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11 protocols using e4980a lcr meter

1

Characterization of HQReO4 Thin Films

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The polarization–voltage (P-V) hysteresis loops of fabricated Au/HQReO4/ITO capacitor were measured using a FE tester (Radiant Technology, Albuquerque, NM, USA). The surface morphology and cross-sectional images of HQReO4 thin films were observed using field emission scanning electron microscopy (FE-SEM) (S-4700, Hitachi, Tokyo, Japan). From the cross-sectional SEM images, the thickness of our samples was estimated to be around 2.5 ± 0.25 μm. Atomic force microscopy (AFM) (XE 100, Park systems, Suwon, Korea) was used to measure the surface roughness of the films. The crystalline structure of the films was analyzed using an X-ray diffractometer with Cu Kα radiation (Bruker, D8 Advance, Bruker, Billerica, MA, USA). The XRD patterns were recorded at various temperatures to observe the structural variations in HQReO4 thin films. The dielectric constant was measured using Keysight E4980A LCR Meter (Keysight technologies, Santa Rosa, CA, USA) (@ 100 KHz).
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2

Detailed Characterization of Photovoltaic Devices

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The atomic force microscopy (AFM) measurements were provided using a Solver PRO-M microscope (NT-MST, Moscow, Russia) in the semi-contact mode. The scanning electron microscopy (SEM) measurements were performed using a Merlin Zeiss electron microscope (Carl Zeiss, Oberkochen, Germany) in high vacuum mode at 10 kV accelerating voltages.
The light and dark J–V characteristics were measured by an Ossila Solar Cell I-V Test System. A solar simulator was used based on an OSRAM XBO-150W/1 xenon lamp (OSRAM, Munich, Germany). The light intensity adjusted was 100 mW/cm2. Capacitive and frequency characteristics were measured by a Keysight E4980A LCR Meter (Keysight Technologies, Santa Rosa, CA, USA).
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3

IGZO TFT Electrical and Structural Characterization

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I-V characteristics of the IGZO TFTs were measured by using a Keysight E5270 semiconductor analyser at room temperature in dark. A Keysight E4980A LCR meter was used to measure the C-V characteristics. The high-resolution SEM images were obtained by using an FEI Nova NanoSEM 450 scanning electron microscope. The HRTEM analysis was performed by using a Tecnai F30 transmission electron microscope operating at 300 kV. The mass density and Si/O atom ratio were measured by using National Electrostatics Corporation (NEC) 5SDH-2 RBS with a 2 MeV He2+ ion beam in vacuum.
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4

Characterization of Electronic Components and Biosignals

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The TFT, capacitor, and AFE measurements were carried out in a regular laboratory environment. TFTs were characterized using an Agilent 4156C Semiconductor Parameter Analyzer. Capacitors were characterized using a Keysight E4980A LCR Meter. During the measurement of the amplifier and the notch filter, the input signals were generated using a FeelTech FY200S Dual Channel Arbitrary Function Signal Generator, and the output signals were rendered on a Tektronix TDS 2012C Oscilloscope. An Agilent 4156C was used as the power supply for the acquisition of the EMG and ECG signals. Three commercial gel electrodes were used and directly connected to the inputs of the AFE system, and the output of the AEF system was directly connected to the Tektronix Oscilloscope. The participant in the experiment shown in Figure 8 is author Runxiao Shi, who has given his consent to publish the data. The AFE testing on the skin surface does not require ethical committee approval because the experiments are only on the surface of the human body, are not invasive, and do not affect the health of the person physically or psychologically. The only participant in the experiment was Runxiao Shi, and no identifiable private signals were collected.
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5

Electrical Characterization of MIM Capacitors and TFTs

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I–V and C–V measurements were performed with an Agilent B1500A Semiconductor Analyzer and Keysight E4980A LCR meter to confirm the initial electrical characteristics of each MIM capacitor and TFT. To determine the difference in stability of MIM capacitors, capacitance and leakage current changes were confirmed by applying − 10 V, − 20 V, and − 30 V bias stresses to the top electrode at 70 °C with 1-h intervals. For NBTS evaluation, − 10 V gate voltage was applied to the a-IGZO TFTs at 70 °C for 4000 s, and the results confirmed the changes in electrical characteristics.
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6

