Absorption spectra of the organic films on quartz substrates were measured with a Shimadzu UV-3101PC spectrophotometer. The current density–voltage (J–V) characteristics of the OPV cells were measured using a computer-controlled Keithley 2611 source meter under AM 1.5 G illumination from a calibrated Solar with an irradiation intensity of 100 mW·cm−2. The external quantum efficiency (EQE) measurements were performed with a lock-in amplifier at a chopping frequency of 20 Hz during illumination with monochromatic light from a xenon lamp and their intensities are calibrated with a Si-photodiode. The surface topographies were imaged with a Bruker MultiMode 8 atomic force microscope (AFM) in tapping mode. The UPS experiments were performed using a VG ESCA Lab system equipped with a He I (21.22 eV) gas discharge lamp. The ultrahigh vacuum (UHV) system consists of a spectrometer chamber and an evaporation chamber. The base pressures of the spectrometer chamber and the evaporation chamber are typically 1.1 × 10−8 Pa and 6.7 × 10−6, respectively. We recorded the UPS spectra with the samples biased at −4.0 V to observe the true low energy secondary cut-off. The UV light spot size on samples was about 1 mm in diameter. The instrumental resolution for UPS measurements was chosen to be 10 meV. All the measurements were carried out at room temperature.
Multimode 8 atomic force microscope
Manufactured by Bruker
Sourced in United States, Germany
The Multimode 8 atomic force microscope is a versatile instrument designed for high-resolution imaging and characterization of surfaces at the nanoscale. It employs a sensitive cantilever-based detection system to measure the topography and various properties of samples with exceptional detail and accuracy.
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Lab products found in correlation
Nanoscope 5 controller, by Bruker (9 mentions)
Scanasyst air probe, by Bruker (6 mentions)
Nanoscope analysis software, by Bruker (3 mentions)
J scanner, by Bruker (2 mentions)
Nsg10 dlc cantilevers, by NT-MDT (2 mentions)
Smartlab x ray diffractometer, by Rigaku (2 mentions)
Nanoscope 8, by Bruker (2 mentions)
Supra 55vp, by Zeiss (2 mentions)
Escalab 250xi xps microprobe, by Thermo Fisher Scientific (2 mentions)
Uv 3101pc spectrophotometer, by Shimadzu (1 mentions)
Pfkpfm smpl, by Bruker (1 mentions)
Pfqne al, by Bruker (1 mentions)
Vertex 70 ftir spectrometer, by Bruker (1 mentions)
Nanoscope analysis, by Bruker (1 mentions)
Nchv a tapping mode probes, by Bruker (1 mentions)
Nanoscopecontroller, by Bruker (1 mentions)
S 4800n sem, by Hitachi (1 mentions)
Leo 1530 gemini sem, by Zeiss (1 mentions)
Qe65 pro raman spectrometer, by OceanOptics (1 mentions)
Nano zs zetasizer, by Malvern Panalytical (1 mentions)
72 protocols using multimode 8 atomic force microscope
1
Organic Photovoltaic Characterization
2
Fingernail Surface Roughness Quantification
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To quantify the surface roughness for the clipped dorsal phase of fingernail plate, Bruker multimode-8 Atomic Force Microscope (AFM) equipped with a silicon tip was used in contact mode. The samples were fixed from ventral side on a small disk with the help of low viscosity cyanoacrylate adhesive and the area of 10 µm × 10 µm was scanned for dorsal phase of each group.
3
Atomic Force Microscopy of Protein Samples
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After incubation at 20 µM at 37 °C for 48 h, samples were incubated in 40 μL absorption buffer (10 mM Tris-HCl pH 7.4, 150 mM KCl, 25 mM MgCl2) [39 (link)] on freshly cleaved mica for 15 min, and then rinsed with sterile-filtered deionized water before drying. Samples were imaged in PeakForce QNM Mode in air on a Bruker Multimode 8 Atomic Force Microscope (AFM) equipped with a 160 μm scanner (J-scanner) using SCANASYST-AIR probes (k = 0.4 N/m). Images were recorded at 512 × 512 pixels and the AFM data were analysed using NanoScope and Gwyddion programs.
