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S 4800 field emission microscope

Manufactured by Hitachi
Sourced in Japan

The S-4800 field emission microscope is a high-resolution scanning electron microscope (SEM) designed for advanced materials analysis. It features a field emission gun that provides high-brightness, high-energy electron beams for high-resolution imaging and analysis. The S-4800 is capable of achieving a resolution of up to 1.0 nm at 15 kV, making it suitable for a wide range of applications that require detailed examination of surface topography and compositional information.

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7 protocols using s 4800 field emission microscope

1

Comprehensive Material Characterization Techniques

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Scanning electron microscopy (SEM) was performed using a Hitachi S-4800 field emission microscope at an accelerating voltage of 10 kV. The samples were prepared on Si wafers, then sputtered with a very thin layer of Au/Pd. BET surface area measurements were performed with a Nova 2200e, Quantachrome Instruments. FT-IR was performed on a Perkin-Elmer SpectrumBX instrument fitted a SensIR Technologies DuraSampleIR II ATR unit. Transmission electron microscopy (TEM) was performed on a 200 kV JEOL LaB6 TEM. The in situ video was captured using a Hysitron PI95 TEM Picoindenter accessory, Hysitron Corporation, Minneapolis, MN.
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2

Elemental Analysis of L-NH2 and L-NH2@Ce

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Scanning electron microscopy (SEM) images and elemental data of L-NH2 and L-NH2@Ce were assessed using a Hitachi S-4800 field emission microscope attached to an energy-dispersive energy spectrometer (EDX). The images were collected at an accelerating voltage of 15 000 V. Prior to observation, samples were sprayed with a thin layer of gold by a sputter coater. The mean values of C, O, and Ce content (wt%) were determined from EDX by averaging three portions of the sample.
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3

Osmium Coating for SEM Analysis

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The samples were sectioned using tweezers, and the resulting cross-sections of the samples were treated using a Meiwafosis Neo osmium coater at 5 mA for 10 s. The thickness of the osmium coating layers was estimated as 2.5 nm thick under the conditions employed. These samples were then examined by SEM on a Hitachi S-4800 field-emission microscope, operating at 1 kV.
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4

Surface Characterization of Biomaterial Coatings

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The surface chemical composition of the samples was analysed by X-ray photoelectron spectroscopy (XPS) using an ESCALAB 210 spectrometer (Thermo Fisher Scientific, Waltham, MA, USA), operating at constant pass energy of 20 eV. Nonmonochromatized Mg Kα radiation was used as the excitation source. The atomic surface concentrations were quantitatively determined from the area of C1s, O1s, P2p and Ca2p peaks. A Shirley-type background was subtracted, and the peak areas were corrected by the electron escape depth, the spectrometer transmission and the photoelectron cross-sections.
Fourier transform infrared (FTIR) spectra were collected in a JASCO FT/IR-6200 IRT-5000 (Oklahoma, OK, USA) under vacuum conditions and specular reflectance mode.
The surface topography of the films was characterised by noncontact atomic force microscopy (AFM) with a Cervantes AFM system from NANOTEC (Feldkirchen, Germany) using commercial noncontact AFM tips from MikroMasch (Wetzlar, Germany). The surface of the membranes was also studied by scanning electron microscopy (SEM) in a Hitachi S4800 field emission microscope (Tokyo, Japan) of the coating of HA on PLGA of around 15 nm.
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5

Acoustic Energy Harvesting Experiments using Nanotube Sheets

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The sound pressure level was measured at a distance 5 cm away from a speaker by a sound level meter (B&K Type 4189 microphone) with a detection diameter of 12.7 mm. The same experimental setup was used for acoustic energy harvesting experiments using a nanotube sheet flutter. The data acquisition equipment was LMS SCADAS3 (LMS). All acoustic measurements were performed in a semi-anechoic room. The resistance of the nanotube sheet suspended between a pair of copper wire electrodes was measured using a voltage–current meter (Keithley 2000 multimeter). Scanning electron microscopy (SEM) images were obtained a Hitachi S-4800 field-emission microscope by using an acceleration voltage of 10–15 KeV.
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6

Characterizing Ecoflex and HPEI-Ecoflex

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FT-IR spectra of
EC and HPEI-EC were collected in transmission configuration at a wavenumber
ranging from 400 to 4000 cm–1 using a Nicolet iS50
FT-IR instrument. XPS data of EC and HPEI-EC were acquired using a
PHI 5000 Versa Probe equipped with a mono-Al Kα radiation source,
and the XPS curves were calibrated with the reference of the C 1s
peak (binding energy at 284.8 eV). SEM imaging of EC and HPEI-EC was
conducted on a Hitachi S-4800 field emission microscope. Phosphate
concentrations in the solution were determined using a T6 UV–vis
spectrophotometer.
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7

Thermal Decomposition of Ammonium Perchlorate with ZnO

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Powder X-ray diffraction (XRD) measurements were performed with an X-ray diffractometer (ULTIMA-3) at Cu Kα radiation with 40 kV beam voltage and 40 mA beam current. The data were collected in the 20–80° range (2θ) with steps of 0.02. Scanning electron microscopy (SEM) images were obtained with a Hitachi S-4800 field-emission microscope. Transmission electron microscopy (TEM), high-resolution TEM (HRTEM) images and selected area electron diffraction (SAED) patterns were obtained with a JEOL JEM-2100 transmission electron microscope with an acceleration voltage of 200 KV. The photoluminescence (PL) spectra were recorded on a LabRam HR 800 spectrometer (Jobin -Yvon) excited with a 30 mW xenon lamp (325 nm) at room temperature. The catalytic roles of ZnO in the thermal decomposition of AP were studied by differential scanning calorimeter (DSC) using STA 449C thermal analyzer at a heating rate of 20°C·min−1 in N2 atmosphere over the temperature range of 20–500°C. The mass percentage of ZnO to AP in the mixture is fixed at 2%.
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