Cypher atomic force microscope
The Cypher atomic force microscope is a high-performance instrument designed for advanced nanoscale imaging, measurement, and characterization. It provides a versatile platform for exploring the topography and properties of surfaces at the nanoscale.
Lab products found in correlation
8 protocols using cypher atomic force microscope
Visualizing Colloidal Protein Biopolymers
Atomic Force Microscopy Characterization
Optimized SrMnO3 Thin Film Growth
SrMnO3 thin films were grown on TiO2-terminated
(001)-oriented SrTiO3 substrates (Shinkosha) by PLD using
a stoichiometric, polycrystalline target (Lesker). For making the
single terminated TiO2 surface of STO substrates, the STO
substrates were prepared by ultrasonification in water and then treated
by a combination of etching with a buffered HF solution and ex situ annealing at 1050 °C.73 (link) The growth temperature was 800 °C, the oxygen pressure was
0.05 mbar, the laser fluency was 2 J cm–2, the laser
frequency was 1 Hz, and the growth rate was 0.04 monolayer per pulse.
The wavelength of the KrF laser was 248 nm. The growth mode is a layer-by-layer
growth as evidenced by the observation of reflection high-energy electron
diffraction (RHEED) oscillations. The surface morphology was investigated
by a Cypher atomic force microscope (Asylum Research, Santa Barbara,
CA, U.S.A.).
AFM Imaging of Surface Roughness
Quantitative Conductance Analysis of Bacterial Filaments
Atomic Force Microscopy of S-layer Sheets
was done with an Asylum Research Cypher atomic force microscope (Asylum
Research Santa Barbara, CA, USA). Measurements were performed in liquid
using the AC mode. A cantilever “BioLever mini” (Olympus
BL-AC40TS-C2) with a resonance frequency of about 25 kHz in water
and a stiffness of 0.09 N m–1 has been used. A 10
μL portion of recrystallized S-layer sheets was dropped on freshly
cleaved mica attached to a steel sample puck. They were left undisturbed
for 5 min to promote adhesion. Most of the supernatant was removed
with a pipet and replaced by a droplet of recrystallization buffer
(1.5 mM Tris, 10 mM CaCl2, pH 8) to keep the sample in
liquid upon transfer to a sample stage on AFM and following the measurement.
The temperature was kept at 25 °C, scan frequency at 0.5 Hz,
and scan angle at 90°.
Morphological Characterization of PLA Blends
AFM was conducted using a Cypher™ atomic force microscope (Oxford Instruments Asylum Research, Inc., Santa Barbara, CA, USA) in the contact mode. Roughness parameters, calculated as the root mean square (Rq) and average roughness (Ra), were determined for each type of film and were calculated from the Htr mode image. Images were obtained in the Dfr mode. The film area for the determination of roughness was 900 μm2.
Characterization of Membrane Surface Topography and Chemistry
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