N bu4sn

Bis(triphenylphosphine)palladium(ii) dichloride, triphenylphosphine, copper(i) iodide, 1-bromo-4-tert-butylbenzene, 1,4-dibromobenzene, sodium hydride, iodomethane, 2-methyl-3-butyn-2-ol, tetrahydrofuran (THF), triethylamine, N,N-dimethylformamide (DMF), chloroform (CHCl₃), methanol (MeOH), trifluoroacetic acid (TFA), dimethyl sulfoxide (DMSO) (Fujifilm Wako Pure Chemical (Wako)), chlorotrimethylsilane (Tokyo Chemical Industry), n-butyllithium (Kanto Chemical), tantalum(v) chloride, and phenylacetylene (Sigma-Aldrich) were used without additional purification. n-Bu₄Sn (cocatalyst for polymerization, Wako) and toluene (solvent for polymerization, Wako) were distilled over CaH₂ (Wako) prior to use. 1-(p-Trimethylsilyl)phenyl-1-propyne (SPP),^{21 (link)} 4-(tert-butyl)diphenylacetylene (BDPA),^{10 (link)} and 4-(trimethylsilyl)diphenylacetylene (SDPA)^{11 (link)} were prepared according to the literature.

The polymerization solvent, toluene (Fujifilm Wako Pure Chemical Co., Ltd., Osaka, Japan), was purified twice by distillation in the presence of CaH₂ (Fujifilm Wako Pure Chemical Co., Ltd.). The main catalyst, TaCl₅ (99.999%, Sigma-Aldrich, St. Louis, Missouri, USA), was used without further purification, while the cocatalyst, n-Bu₄Sn (Fujifilm Wako Pure Chemical Co., Ltd.), was used after distillation in the presence of CaH₂. Phenylacetylene (Sigma-Aldrich), 1,4-dibromobenzene, 1-bromo-4-tert-butylbenzene, triethylamine, triphenylphosphine, copper(i) iodide, dichlorobis(triphenylphosphine)palladium(ii), n-butyllithium, trifluoroacetic acid (TFA), chlorotrimethylsilane, 2-methyl-3-butyn-2-ol, sodium hydride, aqueous sodium nitrate, and other common solvents (Fujifilm Wako Pure Chemical Co., Ltd.) were used without further purification. 1-(p-Trimethylsilyl)phenyl-2-(p-trimethylsilyl)Phenylacetylene (1a),^{23 (link)} 1-phenyl-2-(p-tert-butyl)Phenylacetylene (1b),^{11 (link)} and 1-phenyl-2-(p-trimethylsilyl)Phenylacetylene (1c)^{10 (link)} were synthesized according to the methods reported in literature.