DMF bottom plates were fabricated in the cleanroom facilities of the Toronto Nanofabrication Centre (TNFC), University of Toronto. Chromium-on-glass substrates (Telic Co., Valencia, CA, USA) were patterned by photolithography and etching and then coated with ~6.5 μm Parylene-C (Specialty Coating Systems, Indianapolis, IN, USA) and ~100 nm Teflon AF (DuPont, Wilmington, DE, USA) as previously described19 (link). The design features 80 chromium actuation electrodes (2 × 2 mm), connected to 8 reservoir (6 × 8 mm) and 4 waste (6 × 4 mm) electrodes. Each electrode is connected by a 150 µm-wide chromium-trace leading to a contact pad at the edge of the substrate.
Teflon af
Manufactured by DuPont
Sourced in United States
Teflon AF is a fluoropolymer material developed by DuPont. It is a highly pure, amorphous form of polytetrafluoroethylene (PTFE) with a low refractive index. Teflon AF is designed for use in various laboratory equipment applications that require transparent, low-dielectric, and chemically resistant materials.
Automatically generated - may contain errors
Lab products found in correlation
Sylgard 184, by Dow (2 mentions)
Fluorinert fc 43, by 3M (1 mentions)
Polyvinyl alcohol (pva), by Merck Group (1 mentions)
Dimethyl carbonate, by Merck Group (1 mentions)
Inverted microscope, by Nikon (1 mentions)
Pico plus syringe pump, by Harvard Apparatus (1 mentions)
Pdgf bb, by Merck Group (1 mentions)
Superblock buffer, by Thermo Fisher Scientific (1 mentions)
Fluorescein di β d galactopyranoside, by Merck Group (1 mentions)
Tmb substrate, by Thermo Fisher Scientific (1 mentions)
Tween 20, by Merck Group (1 mentions)
Fluorinert fc 40, by 3M (1 mentions)
Az1505 photoresist, by MicroChemicals (1 mentions)
Amphotericin b, by Merck Group (1 mentions)
7 protocols using teflon af
1
Fabrication of Droplet Microfluidic Devices
2
Microfluidic PLGA Particle Synthesis
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Poly(d ,l lactic-co-glycolic acid) (PLGA, 38,000–54,000, 50:50 lactic acid: glycolic acid, acid terminated; SIGMA); Polyvinyl alcohol (PVA, average 30,000–70,000 mw, 87–90% hydrolyzed, Sigma Aldrich); High-speed FASTCAM camera (PCI-10K, Photron LTd.); high-speed Phantom monochrome camera (V310, Vision Research); Inverted microscope (Nikon); Plastic 1 ml Luer Norm-Ject syringes (Henke Sass Wolf); Glass 250 µl–1 ml Hamilton gastight instrument syringes (Hamilton); Pico Plus Syringe pumps (Harvard Apparatus); Teflon (PTFE) tubing (wall thickness 0.012, AWG 20, ICO Rally); PDMS (poly(dimethyl) siloxane, Sylgard 184, Dow Corning), Teflon AF (DuPont); Fluorinert FC-43 (3M); Biopsy punches (Integra Miltex); Air plasma chamber (Harrick Scientific); Dimethyl Carbonate (DMC, anhydrous 99%, SIGMA), PBS (Phosphate Buffered Saline, pH 7.4, without Calcium or Magnesium, Lonza).
3
Preparation of Cell Culture Materials
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Unless otherwise specified, reagents were purchased from Sigma-Aldrich (Oakville, ON) (including human recombinant PDGF-BB). Deionized (DI) water had a resistivity of 18 MΩ cm at 25 °C. Dulbecco's Modified Eagle's Medium (DMEM), 10% Pluronic F68 solution and Dulbecco's Phosphate-Buffered Saline (DPBS) with no calcium and magnesium (−/−) were purchased from Life Technologies (Carlsbad, CA). Antibodies were purchased from Santa Cruz Biotechnology (SCB) (Dallas, TX) and Cell Signaling Technologies (CST) (Danvers, MA). Clean room reagents and supplies included S1811 photoresist and MF-321 photoresist developer from Rohm and Haas (Marlborough, MA), CR-4 chromium etchant from Cyantek (Fremont, CA), AZ-300T photoresist stripper from AZ Electronic Materials (Somerville, NJ), Teflon-AF from DuPont (Wilmington, DE) and Parylene C dimer and Silane A174 from Specialty Coating Systems (Indianapolis, IN).
4
Fabrication of Electret Films via iCVD PTFE
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13 µm iCVD PTFE films were grown on 0.5 mm aluminum. A custom-made point-to-plane DC corona discharge setup is operated at Vtip = −6.5 kV tip potential and used to irradiate the samples with ions in order to fabricate electrets. The discharge is performed in ambient air for 60 s. The tip-to-sample distance is 5 mm. In this way iCVD PTFE thin film electrets, spin coated Teflon AF (Du Pont) electrets and bulk PMMA (Goodfellow) electrets are fabricated.
5
Supramolecular Dendrimer Synthesis
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Perfluorinated tapered supramolecular dendrimer material was synthesized by using the previously described method43 (link). Fluorinated polymer (Teflon AF, Dupont) were used as received. PDMS pad (5 mm thick) was prepared by thermal curing of the pre-polymer (Silicone Elastomer base: curing agent = 10:1 weight ratio, Sylgard 184, Dow corning) on cleaned Si wafer at 80 °C for 2 h.
6
Integrated Biosensing Platform Fabrication
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Following reagents were purchased from Sigma-Aldrich (Belgium): all buffer components, bovine serum albumin (BSA), Tween 20, Krytox 1525 oil and Fluorescein-di-(β-D-galactopyranoside) (FDG). Teflon-AF was obtained from Dupont (United States). Parylene-C dimer and Silane A174 were purchased from Plasma Parylene Coating Services (Germany). Reagents for photolithography were obtained from Rohm and Haas (United States). The fluoroalkylsilane, Dynasylan F8263, was a kind gift from Evonik Degussa International AG (Essen, Germany). Dynabeads M280 Tosylactivated superparamagnetic beads were purchased from Life Technologies (United States). Superblock buffer, TMB substrate and β-galactosidase labeled streptavidin (SBG) were purchased from Thermo Scientific (United States). PlusOne Drystrip Coverfluid oil was obtained from GE Healthcare (The Netherlands). Abbott Architect TSH reagent kits were kindly provided by Abbott Laboratories (United States). Commercially available anti-TSH antibodies 5409 and T25C were purchased from Medix Biochemica (Finland) and Fitzgerald Industries International (United States), respectively. Magnets for the off chip experiments were obtained from Supermagnete (Webcraft GmbH, Germany). Cyanoethyl pullulan (CEP) was obtained from Shin-Etsu Chemical Co. Fluoropel PFC 1101V was purchased from Cytonix.
7
Yeast Strain Culturing with Specialized Reagents
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Saccharomyces cerevisiae strain BY4741 was used in all experiments. Propidium iodide (PI; 540/608 nm) was supplied by Sigma Aldrich (Saint Louis, MO, USA). Amphotericin B was purchased from Sigma Aldrich (Saint Louis, MO, USA). Fluorinert FC-40 was purchased from 3M (St. Paul, MN, USA). Chemicals for photolithography, including S1818 and 351developer, were supplied by Rohm and Haas (Marlborough, MN, USA). AZ1505 photoresist was purchased from Microchemicals GmbH (Ulm, Germany). Parylene-C dimer and Silane A174 were purchased from Plasma Parylene Coating Services (Rosenheim, Germany). Teflon-AF® was obtained from Dupont (Wilmington, DE, USA).
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