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Naioafm

Manufactured by Nanosurf
Sourced in Switzerland

The NaioAFM is a compact atomic force microscope designed for high-resolution imaging and analysis of surfaces at the nanoscale. It features a closed-loop scan system and a high-sensitivity cantilever detection system to provide accurate and reliable measurements of topography and other surface properties.

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13 protocols using naioafm

1

High-Resolution Imaging of MoS2 Flakes

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HRTEM was conducted using an FEI Titan transmission microscope operating at 300 kV at Brookhaven National Laboratory. The sample was prepared by dropping one drop of exfoliated MoS2 in ethanol solution on lacey-carbon Cu grids (Ted Pella Inc., CA). The Cu grids were dried in air to make sure there are sufficient isolated flakes to be observed. SEM images were obtained using a JEOL JSM-7000F instrument at 4 kV of power and under an ultra-high vacuum, 10−5 Pa. Secondary electron detector was utilized at 10 mm working distance to capture high-resolution images of MoS2 features at magnifications as high as 100,000X. The AFM images were taken using a NaioAFM of Nanosurf in intermittent mode with a cantilever resonance frequency of ~148 kHz.
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2

Atomic Force Microscopy for Surface Roughness

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To measure roughness, we used AFM (NaioAFM, Nanosurf, Basel, Switzerland). It was calibrated according to the manufacturer's instructions, and a 10 × 10 µm scan size was used for all samples. Roughness values (Ra) were calculated by the software of the device (Naio control software, v.3.10.0, Nanosurf, Basel, Switzerland) and reported in nanometers [20 (link)].
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3

Morphological Analysis of Cellulose Nanocrystals

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After hydrolysis, the CSR products were examined using a scanning electron microscope (SEM, JEOL JSM6610LV, JEOL Ltd., Tokyo, Japan). Initially, samples were coated with gold by dc-sputtering technique using a Denton Vacuum Desk V-Sputter/etch unit, with 20 mA of current for 30 s. Then, the samples were observed with an acceleration voltage of 10 kV.
Surface morphology for CNCs samples was examined using an atomic force microscope (NaioAFM, Nanosurf, Liestal, Switzerland). The equipment was operated in phase contrast mode using PPP-FMAuD Gold Coated Force Modulation AFM Probes (Nanosensors, Neuchâtel, Switzerland) at a resonance frequency of 75 kHz, spring constant of 2.8 N m−1, and tip radius of about 7 nm. For this purpose, the original CNCs solution was diluted fivefold with deionized water and sonicated for 30 min. Then, one drop of the diluted solution was deposited on a regular microscope slide and put it in a vacuum drying oven al 60 °C and 0.5 bar of air pressure for 30 min. After this procedure the samples are ready for AFM data acquisition, where the time of each essay was 310 ms per line and each micrograph has 1024 lines of resolution. From the AFM images obtained, 150 diameter measurements of the CNCs were taken, and average values were determined by using the ImageJ software (Fiji distribution, open-source) [20 (link)].
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4

Atomic Force Microscopy Imaging of NEFs

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AFM imaging was conducted as described (36 (link),37 (link)). Briefly, NEF preparations were diluted 1:200 with deionized water. A total of 5-10 µl of samples were then spotted onto freshly cleaved mica sheets (Grade V-1, thickness 0.15 mm, size 10×10 mm). All mica substrates were dried at room temperature and analyzed using a Nanosurf NaioAFM (Nanosurf AG, Liestal, Switzerland), equipped with Tap190AI-G tips (Budget Sensors; Innovative Solutions Bulgaria Ltd., Sofia, Bulgaria). Images were captured in tapping mode; the scan size ranged from 0.5-15 mm; the scan speed ranged from 0.6 to 1.5 sec × line.
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5

Comprehensive Characterization of rPS and rPS/PU Films

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rPS and rPS/PU film of about 1 mm thickness cast on a clean glass slide were allowed to dry-through and used for instrumental characterization. The chemical functionality of the materials was investigated using Fourier transform infrared (FTIR) spectroscopy. The FTIR analysis was carried out using an Agilent (Cary 630) spectrometer operated at 8 cm−1 resolutions, a spectra range of 4000–650 cm−1, and 30 scans per second.
The morphological characteristics of the materials were evaluated using X-ray diffraction (XRD). XRD analysis was carried out using a Shimadzu XRD-6000 deffractometer operated at 40 kV and 30 mV. The scanning range of 2θ was between 2.0 and 65.0, the scan speed was 2° 2θ/min, and the receiving slit width was 0.30 mm.
A Phenom ProX scanning electron microscope operated at an acceleration voltage of 15 kV, was used to depict the micrograph of the materials.
The thermal stability of the materials was studied using thermogravimetric analysis (TGA). TGA was performed with the SDT Q600 V20.9 Build 20 instrument. The temperature of the analysis started from 25 °C to 900 °C within an inert nitrogen atmosphere with a heating rate of 10 °C min−1.
A 3D nanoscale micrograph of materials was depicted using the atomic force microscopy (AFM). This was performed using Nanosurf Naio AFM.
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6

