Pgmea developer

Manufactured by MicroChem

PGMEA developer is a chemical solvent used in the photolithography process during the development stage. It serves as a developer to dissolve and remove the exposed photoresist material from the substrate, revealing the desired pattern.

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Lab products found in correlation

Su 8 2010 photoresist, by MicroChem (1 mentions) Su 8 2010, by MicroChem (1 mentions)

Spelling variants of this product

PGMEA (4 citations) PGMEA developer solution (2 citations)

2 protocols using pgmea developer

Fabrication of Porous SU-8 Scaffolds for Cell Culture

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SU-8 2010 photoresist (MicroChem Corp.) was used to develop free-standing porous microstructures that served as scaffolds on which primary HTM cells were cultured. Using photolithographic techniques and a chrome mask with defined micrometer-scale features, we fabricated SU-8 scaffolds as previously described13 (link). Briefly, a release layer was spin-coated on the silicon wafer (substrate) and baked at temperatures between 120–150 °C. Photoresist was spin-coated on the substrate to a final thickness of <5 μm, then baked at 95 °C and cooled to room temperature. The photoresist was exposed to UV-light (140 mJ/cm²) through a chrome mask containing the desired pattern, baked at 95 °C and developed in PGMEA developer (MicroChem Corp.) SU-8 scaffolds with desired features were released from the substrate, washed with isopropyl alcohol, air dried and stored at room temperature. Scaffolds were mounted on aluminum rings, sterilized using 70% ethanol and coated with 1% gelatin before seeding HTM cells.

Torrejon K.Y., Papke E.L., Halman J.R., Bergkvist M., Danias J., Sharfstein S.T, & Xie Y. (2016). TGFβ2-induced outflow alterations in a bioengineered trabecular meshwork are offset by a rho-associated kinase inhibitor. Scientific Reports, 6, 38319.

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Fabrication of Biomimetic Porous Microstructures

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SU-8 2010 (MicroChem Corp.) was used to develop free-standing biomimetic porous microstructures that served as scaffolds on which primary HTM cells were cultured. Scaffolds were fabricated using standard photolithographic techniques as previously described (Torrejon et al. 2013 (link)). Briefly; a release layer was spin-coated on the wafer and baked at 150 °C. SU-8 2010 was applied by spin-coating to final thickness of 5 μm, then baked at 95 °C and cooled to room temperature. The resist was UV-exposed through a mask containing the desired pattern, baked at 95°C and developed in PGMEA developer (MicroChem Corp.) SU-8 scaffolds with the desired features were released from the substrate, washed with acetone and sterilized using 70% ethanol.

Torrejon K.Y., Papke E.L., Halman J.R., Stolwijk J., Dautriche C.N., Bergkvist M., Danias J., Sharfstein S.T, & Xie Y. (2015). Bioengineered Glaucomatous 3D Human Trabecular Meshwork as an in vitro Disease Model. Biotechnology and bioengineering, 113(6), 1357-1368.

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