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Hydrofluoric acid

Manufactured by Duksan Pure Chemicals

Hydrofluoric acid is a highly corrosive inorganic acid. It is used in various industrial and laboratory applications, including etching, cleaning, and the production of certain chemicals and materials. The core function of hydrofluoric acid is to act as a powerful solvent and etchant.

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2 protocols using hydrofluoric acid

1

Fabrication of Mg-Reinforced PLA Membranes

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PLA granules (Goodfellow, UK) were dissolved in a glass container containing 5% acetone, heated to 50°C, and stirred vigorously for approximately 4 h. Mg alloy AZ91 (9 wt% Al, 1 wt% Zn), both coated and bare, was applied as a reinforcement core. Coated samples were made as follows: AZ91 strips with specific size were rinsed in 35% hydrochloric acid (OCI, Korea) to clean the surface and immersed in 50% hydrofluoric acid (Duksan, Korea) for 8 h to form the fluoride coating. Then, AZ91 strips were washed using deionized water and ethanol. Finally, AZ91 strips were wholly blow-dried. Bare samples (uncoated) were treated in the same way, except for being immersed in HF (Table 1).
The PLA solution was first laid in a metal mold, followed by a Mg alloy AZ91 strip, and then a layer of PLA solution was laid on the AZ91 strip. Next, the solvent was put in a drying oven at 100°C to evaporate for 6 h and produce a Mg-reinforced PLA-integrated membrane. The fabrication method of the integrated membrane in the control group is the same as above, except that the magnesium strip was replaced by a PLA strip. The average thickness of the integrated membranes was 120 μm. The integrated membranes were cut into the desired dimensions (Figure 1).
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2

Synthesis of Fluorinated Polymer Nanocomposites

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2,2,2-Trifluoroethyl methacrylate (TFEMA, Fluorochem, Hadfield, UK) and 4-vinyl pyridine (VP, 95%, Aldrich, St. Louis, MO, USA) were used after purification by an inhibitor remover column (inhibitor removers, Aldrich). 4-Cyano-4-(phenylcarbonothioylthio)pentanoic acid (CTP, 97%, Aldrich), 1,4-dioxane (99.5%, Acros, Geel, Belgium), hexane (95%, Duksan, Ansan, Korea), tetrahydrofuran (THF, 99.5%, Duksan), toluene (anhydrous, 99.8%, Aldrich), chloroform (extra pure grade, Duksan), methanol (99.8%, Duksan), and hydrofluoric acid (50.0%, Duksan) were used as received without further purification. 2,2′-Azobisisobutyronitrile (AIBN, 98%, Junsei, Tokyo, Japan) was used after recrystallization in methanol. HOPG (graphene nanoplatelets, M-25 grade, XG Sciences, Lansing, MI, USA) was used as a source of graphene nanoplatelets. Ultra-pure water (resistivity > 18.2 MΩ·cm, Purelab, Elga, High Wycombe, UK) was used throughout the experiments.
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