The crystal structure of the NiO/MoSe2 was investigated by using a powder X-ray diffraction (PXRD) spectrometer with Cu Kα radiation (λ = 0.15406 nm) (X’pert powder XRD system, Malvern Panalytical). The surface morphology of the samples were characterized by using FE-SEM (FEI Quanta FEG 200) and HR-TEM (TEM, JEM-2100 Plus, Jeol) with energy dispersive X-ray (EDX) analysis. For TEM characterizations, 3 µL suspension of (0.5 mg/mL) NiO/MoSe2 was drop casted on copper grid and dried at room temperature. The sample coated copper grid was used for HR-TEM analysis. A PHI Versa Probe III Scanning XPS Microprobe was used for the XPS analysis (Physical Electronics, USA).
Quanta 200 feg
Manufactured by JEOL
Sourced in Japan
The Quanta 200 FEG is a scanning electron microscope (SEM) manufactured by JEOL. It is equipped with a field emission gun (FEG) source, which provides high-resolution imaging capabilities. The Quanta 200 FEG is designed for a variety of applications, including materials science, nanotechnology, and life sciences.
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Lab products found in correlation
Escalab 250, by Thermo Fisher Scientific (3 mentions)
Phi versa probe 3 scanning xps microprobe, by Physical Electronics (1 mentions)
Jem 2100 plus, by JEOL (1 mentions)
Jsm 5600lv scanning microscope, by JEOL (1 mentions)
Gemini 300, by Zeiss (1 mentions)
D8 discover diffractometer, by Bruker (1 mentions)
T6400, by Horiba (1 mentions)
D max 2500, by Rigaku (1 mentions)
A300 spectrometer, by Bruker (1 mentions)
Spectrum two ft ir spectrophotometer, by PerkinElmer (1 mentions)
D max iiia diffractometer, by Rigaku (1 mentions)
Raman spectrometer, by Renishaw (1 mentions)
7 protocols using quanta 200 feg
1
Structural Analysis of NiO/MoSe2 Heterostructure
2
Fabrication of PLLA Films with Micro-Nano Topography
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A poly(dimethylsiloxane) (PDMS) soft mold was made from a micro- or nano-patterned template by soft lithography, as previously described [38 (link)]. Briefly, the PDMS 10:1 elastomer and curing agent mixture was degassed, dispensed onto the masters and cured at 65 °C.
PLLA films were made by solvent casting using 3% w/v PLLA (Sigma Aldrich, St. Louis, MO, USA) dissolved in chloroform on the PDMS soft mold. The films were dried at room temperature covered with a glass dish. PLLA films were vacuum dried in a desiccator for 5 min to remove any residual solvent before demolding. The PLLA films were trimmed to 1.0-cm2 squares and sterilized with 70% ethanol (v/v) and ultraviolet irradiation.
To verify the surface morphology and fidelity of the micro- and nano-topography replication process, PLLA films were sputter coated with gold (JEOL JFC 1600 Fine Gold Coater, JEOL Ltd., Tokyo, Japan) and examined by scanning electron microscopy (SEM, Quanta FEG 200 and JEOL JSM-5600LV Scanning Microscope, JEOL Ltd., Tokyo, Japan).
PLLA films were made by solvent casting using 3% w/v PLLA (Sigma Aldrich, St. Louis, MO, USA) dissolved in chloroform on the PDMS soft mold. The films were dried at room temperature covered with a glass dish. PLLA films were vacuum dried in a desiccator for 5 min to remove any residual solvent before demolding. The PLLA films were trimmed to 1.0-cm2 squares and sterilized with 70% ethanol (v/v) and ultraviolet irradiation.
To verify the surface morphology and fidelity of the micro- and nano-topography replication process, PLLA films were sputter coated with gold (JEOL JFC 1600 Fine Gold Coater, JEOL Ltd., Tokyo, Japan) and examined by scanning electron microscopy (SEM, Quanta FEG 200 and JEOL JSM-5600LV Scanning Microscope, JEOL Ltd., Tokyo, Japan).
3
Multimodal Materials Characterization
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Microscopy images were taken
using a scanning electron microscope (Quanta 200FEG, Jeol Co.) and
a high-resolution scanning electron microscope (Gemini 300, Zeiss).
Transmission electron microscopy (TEM) and scanning TEM (STEM) and
energy-dispersive X-ray spectroscopy (EDS) analyses were conducted
using a Themis Z system. The fast Fourier transform (FFT) was resolved
using CrystBox diffractGUI. X-ray photoelectron spectroscopy (XPS)
measurements were conducted using a Scanning 5600 AES/XPS multitechnique
system (PHI, USA). X-ray diffraction (XRD) measurements were conducted
using a Bruker D8 Discover diffractometer.
using a scanning electron microscope (Quanta 200FEG, Jeol Co.) and
a high-resolution scanning electron microscope (Gemini 300, Zeiss).
