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D max ga x ray diffractometer

Manufactured by Rigaku
Sourced in Japan

The D/max-ga X-ray diffractometer is a versatile instrument designed for the analysis of a wide range of materials. It utilizes X-ray diffraction techniques to provide detailed information about the crystallographic structure and composition of samples. The core function of this product is to accurately measure and analyze the diffraction patterns generated by materials when exposed to X-rays, allowing for the identification and characterization of various substances.

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5 protocols using d max ga x ray diffractometer

1

Comprehensive Characterization of Pt-based Samples

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The crystal structure of the Pt-based samples was characterized by X-ray powder diffraction (XRD) using a Rigaku D/max-ga X-ray diffractometer with graphite monochromatized Cu Kα radiation (λ = 1.54178 Å). Transmission electron microscopy (TEM) images of such samples were taken using a HITACHI HT-7700 microscope operated at 100 kV. High-resolution transmission electron microscopy (HRTEM) was performed using a FEI Tecnai F30 G2 microscope operated at 300 kV. High-angle annular dark-field scanning TEM (HAADF-STEM) and Energy dispersive X-ray (EDX) mapping analyses were taken on a FEI Titan ChemiSTEM equipped with a probe-corrector and a Super-X EDX detector system and operated at 200 kV. The percentages of the elements in the samples were determined using inductively coupled plasma atomic emission spectrometry (ICP-AES, IRIS Intrepid II XSP, TJA Co., USA). Gas chromatography mass spectrometer (GC-MS) measurements were performed on a GC-MS 7890A-5975C (Agilent) with molecular ion selective monitoring. All of these samples were diluted with acetone in fixed ratio before the GC-MS measurement.
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2

Comprehensive Characterization of Polymer and Semiconductor Nanostructures

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The morphology of synthesized P3HT NWs and CdSe NTs was confirmed by high-resolution transmission electron microscope (HR-TEM, JEM-2100) at an acceleration voltage of 200 kV. The crystal structure was researched by X-ray diffraction (XRD) on a Rigaku D/max-gA X-ray diffractometer with Cu Kα radiation. Light absorption measurements were carried out on Varian Cary-5000 model Ultraviolet-visible infrared spectrophotometer. Photoluminescence (PL) spectra were collected on HORIBA Jobin Yvon Fluorlog-3 system, with exciting wavelength of 360 nm. Time-resolved photoluminescence (TRPL) spectroscopy measurements (FLSP920 lifetime spectrometers, Edinburgh Instruments, EI) were conducted using a pulse laser (380 nm) with a pulse width of 70 ps for excitation. The current-voltage characterizations were carried out using a Keithley 2440 source meter and Newport 94043A solar simulator (AM 1.5 illumination). For the surface photovoltage (SPV) spectra measurements, the samples were excited with a laser radiation pulse (wavelength of 355 nm and pulse width of 5 ns) from a third-harmonic Nd:YAG laser (Polaris II, New Wave Research, Inc.)
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3

Comprehensive Materials Characterization Techniques

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Transmission electron microscopy (TEM) images were obtained with a Hitachi HT-7700 microscope operated at 100 kV. High-resolution transmission electron microscopy (HRTEM) was performed using a FEI Tecnai G2 F20 microscope operated at 200 kV. High-angle annular dark-field scanning TEM (HAADF-STEM) was conducted on an FEI Titan ChemiSTEM operated at 200 kV. X-ray powder diffraction (XRD) patterns were recorded on a Rigaku D/max-ga X-ray diffractometer with graphite monochromatic Cu Kα radiation (λ = 1.54178 Å). X-ray photoelectron spectroscopy (XPS) analysis was performed on a scanning X-ray microprobe (Axis Supra, Kratos Inc.) with Al Kα radiation. The corresponding binding energies were calibrated with a C–C 1s peak of 284.5 eV. The absorption spectra of the samples were recorded on an ultraviolet-visible-near infrared (UV-vis-NIR) spectrophotometer (Agilent, Cary 5000). Inductively coupled plasma atomic emission spectroscopy (ICP-AES) was performed using an IRIS Intrepid II XSP (TJA Co.).
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4

Characterization of CMZTSSe Solar Cells

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X-ray diffraction (XRD) was implemented using an X-ray diffractometer (Rigaku D/max ga X-ray diffractometer in Tokyo, Japan), wherein Cu Ka (λ = 0.15406 nm) was the radiation source. Raman spectra were recorded using a Renishaw system (Renishaw, London, UK) with a 514 nm excitation wavelength. Scanning electron microscopy (SEM) was performed using a Hitachi S-4800 (JEOL Ltd., Tokyo, Japan), which was provided with energy-dispersive X-ray spectroscopy (EDS) under 15 kV at various magnifications. The composition of the CMZTSSe was characterized by X-ray photoelectron spectroscopy (XPS) (Thermofisher, Waltham, MA, USA) with monochromated Al Kα radiation. An ultraviolet–visible–near-infrared (UV–vis–NIR) spectrophotometer (UV-3101PC, Tokyo, Japan) was used to characterize the optical properties of the CMZTSSe. A Hall-effect measurement system (Lake shore 7600 Hall, Irvine, CA, USA) was used to test the electrical performance. The current–voltage measurements under AM 1.5 G simulated sunlight illumination (Model 91160, Newport, Irvine, CA, USA) was performed to characterize the electrical properties of the solar cell. An external quantum efficiency (EQE) measurement system was applied to measure the spectral response of the device (QEX10, Newport, Irvine, CA, USA).
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5

Comprehensive Materials Characterization Techniques

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The morphology of the as-prepared samples was characterized via field emission scanning electron microscopy (FESEM, HITACH S4800) and transmission electron microscopy (TEM, PHILIPS F200). Energy dispersive spectroscopy (EDS) mapping images and line scanning images were recorded by a FEI Titan ChemiS TEM equipped with a probe-corrector and a Super-X EDS detector system. X-ray photoelectron spectroscopy (XPS) was performed by employing a Thermo ESCALAB 250Xi spectrometer with a monochromatic Al Kα line (1486.6 eV). The crystal structures of the materials were determined using a high power X-ray diffractometer (XRD) on a Rigaku D/max-ga X-ray diffractometer, where the Cu Kα radiation was 1.54 Å.
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