Atomic Force Microscopy of Samples

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Three representative specimens randomly selected samples from each group were evaluated through an atomic force microscope (NaioAFM, Nanosurf, Liestal, Switzerland) using a previous methodology [23 (link)] with some modifications. A total of five representative images with a 50 × 50 μm area were acquired in tapping mode for each specimen at each location. All AFM images were processed with the Naio control software version 3.10.0 (Nanosurf, Liestal, Switzerland); the Ra and Rz parameters were determined in nanometers (nm) across independent scans areas per specimen and expressed in micrometers (µm) as mean ± standard deviation to compare these results with the ones obtained using the profilometry.
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7

Morphological Analysis of CNCs using AFM

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The morphology for CNCs samples was examined using an atomic force microscope (NaioAFM, Nanosurf, Liestal, Switzerland). The equipment was operated in phase-contrast mode using PPP-FMAuD Gold Coated Force Modulation AFM Probes (Nanosensors, Neuchâtel, Switzerland) at a resonance frequency of 75 kHz, spring constant of 2.8 N m−1 and tip radius of about 7 nm. For this purpose, the original CNCs solution was diluted fivefold with deionized water and sonicated for 30 minutes. Then, one drop of the diluted solution was incubated for 3 minutes on muscovite mica substrates (Grade V1, SPI supplies, West Chester, PA, USA), and then was gently dried with nitrogen. After this procedure, the samples are ready for AFM data acquisition, where the time of each essay was 310 ms per line, and each micrograph has 1024 lines of resolution. The CNC diameters were analyzed using AFM images, to do this, the images were processed using the ImageJ software (Fiji distribution, open-source) and the number of measurements for each sample was made according to standard ISO/TR 19716: 2016.
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8

Topographic and Phase Imaging of Solid Dispersions

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The NaioAFM (Nanosurf, Switzerland) instrument was used to obtain topographic and phase images, allowing calculation of the surface roughness of the solid dispersions. Samples of extrudate were softened immediately after HME between two flat glass slides and then cooled on metal block. The slides were then carefully removed, and the solid sample was placed on the sample holder. Both topographic and phase images were generated with the instrument operating in dynamic mode using a Tap 190Al-G cantilever (BudgetSensors, Bulgaria). Image sizes were 10x10 µm or 25x25 µm, taken at a speed of 0.8 seconds per line. Additional parameters were varied depending on each sample and optimum sensitivity. The setpoint of the cantilever was varied from 50% to 60% of the free vibrational amplitude, which was varied from 200-1000 mV. Nanosurf Naio software was used to control, obtain the data and Image J was used to further analyse the images.
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9

Atomic Force Microscopy of Extracellular Vesicles

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EVs were concentrated 4× and incubated in suspension and treated with ibandronate as above. Following 8 d of incubation, samples underwent ultracentrifugation, and the pellets were resuspended in MilliQ water with protease inhibitor 1:1,000, and spotted onto freshly cleaved mica sheets. Representative images were acquired with a NaioAFM (Nanosurf AG) equipped with Multi75Al-G probe in tapping mode. Imaging analysis was performed with the software WSxM 5.0 image (56 (link)). For detachment force measurements, samples were imaged using a NaioAFM (Nanosurf AG) equipped with ContAl-G probe (nominal spring constant k ∼ 0.2 N⋅m−1) in contact mode. The AFM probe was then positioned above the center of each EV/microcalcification, and individual force curves were recorded with a Z-starting offset of 500 nm and a Z-piezo speed of XYZ 10 μm⋅s−1. Multiple EV/microcalcifications structures were probed in order to obtain a NDF value, representative of each sample. The software SPIP 6.7.2 (Image Metrology A/S) was then used to analyze the force-distance curves and obtain the detachment force values. These protocols are further described in SI Appendix.
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10

Atomic Force Microscopy for PEEK Surface Roughness

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The surface roughness of the PEEK samples was measured using an atomic force microscope (AFM, NaioAFM, Nanosurf Switzerland). The AFM was calibrated according to the manufacturer's instructions, and a 10 μm × 10 μm scan size was used for all samples. Roughness values (Ra) were calculated by the software of the AFM and reported in nanometers [28 (link)]. Surface roughness analysis by AFM was chosen in this study due to its precise imaging quality and great ability to analyse, revealing vital details about topography, which affects osseointegration, stability, and biocompatibility for improved biomedical outcomes [29 (link), 30 (link)].
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