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1050 uv vis nir spectrophotometer

Manufactured by PerkinElmer

The 1050 UV/vis/NIR spectrophotometer is a laboratory instrument designed to measure the absorption or transmission of light in the ultraviolet, visible, and near-infrared wavelength ranges. It is capable of performing spectral analysis across these regions of the electromagnetic spectrum.

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3 protocols using 1050 uv vis nir spectrophotometer

1

Structural and Optical Characterization of Thin Films

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The top-view morphologies
of the thin films were examined by field emission scanning electron
microscopy (SEM) (Zeiss Sigma) with an in-lens detector and 5 kV accelerating
voltage. High-angle annular dark-field scanning transmission electron
microscopy (HAADF-STEM) of the thin-film cross sections was performed
using a JEOL ARM200F TEM setup operated at 200 kV. TEM cross sections
of the thin films were prepared using focused ion beam milling. Pt
and carbon protective layers were deposited using ion-beam-induced
deposition (IBID) and electron-beam-induced deposition (EBID) to preserve
the thin-film structure during the milling process.
Structural
characterization was performed using a Bruker D8 Eco X-ray diffractometer
(XRD) with a Cu Kα (λ= 1.5406 Å) source and a Lynx-eye
detector in a grazing incidence configuration (GI-XRD) at an incident
angle of 0.5° and in the 2θ range of 20–80°.
A Thermo Scientific Kα X-ray photoelectron spectroscopy (XPS)
setup equipped with a monochromated Al Kα source (hν = 1486.6 eV) was used for the chemical analysis. The binding
energy was corrected with respect to the adventitious carbon C 1s
peak at 284.8 eV. Peak fitting was done using the Casa XPS software.
The optical absorbance of the films was characterized with a PerkinElmer
1050 UV/vis/NIR spectrophotometer in the wavelength range of 300–900
nm.
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2

Optical Characterization of Perovskite Thin Films

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For the FA0.83Cs0.17Pb(I0.9Br0.1)3 thin-films, transmission and reflection spectra were measured with a PerkinElmer 1050+ UV-Vis-NIR spectrophotometer equipped with an integrating sphere accessory. The reflection spectra were corrected with a mirror standard to account for the high specular reflectance of the films. The resulting spectra are shown in Supplementary Fig. 4. For all calculations a reflectance of 25% was used, resulting in an absorptance of 75% < 500 nm.
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3

Characterization of Ag3PO4 Particles

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The morphologies of the Ag3PO4 particles on Si substrate were examined by field emission scanning electron microscope (SEM) (Zeiss Sigma) with an in-lens detector and 5 kV accelerating voltage. Structural characterization was done on dried Ag3PO4 particles in powdered form. It was performed using a Bruker D8 Eco X-ray diffractometer (XRD) with a Cu Kα (λ= 1.5406 Å) source and a Lynx-eye detector in a Bragg-Brentano (θ -2θ) configuration in the 2θ range from 20° to 72°. A Thermo Scientific K-Alpha X-ray photoelectron spectroscopy (XPS) setup equipped with a monochromatic Al Kα source (hν = 1486.6 eV) was used for the chemical analysis. The Ag3PO4 particles were drop-casted on FTO substrate for the measurement. The binding energy was corrected with respect to the adventitious carbon C 1s peak at 284.8 eV. The optical absorbance of the Ag3PO4 on a glass substrate was characterized with a Perkin Elmer 1050 UV/Vis/NIR spectrophotometer in the wavelength range of 300 nm to 900 nm.
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