Transmission electron microscopy (TEM) and scanning TEM (STEM) and
energy-dispersive X-ray spectroscopy (EDS) analyses were conducted
using a Themis Z system. The fast Fourier transform (FFT) was resolved
using CrystBox diffractGUI. X-ray photoelectron spectroscopy (XPS)
measurements were conducted using a Scanning 5600 AES/XPS multitechnique
system (PHI, USA). X-ray diffraction (XRD) measurements were conducted
using a Bruker D8 Discover diffractometer.
4
Comprehensive Characterization of Material Properties
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The morphological features of the samples were characterized using a field-emission scanning electron microscope (SEM, FEI Quanta 200 FEG) and transmission electron microscope (TEM, JEOL 2011). Elemental distribution mapping was performed by energy dispersive spectroscopy (EDS) coupled with SEM. The crystal structure was determined by X-ray diffraction (XRD, Rigaku D/max 2500) with Cu Kα radiation (k = 1.5406 Å) operating at 40 kV. Raman measurements were performed by laser Raman spectroscopy (Jobin Yvon, T6400). X-ray photoelectron spectroscopy (XPS) was carried out using an AXIS ULTRA DLD instrument with aluminum Kα X-ray radiation. The resistance test was carried out on a semiconductor powder resistance tester ST2722 (JINGGE Electronics Co., Ltd, Suzhou, China). The Brunauer–Emmett–Teller (BET) specific surface area and pore features were determined using nitrogen adsorption desorption (JW-BK 122W, JWGB, China) at 77 K.
5
Comprehensive Characterization of Synthesized Materials
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The structures of as-synthesized materials were measured by X-ray diffraction (XRD, Cu Kα, λ = 1.54056 Å) with a Rigaku D/max-IIIA diffractometer at 293 K. The morphology and microstructure of the materials were characterized using a field-emission scanning electron microscope (FESEM, Quanta 200 FEG), and their detailed microstructure was further evaluated by transmission electron microscopy (TEM, Model JEM-2011, JEOL, Japan) with a Rontec EDX system. XPS spectra were obtained using a Thermo Fisher Scientific ESCALAB 250. All of the XPS spectra were calibrated with the C 1s peak at 284.8 eV as the binding energy reference. The electron paramagnetic resonance (EPR) spectra were obtained using a Bruker A300 spectrometer (microwave frequency = 9.74 GHz; modulation amplitude = 2 G; modulation frequency = 50 KHz; time constant = 10 ms; conversion time = 25 ms). The Fourier transform infrared spectroscopy (FTIR) spectra were collected using KBr as the reference sample on a Spectrum Two FTIR spectrophotometer (PerkinElmer, Waltham, USA). The TG spectra were measured using a Labsys evo TG-DTA/DSC (Setram, Lyon, France). The Raman spectra were obtained using a Raman spectrometer (Renishaw, London, UK). N2 adsorption–desorption isotherms were performed on an A Micromeritics ASAP 2020 analyzer (Micromeritics, Georgia, USA) at liquid nitrogen temperature (77 K).
6
Multimodal Characterization of Powder Samples
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The microstructure of the samples was characterized by field emission scanning electron microscopy (FESEM, Philips, FEI Quanta 200 FEG) and transmission electron microscopy (TEM, Tokyo, Japan, JEOL 2100F). The composition of the sample was analyzed by an energy dispersive spectroscope (EDS, INCA) attached to the SEM. Infrared spectra were recorded on a PE (Spot-light 3000) Fourier transform infrared (FTIR) spectrometer using the KBr disk technique to investigate the different functional groups in the powders before and after annealing. Raman spectroscopy (Spex Raman Log 1403) was employed to verify chemical bonding characteristics of carbon. Thermogravimetric analysis TG-DSC (SETARAM, LABSYS evo) was carried out in the temperature range 30 to 1000 °C at a scanning rate of 10 °C min−1 in air.
7
Characterizing Surface Materials via XPS and SEM
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XPS measurements were performed
using the 5600 Multi-Technique System (PHI, U.S.A.). SEM images were
taken using Environmental SEM (Quanta 200FEG, Jeol Co.).
using the 5600 Multi-Technique System (PHI, U.S.A.). SEM images were
taken using Environmental SEM (Quanta 200FEG, Jeol Co.).
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