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Sigma field emission scanning electron microscope fe sem

Manufactured by Zeiss
Sourced in Italy

The Sigma Field Emission Scanning Electron Microscope (FE-SEM) is a high-performance imaging instrument designed for advanced materials analysis. It utilizes a field emission electron source to generate a focused electron beam, enabling high-resolution imaging and analysis of a wide range of samples. The Sigma FE-SEM provides exceptional image quality and analytical capabilities for various applications in materials science, nanotechnology, and other related fields.

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6 protocols using sigma field emission scanning electron microscope fe sem

1

Scanning Electron Microscope Imaging

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SEM images were obtained
on a Zeiss Sigma Field Emission–Scanning Electron Microscope
(FE-SEM). The beam voltage was set to 10 kV, and the working distances
were in the range of 5–15 mm. An in-lens detector was used.
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2

Hydrogel Microstructural Characterization

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The hydrogel samples were equilibrated in 1xPBS at room temperature and subsequently frozen at −80°C for 1 hr. The samples were then freeze-dried overnight, and the fractured cross-sections were mounted on aluminum studs. After sputter-coating with gold, the Zeiss Sigma field emission scanning electron microscope (FE-SEM) was used to image the samples.
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3

Microstructural Characterization of Steel

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The ordered phases were characterized by examination of selected-area diffraction patterns (SADPs) and bright-field (BF) images in transmission electron microscopy (TEM) JEOL 2000FX. Thin foils for TEM observation were prepared by twin-jet electro-polishing in a mixture of 10% perchloric acid and 90% ethanol with an applied potential of 25 V. The steel specimens were, also, polished and etched in a 5% nital solution and the microstructures were observed using a Carl Zeiss Sigma Field Emission Scanning Electron Microscope (FE-SEM) operated at 20 kV. The equipment was fitted with high-speed X-ray energy dispersive spectroscopy (EDS).
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4

FESEM Microstructural Examination Protocol

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Microstructural examination was carried out using a Zeiss Sigma field emission scanning electron microscope (FESEM) equipped with an Energy-dispersive X-ray spectroscopy (EDX) detector. Small powder amounts or fractured specimen pieces were sputter coated with Au-Pd and imaged in secondary electron mode at various magnifications, 15 kV acceleration voltage and 8 mm working distance.
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5

Characterization of ZnO Precursor and Films

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The morphology of the precursor of ZnO, of ZnO powders, and of the respective sensing films was studied using a Carl Zeiss Sigma Field Emission Scanning Electron Microscope (FE-SEM).
The Brunauer–Emmett–Teller (BET) method was used to estimate the specific surface area of the samples. It was applied to the adsorption/desorption isotherms of N2 at 77 K obtained with a Micromeritics ASAP 2010 physisorption analyzer.
X-ray diffraction (XRD) analysis was performed by means of a vertical Philips PW 1830 diffractometer (PANalytical, formerly Philips Analytical, Almelo, the Netherland) that works with Bragg-Brentano geometry. It was used Cu Kα radiation (40 kV, 30 mA) and the diffraction patterns were collected from 15° to 90° (2θ) with steps of 0.02° and 10 s of dwell time. The Rietveld refinement was adopted to estimate the unit cell parameters and carried out using FullProf program (release 2011) [55 (link)]. The Scherrer’s formula was applied onto the three main diffraction peaks of each diffractogram and the mean values were calculated obtaining the average crystallite size [56 (link)].
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6

Scanning Electron Microscopy of Explanted Electrodes

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All of the electrodes were carefully removed from the patients, without any complications or damage to the hardware. The electrodes were preserved in three different surgical specimen boxes after rinsing them with saline solution. The study included both the explanted electrodes (3389; Medtronic, length 25 cm) and a new lead produced by the same company (3389; Medtronic, length 40 cm). Depending on the facilities availability, the analysis through SEM-EDX techniques was not performed the same day of removal.
Scanning electron microscopy characterization of the electrode had been performed at the Micro and Nano-Fabrication Platform of Fondazione Filarete, Milan, Italy, using a Zeiss Sigma Field Emission Scanning Electron Microscope (FE-SEM). The chemical composition analysis of the samples was performed using a Bruker Quantax 400 EDS detector (30 mm 2 XFlash silicon drift detector) installed on the SEM.
SEM was carried out to describe the morphological features of the electrodes at different magnifications, while EDX was performed to analyze the chemical properties of the materials.
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