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X pert system

Manufactured by Philips

The X'Pert system is a versatile and advanced X-ray diffractometer designed for materials analysis. It provides reliable and accurate measurements of crystallographic properties, such as phase identification, lattice parameters, and microstructural analysis. The X'Pert system utilizes a high-performance X-ray source and a sophisticated detection system to deliver precise and reproducible results.

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11 protocols using x pert system

1

Comprehensive Characterization of Tellurium-based Nanomaterials

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A Philips X’Pert system with Cu Kα radiation (λ = 1.5419 Å, scanning rate 1.0°/min) was used to perform XRD on the prepared Te samples. Field emission SEM (Sirion 200 FEG) was used to observe the morphologies of Te products. A TEM system (JEOL, JEM-2010) with 200 kV acceleration voltage was used to obtain the regular structural information of the products. Another TEM system (JEM-ARM 200F) was used to visualize the nanostructures of Pt-Te hybrids. EDX elemental mapping images were used to determine the distribution of elemental Te or Pt in Pt-Te hybrids. MALVERN instrument (Zetasizer 3000 HSa) was used to measure the zeta (f) potential of Te colloidal solution.
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2

Characterization of Prepared Catalysts

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The phase structure of the prepared catalysts was analyzed through X-ray diffraction (XRD) with a Philips X’Pert system with Cu Ka radiation (λ = 0.15419 nm). The surface chemical constituents of the prepared catalysts were analyzed by X-ray photoelectron spectroscopy (XPS, Thermo ESCACLB 250). The surface zeta potentials of GO, NiFe-LDH/rGO, and Ni(OH)2/rGO were measured by a Malvern instrument (Nano-zs90). Transmission electron microscopy (TEM) images, high-angle annular dark-field (HAADF) scanning TEM images, and energy-dispersive spectroscopy (EDS) elemental mapping images were captured by a FEI Tecnai TF20 operated at 200 kV.
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3

X-Ray Diffraction of Nanosheets

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X-ray diffraction measurements were performed on a Philips X'Pert System with a Bragg–Brentano geometry and a copper anode with a X-ray wavelength of 0.154 nm. The samples were measured by drop-casting the suspended nanosheets on a <911> or <711> cut silicon substrate.
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4

Comprehensive Material Characterization of Raw and Processed Samples

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Raw material and filtered solution were analyzed using energy dispersive X-ray fluorescence spectrometry (Model 700 HS, Shimadzu, Tokyo, Japan).
Particle size was determined by laser grain size measurements (Microtrac Model S 3500, Largo, FL, USA).
X-ray diffraction analysis was carried in raw material and in mortar at 28 days using power an X-Pert system (Philips, Almelo, The Netherland), with CuKα = 1.54 Å, step range from 4 to 70°, with a step size 0.022 seg, operated at 40 kV and 40 mA.
The SEM analysis was performed with a Philips microscope (model XL30, Philips, Almelo, The Netherland). Samples are covered with Au.
Thermogravimetric analysis (TGA/DSC) was carried out using STD Q600 (TA Instruments, New Castle, DE, USA), TA instruments, 50 mg of pulverized samples (<75 µm), temperature ranged from ambience to 1000 °C with a heating rate of 5 °C/min under ultrapure N2 atmosphere to prevent carbonatation.
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5

X-Ray Diffraction Analysis of Crystals

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Crystal size and different
crystallographic parameters were determined
using XRD (Philips X’Pert system, The Netherlands). The analysis
was conducted with Cu Kα radiation in a 2θ range of 10–80°
at 40 kV and 30 mA.28 (link) Crystal size (d) was estimated using Scherrer’s equation as follows Where K is
a dimensionless shape factor = 0.9, λ = 0.15406 nm, β
is the line broadening at half the maximum intensity (FWHM), and θ
is the Bragg’s diffraction angle.28 (link)
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6

Nanomaterial Characterization Techniques

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SEM images were obtained on an FESEM Hitachi S4800 microscope. TEM imaging was carried out on an FEI Tecnai G2 20 microscope operating at 200 kV. XRD patterns were acquired on Philips X’ Pert system equipped with Cu K α radiation (λ = 1.5419 Å, scanning rate = 1.0°/min). The HRTEM were taken on Tecnai G2 20 S-TWIN operated at 200 kV accelerating voltage. XPS was measured on a Thermo ESCALAB 250 system. The extinction spectra of the Au NCs were acquired on a Hitachi U-3900 with cuvettes with a 0.5-cm optical path length. ICP-AES was conducted by Optima 5300 DV (Perkin Elmer).
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7

