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X pert mrd

Manufactured by Philips

The X'Pert-MRD is a versatile, high-performance X-ray diffraction (XRD) system designed for materials research and development. It provides precise and reliable analysis of a wide range of materials, including metals, ceramics, polymers, and thin films. The system features advanced optics and detectors that deliver accurate and reproducible results, making it a valuable tool for researchers and scientists.

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5 protocols using x pert mrd

1

Spin-Coated PMMA Thin Films on Nanostructures

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Different concentrations of poly(methyl methacrylate) (PMMA) molecules, a commonly used positive electron-beam resist, are used as model analyte in our experiment. For the largest concentration, a thin layer of PMMA (950-A2, 2% solid content in anisole, Michrochem) is spin-coated on top of the metamaterials at 2000 rpm. PMMA is chosen in the present work due to the accurate control of the uniform thickness obtainable via control of the spin speed and molecule concentration used. Then molecule concentration is diluted progressively in anisole and the diluted polymer solution is spun onto nanostructures. The dielectric function of the polymer can be modeled as εdilute = f·εPMMA + (1−fεanisole in numerical simulations, where εPMMA and εanisole are permittivity of readily obtained PMMA (950-A2) and anisole and f is the filling ratio of the PMMA. The thicknesses of diluted polymers with different concentrations are determined through X-ray reflectivity (Philips X'Pert-MRD) measurement and the respective thicknesses of different concentrations are shown in Fig. S1(a).
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2

Crystalline Structure Characterization

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X-ray diffraction experiments were performed at room temperature to study the crystalline structure of the materials using an X-ray diffraction system (Philips X Pert-MRD, the Netherlands) employing CuKα radiation (X-ray wavelength λ = 1.5406 Å) under normal laboratory conditions. The chemical compositions and crystallographic structures of samples were recorded by varying the angle following Bragg’s law, which is satisfied by the d-spacing in polycrystalline materials.
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3

Structural Analysis of Thin Films

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The crystal structures
of the prepared
films were analyzed using X-ray diffraction (XRD; X’Pert-MRD,
Philips, and SmartLab, Rigaku, λ = 0.154 nm). The ω-2θ scans were carried out to estimate the lattice
parameters by performing 2θ scans while changing the incident
angle (ω). The 2θ position of Si (lattice parameter: 5.43)
was used as a reference (Coll. Code: 51,688). The film thickness was
estimated using wavelength-dispersive X-ray fluorescence (WD-XRF;
Axios PW4400/40, PANalytical), and the results were compared to those
of a reference sample. The crystal structures of the films under an
applied electric field were investigated using a microfocus X-ray
diffraction (XRD) setup with a 2D detector (Bruker AXS D8 DISCOVER)
by focusing X-rays on the Pt-top electrodes. X-rays were focused onto
a Pt-top electrode with ϕ = 200 μm, to which an electric
field of 250 kV/cm amplitude was applied, and diffraction patterns
were collected by a two-dimensional detector. A collimator with a
pinhole with a 100 μm diameter was used.
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4

Focused Ion Beam Milling for Nanostructure Fabrication

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The triangular lattices of circular holes are patterned on the top of the first metallic layer of the MIM structure via a one-step focused ion beam milling (FEI Helios Nanolab 600 DualBeam) with a gallium ion current of 9.7 pA and an accelerating voltage of 30 KeV. Then a thin layer of PMMA (950-A2 in anisole, Michrochem), a commonly used positive electron-beam resist, is spin-coated (2,000 rounds per min) on top of the fabricated nanostructures. We choose PMMA in the present work due to its chemical and mechanical stability and the accurate control of the thickness via control of the spin speed or molecule concentration used. The thickness of the coated PMMA polymer layer is also determined through X-ray reflectivity (Philips X’Pert-MRD) measurement.
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5

Characterization of Bi2Se3 Nanostructures

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Morphology, thickness, structure and composition of obtained Bi2Se3 nanostructures and nanostructured layers were inspected using field emission scanning electron microscope (SEM) Hitachi S-4800 equipped with an energy-dispersive X-ray (EDX) analyser Bruker XFLASH 5010 and atomic force microscopes Asylum Research MFP-3D and Bruker Dimension ICON.
For the statistical analysis, 5 to 9 AFM scans of size 20 × 20 μm each were obtained at different locations on the sample. The number of measured nanoplates was 110–150 for each type of the substrate with an exclusion of exfoliated graphene substrate. Due to the technical difficulties, 6 nanoplates were measured on the surface of exfoliated graphene.
XRD characterization of the thin films was performed by a Philips X’Pert MRD with a Cu Kα radiation source.
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