Naioafm
The NaioAFM is a compact atomic force microscope designed for high-resolution imaging and analysis of surfaces at the nanoscale. It features a closed-loop scan system and a high-sensitivity cantilever detection system to provide accurate and reliable measurements of topography and other surface properties.
Lab products found in correlation
13 protocols using naioafm
High-Resolution Imaging of MoS2 Flakes
Atomic Force Microscopy for Surface Roughness
Morphological Analysis of Cellulose Nanocrystals
Surface morphology for CNCs samples was examined using an atomic force microscope (NaioAFM, Nanosurf, Liestal, Switzerland). The equipment was operated in phase contrast mode using PPP-FMAuD Gold Coated Force Modulation AFM Probes (Nanosensors, Neuchâtel, Switzerland) at a resonance frequency of 75 kHz, spring constant of 2.8 N m−1, and tip radius of about 7 nm. For this purpose, the original CNCs solution was diluted fivefold with deionized water and sonicated for 30 min. Then, one drop of the diluted solution was deposited on a regular microscope slide and put it in a vacuum drying oven al 60 °C and 0.5 bar of air pressure for 30 min. After this procedure the samples are ready for AFM data acquisition, where the time of each essay was 310 ms per line and each micrograph has 1024 lines of resolution. From the AFM images obtained, 150 diameter measurements of the CNCs were taken, and average values were determined by using the ImageJ software (Fiji distribution, open-source) [20 (link)].
Atomic Force Microscopy Imaging of NEFs
Comprehensive Characterization of rPS and rPS/PU Films
The morphological characteristics of the materials were evaluated using X-ray diffraction (XRD). XRD analysis was carried out using a Shimadzu XRD-6000 deffractometer operated at 40 kV and 30 mV. The scanning range of 2θ was between 2.0 and 65.0, the scan speed was 2° 2θ/min, and the receiving slit width was 0.30 mm.
A Phenom ProX scanning electron microscope operated at an acceleration voltage of 15 kV, was used to depict the micrograph of the materials.
The thermal stability of the materials was studied using thermogravimetric analysis (TGA). TGA was performed with the SDT Q600 V20.9 Build 20 instrument. The temperature of the analysis started from 25 °C to 900 °C within an inert nitrogen atmosphere with a heating rate of 10 °C min−1.
A 3D nanoscale micrograph of materials was depicted using the atomic force microscopy (AFM). This was performed using Nanosurf Naio AFM.
Atomic Force Microscopy of Samples
Morphological Analysis of CNCs using AFM
Topographic and Phase Imaging of Solid Dispersions
Atomic Force Microscopy of Extracellular Vesicles
Atomic Force Microscopy for PEEK Surface Roughness
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