Nanomaterial Characterization Techniques

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Transmission electron microscopy (TEM) images and selected area electron diffraction (SAED) patterns were obtained on a JEOL-1011 (100 kV). Samples for the TEM analysis were prepared by drop-casting 10 μL dispersion of nanocrystals diluted in toluene onto carbon-coated copper or titanium TEM grids followed by solvent evaporation. High resolution (HR) TEM images were obtained with a Philips CM 300 UT microscope operated at 200 kV. X-ray diffraction (XRD) measurements were performed with a Philips X'Pert System with Bragg–Brentano geometry, equipped with a copper anode (Kα X-ray wavelength of 0.154 nm). Samples were prepared by drop-casting the colloidal nanocrystal solution onto silicon wafer substrates (<911> or <711> cut) with subsequent solvent evaporation. Atomic force microscopy (AFM) measurements were performed on a JPK Instruments system (JPK Nano Wizard 3) in intermittent contact mode. UV-VIS-NIR absorption spectra were obtained with a Cary 5000 spectrophotometer equipped with an integration sphere.
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8

Nanosheets Optical Characterization

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The nanosheets were characterized by transmission electron microscopy (JEOL Jem-1011), X-ray diffraction (Philips X'Pert System with a Bragg-Brentano geometry and a Cu K-alpha X-ray with a wavelength of 0.154 nm) and AFM (Veeco Dimension 3100). For the optical measurements, the nanosheets were drop-casted from toluene on a quartz substrate. The quartz was functionalized via silanization in order to provide better adherence of the nanocrystals, as has been described previously26 (link). All optical measurements were performed without exposing the samples to air, by using air-tight sample holders that were loaded inside a nitrogen-filled glovebox. The absorption spectra of the samples were measured with a Perkin Elmer Lambda 900 photospectrometer, equipped with an integrating sphere. The sample was placed inside the integrating sphere, so that light scattered from the sample also enters the photodetector. Background absorption of the quartz substrate was subtracted. The relative uncertainty in the fraction of absorbed light is 2%, which was statistically determined via repeated measurements.
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9

Fabrication of BFO-CFO Heterostructures

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A 65%BFO-35%CFO composition ratio was chosen for the substrates. All thin films were deposited by PLD. PMN-38PT (100) single crystal substrates were grown by the Shanghai Institute of Ceramics Chinese Academy Sciences. Prior to the deposition, the substrates were cleaned with acetone and alcohol via ultrasonication. First, a 10 nm SRO layer was deposited on the PMN-38PT at 700 °C, 1.5 J/cm2 energy density and 150 mTorr O2 atmosphere. After annealing under 700 °C and 150 mTorr O2 atmosphere for 30 min, a 200 nm BFO-CFO heterostructure was deposited at 650 °C, 1.2 J/cm2 energy density and 90 mTorr O2 atmosphere. The sample was then annealed at 700 °C and 100 Torr O2 . Crystal structures were determined by X-ray diffraction (Philips X’Pert system) scans. Magnetic hysteresis curves were recorded using a vibrating sample magnetometer (VSM, Lakeshore 7300 series). Atomic force microscopy (AFM) and magnetic force microscopy (MFM) images were obtained (Dimension 3100, Vecco), which were used to study the film surface quality and magnetic domain structures.
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10

Characterization of Nanostructured Materials

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The TEM samples were prepared by diluting the nanostructure suspensions with toluene and then drop casting 10 µL of the suspension on a copper TEM grid coated with a carbon film. TEM images were taken using a JEOL-1011 with a thermal emitter operated at an acceleration voltage of 100 kV. XRD X-ray diffraction measurements were performed on a Philips X'Pert System with Bragg-Brentano geometry and a copper anode with an X-ray wavelength of 0.154 nm. The samples were measured by drop-casting the suspended nanosheets on a <911> or <711> grown silicon substrate.
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