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Crossbeam 540 focused ion beam scanning electron microscope

Manufactured by Zeiss

The Crossbeam 540 Focused Ion Beam Scanning Electron Microscope is a laboratory instrument designed for high-resolution imaging and analysis of materials at the nanoscale. It combines a focused ion beam and a scanning electron microscope in a single platform, allowing for precise sample preparation and characterization.

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2 protocols using crossbeam 540 focused ion beam scanning electron microscope

1

Cell Culture SEM Imaging Protocol

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One hour after cell seeding, CDM constructs were fixed, dehydrated, critical point dried, and sputter-coated as described previously [49 (link)]. Samples were imaged at 3 kV, 90 pA, 11.16 nm pixel size using a Crossbeam 540 Focused Ion Beam Scanning Electron Microscope (Zeiss). Images were false-colored in Adobe Photo Shop.
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2

FIB-SEM Imaging of Nanomaterials

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The samples were processed as previously described [56 (link)]. They were trimmed with a 90° diamond trimming knife (Diatome, Biel, Switzerland) and attached to the SEM stub (Science Services, Pin 12.7 mm × 3.1 mm) by a silver-filled epoxy (Epoxy Conductive Adhesive, EPO-TEK EE 129–4; Electron Microscopy Sciences) and polymerized at 60°C overnight. Following polymerization the samples were coated with a 10-nm gold layer using the sputter coater EM ACE600 (Leica) at 35 mA current and placed into the Crossbeam 540 focused ion beam scanning electron microscope (Carl Zeiss Microscopy). To protect the surface and ensure even milling, a 400-nm platinum layer was deposited on top of the region of interest. Atlas 3D software (Atlas 5.1, Fibics, Canada) was used to collect the 3D data. Samples were exposed with a 15-nA current, and a 7-nA current was used to polish the surface. The images were acquired at 1.5 kV with the ESB detector (450 V ESB grid, 600 pA, pixel size x/y 5 nm) in a continuous mill and acquire mode using 1.5 nA for the milling aperture (z-step 25 nm).
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