4
Characterizing Ag2Se Colloidal Quantum Dots
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NIR Ag2Se:EDT CQD samples were deposited onto clean 10
× 10 mm gold substrates using the same deposition and preparation
protocols as described above. Fermi level measurements were performed
with the Frequency-Modulated Kelvin Probe Force Microscopy (FM-KPFM)
mode on the Bruker Multimode 8 Atomic Force Microscope (AFM) and by
using silicon tip on silicon nitride cantilevers with a resonance
frequency of about 300 kHz and a spring constant of about 0.8 N/m
(Bruker PFQNE-AL). Silver paste was used to electrically connect the
sample with a conductive disc. The topography and contact potential
difference (CPD) images (5 × 5 μm2, 512 ×
512 pixels) were collected at a scan rate of 0.2 Hz. The Fermi level
of Ag2Se CQDs was obtained from the CPD images using the
following equation: = EFtip + e.CPD; where e is the
charge of an electron and EFtip is the work function of the tip. EFtip(= 4.68 eV) was measured by performing
FM-KPFM on a gold calibration sample (Bruker PFKPFM-SMPL, EFgold = 5.1 eV).61 (link),62 (link) The average CPD value of gold
was obtained from a cross-section line profile of 30-pixel thickness
across the reference sample, and that of Ag2Se was obtained
from the entire scanned sample area.
× 10 mm gold substrates using the same deposition and preparation
protocols as described above. Fermi level measurements were performed
with the Frequency-Modulated Kelvin Probe Force Microscopy (FM-KPFM)
mode on the Bruker Multimode 8 Atomic Force Microscope (AFM) and by
using silicon tip on silicon nitride cantilevers with a resonance
frequency of about 300 kHz and a spring constant of about 0.8 N/m
(Bruker PFQNE-AL). Silver paste was used to electrically connect the
sample with a conductive disc. The topography and contact potential
difference (CPD) images (5 × 5 μm2, 512 ×
512 pixels) were collected at a scan rate of 0.2 Hz. The Fermi level
of Ag2Se CQDs was obtained from the CPD images using the
following equation: = EFtip + e.CPD; where e is the
charge of an electron and EFtip is the work function of the tip. EFtip(= 4.68 eV) was measured by performing
FM-KPFM on a gold calibration sample (Bruker PFKPFM-SMPL, EFgold = 5.1 eV).61 (link),62 (link) The average CPD value of gold
was obtained from a cross-section line profile of 30-pixel thickness
across the reference sample, and that of Ag2Se was obtained
from the entire scanned sample area.
5
Thin Film Topography Analysis via AFM
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Thin film topography was carried out via a Multimode 8 Atomic Force Microscope (AFM) (Bruker, Germany). In the AFM scanning, two to four interest locations on each sample were tested. Small pieces of film samples were glued onto metal disks and attached to a magnetic sample holder located on the top of the scanner tube. Topographic (height) and phase images were collected in the tapping mode under ambient air conditions using a monolithic silicon tip with a resonance frequency between 250 and 300 kHz, and a scan angle of 0°.
6
KPFM Characterization of Catalyst Surfaces
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Generally, KPFM measures the local CPD between the sample surface and the conducting Pt tip (φsample–φtip), which could be used to reflect the change in local work function of the sample by the contrast in the CPD image and profile (38 (link)). KPFM was carried out to measure the surface potential of the samples on a Bruker Multimode 8 atomic force microscope (AFM) with the Pt cantilever in a tapping mode. The catalysts were prepared to ink in ethanol (0.2 mL, 1 mg/mL) and deposited onto the cleaned FTO glass electrode (3 cm × 1 cm). The electrode was then dried at 60 °C overnight to totally remove the ethanol and make the sample firmly attached with the FTO glass. The surface potentials of the samples were measured at 200-nm lift height by maintaining a scan speed of 0.996 Hz.