Automated Multigroup Testing with Upgraded LCR Meter Interface

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The Keysight E4980A LCR meter has a seven-digit resolution and its list-scan function allows inputs of up to 201 points of frequencies (20 Hz~2 MHz), test signal levels, or offset levels for automatic measurement. E4980A also supports an automatic testing through a GPIB interface. The official website provides a sample program named E4980A Data Transfer Program (EDTP) in which the PC could read manual measurement data. The software is based on Excel macros, which use Visual Basic for Applications (VBA) programming language, connected to the PC via Virtual Instrument Software Architecture (VISA).
We have upgraded the EDTP for fully automatic multigroup testing by adding some new features: (a) fully remote control and no local operation required (including automatic switching of the display interface); (b) set voltage start value and voltage step to realize voltage scanning when the frequency scan ends; (c) set any measuring frequency point; and d) the delay setting between the measurement groups facilitates a long series of continuous testing at constant voltage and frequency. The upgraded data transfer program (E4980_DataTransfer_64bit_upgraded.xlsm) is given in the Supplementary Material.
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7

Electrical Characterization of Organic Field-Effect Transistors

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The electrical characterizations of the OFETs were carried out on a standard probe station with a Keysight B1500A semiconductor device analyzer in ambient air. Field-effect hole mobility in saturation regime (μsat) and threshold voltage (Vth) were extracted via the relation ID = −(W/2L)μFECi(VGVth)2, where W, L, and Ci are the channel width, channel length, and areal capacitance of the gate dielectric, respectively. The effective carrier mobility (μeff) was calculated by μeff = r × μsat, where r is the reliability factor defined as [38 (link)] r=IonIoff/VGmax2/WCi/2Lμsat . The dielectric spectra were measured by a Keysight E4980A LCR meter on the MIS capacitors with series resistance corrected. The luminance of the OLEDs was measured by a TOPCON BM-7AS luminance colorimeter. To characterize the material properties of the PVA layer, we used XPS (Thermo Scientific, Escalab 250Xi), XRF (Rigaku, ZSX Primus II), and Fourier-transform infrared spectroscopy (FTIR) (PerkinElmer, Frontier), and the layer thickness was measured by a stylus profiler (KLA Tencor, D-600).
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8

Impedance Characterization of ZIF Films

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Impedance measurements were performed using high precision LCR-meter E4980A (Keysight Technologies) in the frequency (f) range 10 kHz—1 MHz. The measured impedance values were interpreted with an equivalent scheme consisting of serially connected capacitor (Cs) and resistor (Rs). The dissipation factor (D) was estimated as 2π × f × Rs. In the case of blanket ZIF films, their k-value was calculated from capacitance Cs measured on MIM stacks using the formula for parallel plate capacitor: k = Cs × d/(ε0 × S), where ε0 denotes vacuum permittivity, S denotes area of top 70 nm thick Pt circular electrodes e-beam evaporated through a Ni shadow mask (Pfeiffer PLS580), and d denotes average thickness of ZIF layer extracted from cross-sectional SEM images.
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9

Flexible Pressure Sensor Using Silver Nanowires

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Polydimethylsiloxane (PDMS) elastomer kit was bought from Dow Corning (Midland, MI, USA). Medical polyurethane (PU) films were purchased from Jiaxing Meson Medical Materials Co. Ltd. (Zhejiang, China). Silver NWs in ethanol solution (10 mg mL−1) were brought from Shanghai Bohan Chemical Technology Co. Ltd. (Shanghai, China). Scanning electron microscopy (SEM) imaging was carried out with a JSM-7900F field emission scanning electron microscope operating at an acceleration voltage of 10 kV (JEOL, Tokyo, Japan). The capacitances of the flexible sensor were measured with a precision LCR meter E4980A (Keysight, CA, USA). Pressure performance of the sensors was recorded by a digital tensile testing machine bought from Yueqing Handpi instrument co. LTD (Hunan, China).
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10

Comprehensive Characterization of ZnO Nanodiscs

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The crystalline phase and structure were measured using the X-ray diffraction (XRD) technique (Rigaku Mini Flex II) with Cu Kα radiation (λ = 1.5401 Å). The morphology of the grown nanostructure was identified using a field emission scanning electron microscope (FE-SEM). High resolution-transmission electron microscope (HR-TEM) micrographs of the ZnO nanodisc were obtained using a high resolution JEOL JEM-2100F microscope. Elemental study was performed through energy dispersive spectroscopy using FE-SEM. Fourier-transform infrared spectroscopy (FT-IR) spectra of the ZnO nanodiscs were recorded in the range 400–4000 cm−1 at a 4 cm−1 resolution using a Thermo Scientific Nicolet iS50 FT-IR spectrometer. The dielectric constant and tangent loss of the nanodiscs were measured using a Keysight LCR meter (E4980A) in the frequency range 20 Hz to 2 MHz. The piezoelectric output performance of the ZnO nanodisc based nanogenerator device was determined through a Keithley (6517B) system electrometer (impedance > 200 TΩ).
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