on cantilevers (nominal force constant of 0.06 N/m) was 1 μm in diameter. All images were acquired at a line scan rate of 0.5 Hz.
The experiments in environmental controlled conditions such as constant humidity and nitrogen atmosphere were performed with the Nanoscope IIIa. The adhesion and lateral forces of organic molecule monolayers were measured in contact mode using triangular silicon nitride cantilevers (NPS, 15 nm radius) with a nominal force constant of 0.58 N/m (manufacturer’s specification). The gold ball tip was used to increase the surface area to be modified by peptides for measuring mixed organic molecule monolayers. Its scanning mode was contact mode and the gold ball on cantilevers (nominal force constant of 0.06 N/m) was 1 μm in diameter. All images were acquired at a line scan rate of 0.5 Hz.
4
Synthesis and Characterization of AS-OPV Molecules
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AS-OPV molecule (Fig. 1 ), namely OPV substituted by two aldehydes at both ends, is home-synthesized based on the reported literature.32 (link) Molecular adlayer is prepared and STM measurement is preformed according to the previous work.23 (link) Acetone is bought from Sigma-Aldrich with purity higher than 99.9%. A drop of Acetone solution containing the AS-OPV molecule (<10−4 M) was directly deposited onto a freshly cleaved and atomically flat HOPG surface for the preparation of oligomer assembly. Before STM measurement, the as-prepared sample was placed in the air for 5 minutes until the solvent evaporated. STM experiments were carried out by means of a NanoScope IIIa (Digital Instruments) at room temperature. The tunneling tips were prepared by mechanically cutting Pt/Ir wire (90/10). More details about the experimental setup and procedures see the ref. 23 and 32 (link).
5
Tapping Mode AFM Imaging Protocol
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The measurements were performed in tapping mode in air using the Extended Multimode AFM with Nanoscope IIIa controller system Digital Instruments, Inc. Veeco Metrology, Santa Barbara, CA, USA). Silicon tips that were 130 µm long were used for imaging. The images were analyzed using the software WsxM (Nanotech Electronica S.L., Madrid, Spain).
6
Metal Surface Roughness Analysis
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The metal surface properties were assessed via atomic force microscopy (AFM; Nano Scope IIIa, Digital Instruments, USA). The measured surface roughness was presented as a roughness average (Ra) of three tests. The Ra value for each specimen was defined as the arithmetic average of all absolute distances of the roughness profile from the center line within the measuring length.
7
Synthesis and Characterization of Graphene Aerogel
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The glass vessel containing the emulsion above was immersed in water bath of 70 °C for 12 h. Then the vessel was cooled to room temperature naturally and the floating gel was immersed in deionized water for 24 h to remove residual reducing agent. The graphene gel was directly frozen at −20 °C for 12 h and the two liquids were removed simultaneously by freeze drying to obtain aerogel. The morphologies of the as-synthesized aerogel were characterized by SEM (HITACHI S-4800) and TEM (JEOL-1010) operated at 100 kV. AFM measurements were performed on a tapping-mode atomic force microscope (Nanoscope IIIa, Digital Instruments, Santa Barbara, CA), with a silicon cantilever probes. XRD was performed on a Rigaku D/max-2500 diffractometer with Cu Kα radiation (λ = 1.5418 Å) at 40 kV and 200 mA. UV-visible spectrum was determined using a Varian Cary 1E UV-vis spectrophotometer. XPS was determined by VG Scientific ESCALab220i-XL spectrometer using Al Ka radiation. The porosities were determined by mercury intrusion porosimetry using a Micromeritics Autopore IV 9500 porosimeter. The sample was subjected to a pressure cycle starting at 5 psia, increasing to 44500 psia in predefined steps to give pore size/pore volume information. The compression test was carried out using a model 3342 Instron Universal Testing Machine at a rate of 50% strain min−1.
8
Atomic Force Microscopy Analysis of Blank-NC and TMX-NC
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Blank-NC and TMX-NC (5.0 mg/mL) were analyzed by Atomic Force Microscopy (AFM, Digital Instruments Inc., Santa Barbara, CA, USA) in a Dimension 3000 equipment monitored by a Nanoscope IIIa controller from Digital Instruments (Santa Barbara, CA, USA) using the NanoScope Analysis software 5.31rl (5.30r3sr3) for data acquisition. A sample of each formulation (5 μL) was deposited on freshly cleaved mica, spread and dried with a stream of argon. Measurements were performed in air at room temperature, in tapping mode, using a silicon probe with cylindrical tip of 228 μm radius, resonance frequencies of 75–98 kHz, spring constants of 3.0–7.1 N/m, and a nominal tip curvature radius of 5 nm. The geometric diameters of the particles were measured at half-height in topographical profiles. Images were recorded in scanning areas of 2.0 × 2.0 µm and 1.6 × 1.6 µm with a scan rate of 1 Hz.
9
Morphological Characterization of Nanoparticles by AFM
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We performed a morphological analysis of the NCs by scanning probe microscopy in atomic force mode (AFM), using the equipment Multimode and Dimension 300, both monitored by NanoScope IIIa controller (Digital Instruments, Santa Barbara, Malvern, UK). We obtained the images in “tapping mode”, using silicon probes of 228 μm length, with a resonance frequency of 75–98 kHz, force constant of 29–61 N/m, and a nominal tip radius of curvature of 5 to 10 nm. We obtained the images by depositing approximately 5 μL of NCs samples on a freshly cleaved mica surface. After deposition on mica, we dried the samples using argon flow. We executed the scan at a rate of 1 Hz with a resolution of 512 × 512 pixels. We performed sample analysis using the software “Analysis Section” of the equipment system. The values represent the mean ± SD derived from approximately 40 particle measurements.
10
Characterization of Conductive Electrodes
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A semiconductor characterization system (Keithley 4200, Beaverton, OR, USA) was used to analyze the electrical properties of the conductive electrodes. Bending and stretching tests were also performed. Photo-detective tests under the irradiation of an ultraviolet (UV) lamp (8 W, Vilber Lourmat, Marne La-Vallee, France) were also carried out at various wavelengths. The tests were also done under a tungsten–halogen lamp (FOK-100 W, Fiber Optic Korea, Cheonan, Korea). Atomic force microscopy (AFM) and scanning electron microscopy (SEM) images were obtained using a multimode AFM (Nanoscope IIIa, Digital Instruments, Bresso, Italy) and FE-SEM (JSM-7500F, Jeol, Tokyo, Japan), respectively.
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