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Spa 400 dfm

Manufactured by Seiko Instruments
Sourced in Japan

The SPA-400 DFM is a digital force gauge designed for precise measurement of forces. It features a high-resolution display and integrated data logging capabilities. The device is intended for use in various industrial and laboratory settings where accurate force measurement is required.

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2 protocols using spa 400 dfm

1

Surface Characterization of SiNW-FET Devices

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The surface of the SiNW-FET device was cleaned using the oxygen plasma cleaner (Harrick Plasma, New York, NY, USA) before the surface modification. Each n-type SiNW-FET device had two nanowires, and each nanowire had a length of 2 μm and a width of 200 nm [20 (link)], measurements that had been used in previous reports [20 (link),21 (link),22 (link),23 (link)]. The SiNW-FET measurements were carried out on the chip-on-board (COB) detection platform provided by Helios Bioelectronics, Inc. (Hsinchu County, Taiwan). Atomic force microscopy (AFM; SPA-400 DFM, Seiko, Japan) was utilized to analyze the surface roughness of the FET surface after each modification step. In addition, X-ray photoelectron spectroscopy (XPS; Thermo VG-Scientific, Loughborough, UK) was applied to identify the elemental composition and chemical state of the SiNW-FET surface.
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2

Characterization of (6,5)-enriched SWCNT Nanocomposites

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Absorption data were recorded on a Shimadzu UV-3150 spectrophotometer using a standard cell with a path length of 10 mm. TEM measurements for (6, 5)-enriched SWCNT/fullerodendron/Pt(II) nanocomposites were conducted using a JEM-2100 transmission electron microscope (80 kV). The specimens for the measurements were prepared by applying a few drops of sample solution onto a holey carbon-coated copper grid, and then evaporating the solvent. Atomic force microscopy (AFM) observation was carried out using a Seiko SPA 400-DFM. Samples for observation were prepared by placing a drop of the aqueous specimen on freshly cleaved mica, then allowing each drop to dry. X-ray photoelectron spectroscopy (XPS) measurements were conducted with a JPS-9030 spectrometer using a monochromatic Al Kα X-ray source with a pass energy of 20 eV. The spectra were adjusted with reference to the C 1 s peak at 284.6 eV. Three-dimensional fluorescence spectra data were obtained using a spectrofluorometer (Shimadzu, NIR-PL system). (6, 5)-enriched SWCNTs were purchased from Sigma-Aldrich Co. All other reagents were purchased from Kanto Kagaku Co., Ltd, Sigma-Aldrich Co., and Tokyo Kasei Co., Ltd. All chemicals were used as received. Fullerodendron was prepared according to the reported procedure29 .
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