K-space emission was imaged using a Montana Instruments closed-cycle liquid He crysotat with piezo-controlled 3D-moveable sample stage, cryo-optic low-working distance 100x 0.9NA objective, vacuum housing, radiation shield, and local objective heater. A wavelength-tunable ultrafast laser (Toptica Photonics FemtoFiber Pro) was used for 488 nm excitation with 80 MHz repetition rate, guided into the cryo-optic with electrically-controlled Thorlabs Galvo mirrors. The sample emission was filtered through a Semrock tunable edge pass (set to 490 nm long pass) filter and directed via a 4 F imaging system into a Princeton Instruments Acton spectrometer and either a 512 (k-space) × 512 (wavelength) pixel or 1024 (k-space) × 1024 (wavelength) pixel Pixis camera.
Femtofiber pro
Manufactured by Toptica
The FemtoFiber Pro is a fiber-based ultrafast laser system designed for scientific and industrial applications. It generates femtosecond pulses with a high repetition rate and adjustable output power. The core function of the FemtoFiber Pro is to provide a reliable and stable source of ultrashort laser pulses for various experimental setups and research purposes.
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Lab products found in correlation
4 protocols using femtofiber pro
1
Cryo-Imaging of K-space Emission
2
Ultrafast Laser Fluorescence Spectroscopy
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A wavelength-tunable ultrafast laser (Toptica Photonics FemtoFiber Pro) was used for 488 nm excitation with 80 MHz repetition rate. The emission was collimated and filtered through a Semrock tunable edge pass (set to 490 nm long pass) filter and focused onto a Micro Photon Devices (MPD) PicoQuant PDM Series single photon avalanche photodiode with a 50 μm active area and 40 ps IRF. Photon arrival times were time-tagged using a time-correlated single photon counter (TimeHarp 260).
3
Femtosecond Laser-enabled 3D Microfabrication
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The 3D IP-S structures were fabricated with
2PP using a commercial microfabrication device (GT+, Nanoscribe) and a femtosecond-pulsed (100 fs, 50 mW) fiber laser (FemtoFiber
Pro, Toptica Photonics) beam at 780 nm. In the “galvo”
configuration, galvanometric mirrors laterally scan the laser beam,
and the vertical movement is controlled by piezoactuators, which allows
a fast fabrication process. The structures are designed using the
software Autodesk Inventor Professional 2019 and
transferred to DeScribe (Nanoscribe software) which
applied the desired slicing/hatching parameters to the design prior
to printing. A 25× NA 0.8 objective (Zeiss)
was employed with the IP-S material. In the DiLL configuration, the
objective is directly in contact with the photosensitive resist, which
minimizes spherical aberrations.
2PP using a commercial microfabrication device (GT+, Nanoscribe) and a femtosecond-pulsed (100 fs, 50 mW) fiber laser (FemtoFiber
Pro, Toptica Photonics) beam at 780 nm. In the “galvo”
configuration, galvanometric mirrors laterally scan the laser beam,
and the vertical movement is controlled by piezoactuators, which allows
a fast fabrication process. The structures are designed using the
software Autodesk Inventor Professional 2019 and
transferred to DeScribe (Nanoscribe software) which
applied the desired slicing/hatching parameters to the design prior
to printing. A 25× NA 0.8 objective (Zeiss)
was employed with the IP-S material. In the DiLL configuration, the
objective is directly in contact with the photosensitive resist, which
minimizes spherical aberrations.
4
Nanoscribe Laser Lithography Protocol
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Printing was performed on a commercially available Nanoscribe GmbH Photonic Professional GT laser lithography system, powered by a FemtoFiber pro near-infrared laser supplied by TOPTICA and operating with a pulse duration of ∼100 fs at a center wavelength of 780 nm and a repetition rate of 80 MHz. Average laser power (mW) was measured before the microscope objective and was varied to control light exposure. Focusing of the laser was accomplished with a Zeiss plan-apochromat 63 × 1.4NA oil DIC M27 objective lens.
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