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Flsp920 double monochromator luminescence spectrometer

Manufactured by Hamamatsu Photonics

The FLSP920 double-monochromator luminescence spectrometer is a laboratory instrument designed for the analysis of luminescence properties. It features a double-monochromator system to provide high-resolution spectral analysis of luminescent samples. The core function of the FLSP920 is to measure and analyze the emission spectrum of luminescent materials.

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3 protocols using flsp920 double monochromator luminescence spectrometer

1

Spectroscopic Characterization of Materials

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UV-vis-NIR absorption spectroscopy was conducted on a PerkinElmer Lambda 1050 spectrophotometer at various temperatures for both solution and solid states. Steady-state photoluminescence spectra were recorded though an Edinburgh Instruments FLSP920 double-monochromator luminescence spectrometer equipped with a nitrogen-cooled near-IR sensitive photomultiplier (Hamamatsu).
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2

Characterization of nanomaterials

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SEM images were recorded by a FEI Quanta 3D FEG microscope, using a 5-kV electron beam and a secondary electron detector. XRD patterns were obtained by a Bruker 2D phaser (Cu Kα radiation, λ = 1.5405 Å). UV-vis-NIR absorption measurements were performed by PerkinElmer Lambda 900 UV-vis-NIR spectrophotometer. Steady-state photoluminescence spectra were measured by Edinburgh Instruments FLSP920 double-monochromator luminescence spectrometer, with a near-infrared photomultiplier (Hamamatsu).
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3

Characterization of Thin Film Materials

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A PerkinElmer Lambda 1050 spectrophotometer was used to measure UV–vis–NIR absorption for solution and thin films, and an Edinburgh Instruments FLSP920 double‐monochromator luminescence spectrometer, equipped with a nitrogen‐cooled near‐IR sensitive photomultiplier (Hamamatsu), was utilized to record corresponding photoluminescence. 2D‐GIWAXS was performed based on a Xenocs‐SAXS/WAXS system, where the X‐ray wavelength was 1.5418 Å and the fixed angle was 0.2° for X‐ray irradiation. Before measurement, the thin films spin‐coated from various solutions were annealed at 100°C for 30 min to remove residual solvent.
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