Photoresist masters of 25 μm layer height were fabricated by spinning a layer of photoresist SU-8 3025 (Microchem) onto a silicon wafer (University Wafer), then baked at 95°C for 10 minutes. Following baking, photoresist master was patterned by UV photolithography over a photomask (Data S1 , CADArt). The master was subjected to post-exposure bake at 95°C for 4 min and developed in fresh SU-8 developer (Microchem) for 6 min, prior to rinsing with isopropyl alcohol (Fischer Scientific) and baking at 150°C to remove the solvent. The microfluidic devices were fabricated by pouring poly(dimethylsiloxane) at a 11:1 polymer-to-crosslinker ratio (Dow Corning Sylgard 184) onto the master and curing at 65°C for 1 hr. The PDMS devices were excised with a scalpel and cored with a 0.75 mm biopsy core (World Precision Instruments) to create inlets and outlets. The device was then bonded to a microscope glass slide using an O2 plasma cleaner (Harrick Plasma), and channels were treated with Aquapel (PPG Industries) to render them hydrophobic. Finally, the devices were baked at 65°C for 20 min to evaporate excess Aquapel prior to use.
O2 plasma cleaner
Manufactured by Harrick
Sourced in United States
The O2 plasma cleaner is a laboratory equipment used to clean and activate surfaces through the application of oxygen plasma. It generates a high-energy, ionized gas that effectively removes organic contaminants and improves surface wettability and adhesion properties.
Automatically generated - may contain errors
2 protocols using o2 plasma cleaner
1
Fabrication of Microfluidic Devices using SU-8 Photoresist
2
Graphene Oxide Multilayer Coating
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The concentration of GO in solutions used in all of the GO coating experiments was fixed at 0.05% (w/v) without any ionic salts. The GO-NH3+/GO-COO− multilayer coating was administered by first treating Ti substrates with an O2 plasma cleaner (Harrick Scientific Products Inc, Pleasantville, NY, USA) for 5 minutes. GO multilayer films were deposited on the Ti substrates by layer-by-layer (LbL) assembly.34 (link),35 Briefly, the substrates were then dipped for 10 minutes in the cationic GO-NH3+ solution, washed three times by dipping in deionized water for 1 minute, and then dried with a gentle stream of nitrogen. The negatively charged GO-COO− was subsequently deposited onto the GO-NH3+ coated films using the same adsorption, washing, and drying procedures described above.28 Ti substrates coated with 15 bilayers of GO-NH3+/GO-COO− were used for BMP-2/SP delivery and animal study. The outermost layer of GO coating was GO-COO−, which is responsible for effective BMP-2 delivery.28
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