4 methylbenzenethiol 4 mbt

HAuCl₄·3H₂O (Au > 99.9%) was purchased from Aladdin (Shanghai, China). NaBH₄ (>96%), L-ascorbic acid (AA, >99%), cetyltrimethyl ammonium bromide (CTAB) (>99%), AgNO₃ (>99%), polyaniline emeraldine base (PANI-EB, 100 kDa), (3-Mercaptopropyl) trimethoxysilane (MPTMS, 95%), 4-methylbenzenethiol (4-MBT, 98%), N,N-dimethylacetamide (DMA, 99.8%) were purchased from Sigma-Aldrich (Milwaukee, WI, USA). Sodium oleate (NaOL) (>97%) was purchased form TCI (Shanghai, China). The HCl (37%), NaOH, and glycerol are of analytical grade. All chemicals were used without further purification. Deionized water (18.2 MΩ cm⁻¹) was used during the growth of the nanorods and preparation of the samples.

Hydrofluoric acid (HF, 49 wt%) and potassium hydroxide (KOH, GR 95%) were purchased from Aladdin (Shanghai, China). Hydrogen peroxide (H₂O₂, 30 wt%), sulfuric acid (H₂SO₄, 98 wt%), and ethanol were of analytical grade and received from Guangzhou Chemical Reagent Factory (Guangzhou, China). Photoresist SUN-120P was purchased from Suntific Microelectronic Materials Co., Ltd. (Weifang, Shandong, China) for patterning Si. 4-Methylbenzenethiol (4-MBT, 98%) was purchased from Sigma-Aldrich (St. Louis, MO, USA). Rhodamine 6G (R6G) was purchased from J&K Chemical (Beijing, China). Methyl parathion solution (MPT, C₈H₁₀NO₅PS, 100 μg/mL in methanol) was obtained from Sinopharm Chemical Reagent Co., Ltd. (Shanghai, China). DP-type (100) 4” Si wafer with a resistivity of 0.001–0.005 Ω·cm was purchased from Lijing Optoelectronics Co., Ltd. (Suzhou, China). Deionized (DI) water (18.25 MΩ·cm at 25 °C) was prepared using a Milli-Q Plus water purification system (Sichuan Wortel Water Treatment Equipment Co., Ltd., Chengdu, Sichuan, China). All chemicals were used as received.