7
Surface Characterization Techniques
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Surface morphology was observed via scanning electron microscopy (SEM, Zeiss Supra 55VP). Surface roughness was characterized using the Bruker Multimode 8 atomic force microscope (AFM). Fourier transform infrared spectroscopy (FTIR) was conducted using the Bruker Vertex 70 FTIR spectrometer in the attenuated total reflection mode (ATR).
8
AFM Imaging of Cationic Peptide Hydrogels
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Hydrogels 2–4 , 6 , 7 , 9 , and 10 were prepared from the corresponding cationic peptide mimics at their MGC, 2 × below, and 4 × below MGC in glass vials. Prior to gelation, one drop of these peptide mimics solutions was casted onto a mica substrate. Using a glass slide, each droplet was carefully spread and was left to dry overnight before imaging. Imaging was performed using a Bruker Multimode 8 Atomic Force Microscope in Scanasyst Air (PeakForce Tappings) mode, which is based on tapping mode AFM. To prevent damage of soft samples, the imaging parameters were constantly optimized through the force curves that were collected. Bruker Scanasyst-Air probes were used, with a spring constant of 0.4–0.8 N m−1 and a tip radius of 2 nm.
To gain some insight on the mechanism of antibacterial action, the released solutions from hydrogel2 was directly casted on to a mica substrate. In addition, respective amount peptide mimics 2a and GdL were dissolved in DMSO-Water (5%: 95%) which then diluted to obtained concentration of 221 µM before casted on a mica substrate. After gently spread using a glass slide and left to dried overnight, these samples were imaged using a similar manner as describe above.
To gain some insight on the mechanism of antibacterial action, the released solutions from hydrogel
9
Visualizing DNA Tetrahedrons at 100 nM
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The monomeric and dimeric DNA tetrahedrons were prepared with a total concentration of 100 nM. The prepared samples were scanned in scanasyst-air mode by a Multimode 8 Atomic Force Microscope (Bruker Inc.).
10
Atomic Force Microscopy of Particle Dispersions
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A MultiMode 8 atomic force microscope (AFM) equipped with a NanoScope
V controller (Bruker Corporation, U.S.A.) was used to analyze the
samples. All the images were obtained in tapping mode in ambient air
using NCHV-A tapping mode probes (Bruker). The samples were prepared
in two different ways: (1) dropping of 5 μL of the diluted aqueous
particle dispersion (diluted to be 0.02 wt % by DI water) on a mica
surface followed by ambient drying; and (2) direct adsorption of the
particles onto PLL-modified silicon wafer by immersing the wafer (∼1
× 1 cm2) in the particle dispersion (at the native
concentration) for 1 h, followed by rinsing with DI water and N2 drying. A silicon wafer purified with 15 min UV/ozone treatment
in an Ozonator was modified with PLL by immersing the wafer in PLL
solution for 1 h, followed by rinsing with DI water and N2 drying before applying the particles. Nanoscope Analysis (version
1.5, Bruker) was used for image processing.
V controller (Bruker Corporation, U.S.A.) was used to analyze the
samples. All the images were obtained in tapping mode in ambient air
using NCHV-A tapping mode probes (Bruker). The samples were prepared
in two different ways: (1) dropping of 5 μL of the diluted aqueous
particle dispersion (diluted to be 0.02 wt % by DI water) on a mica
surface followed by ambient drying; and (2) direct adsorption of the
particles onto PLL-modified silicon wafer by immersing the wafer (∼1
× 1 cm2) in the particle dispersion (at the native
concentration) for 1 h, followed by rinsing with DI water and N2 drying. A silicon wafer purified with 15 min UV/ozone treatment
in an Ozonator was modified with PLL by immersing the wafer in PLL
solution for 1 h, followed by rinsing with DI water and N2 drying before applying the particles. Nanoscope Analysis (version
1.5, Bruker) was used for image processing.
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