Tds2002c

The chip was acoustically actuated by a piezoelectric transducer glued underneath the separation channel and connected to a waveform generator (Tektronix AFG3022B, UK Ltd., Bracknell, UK) through an in-house built amplifier. The driving voltage was monitored with an oscilloscope (Tektronix TDS2002C, UK Ltd., Bracknell, UK) and held at 15 V peak-to-peak through an in-house written software controlling the waveform generator. The actuation voltage was chosen to be the highest possible where temperature feed-back loop could still retain the chip at 25 °C. The actuation frequency was tuned by visual optimization of the acoustic focusing and was set to 1.99 MHz unless otherwise stated.

Figure S1A,B show a plasma jet device operated at atmospheric pressure that produces high concentrations of H₂O₂. Plasma is generated between electrodes without a porous ceramic-based dielectric barrier using 1.5 standard liters per minute (SLM) of N₂ gas at atmospheric pressure [29 (link)]. A high voltage was supplied to the jet source by an AC commercial transformer. Waveforms were generated at a voltage of 1.06 kV (TDS2002C; Tektronix) and a current of 4.5 mA (P6021, Tektronix, Beaverton, Oregon) (Figure S1C). Optical emission spectroscopy (OES) of plasma in the 200–500 nm range was recorded using an HR4000 spectrometer (Ocean Optics Inc., Dunedin, FL, USA). The distance between the plasma exit and the surface of the medium was fixed at 5 mm. We prepared PTM by applying an NTPJ to 500 µL/well of DMEM without (Sigma-Aldrich Corp., St. Louis, MO, USA) or with (Welgene, Taipei, China) NaPyr in 24-well culture plates for 5 min (Figure 1). The PTM was then diluted in a medium with or without NaPyr.