The responsive microswimmers were prepared using sequential capillarity-assisted particle assembly (sCAPA). The basic principles of sCAPA are described by Ni et al. (22 (link)). Here, we used an adapted version of sCAPA, which uses masters prepared with direct writing via two-photon nanolithography, as opposed to Si masters made with conventional lithography methods. Briefly, negative masters were prepared with two-photon lithography (Nanoscribe Photonic Professional GT2) using a 63x oil-immersion objective and IP-Dip solution set (37 ). The masters contained 6 smaller areas with 10,000 “traps" each, and one area was used to prepare the particles for one experiment. After printing and developing under standard conditions, these masters were postcured for 2 h under a UV-lamp and coated with a perfluoro silane using chemical vapor deposition. PDMS (Sylgard 184) was used to make templates from these masters. sCAPA was performed as described in the following paper (38 (link)). The PS particles were deposited from a 0.035% Triton X-45 and 3.5 mM SDS solution in Milli-Q water. The microgels were from a 0.04% Triton X-45 in 1 mM HEPES pH 7.4 or 0.025% Triton X-45 in 1 mM MES pH 4.5 for green- and red-core microgels, respectively. All depositions were carried out at 25 °C with a deposition rate of 3 µm s−1.
Photonic professional gt2
Manufactured by Nanoscribe
Sourced in Germany
The Photonic Professional GT2 is a high-resolution 3D printing system designed for the fabrication of micro- and nano-scale structures. It utilizes a two-photon polymerization process to enable the direct writing of complex 3D geometries with feature sizes down to the sub-micron scale. The system offers a build volume of up to 300 x 300 x 300 μm³ and is capable of producing parts with a minimum feature size of 200 nm.
Automatically generated - may contain errors
Lab products found in correlation
Describe software, by Nanoscribe (2 mentions)
Ip dip, by Nanoscribe (1 mentions)
Oil objective, by Zeiss (1 mentions)
Plan apochromat 63 1.4 oil dic m27, by Zeiss (1 mentions)
Immersol 518f, by Zeiss (1 mentions)
Pgmea, by Merck Group (1 mentions)
Solidworks, by Dassault Systèmes (1 mentions)
Ips resin, by Nanoscribe (1 mentions)
Ip l 780, by Nanoscribe (1 mentions)
15 protocols using photonic professional gt2
1
Fabrication of Responsive Microswimmers via sCAPA
2
Calibration Wedges for 2PP Printing
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The
calibration wedges38 (link) were designed in AutoCAD
2022 and exported as a .stl-file. They are 100 μm long with
a slope of 10, 15, 20, and 25°. Their widths are 40, 45, 50,
and 55 μm, respectively, to distinguish them. The length of
the base is 40 μm and the top is 20 μm. A fused silica
substrate (Multi-Dill, NanoScribe GmbH, Germany) was cleaned with
the standard procedure from NanoScribe (EtOH rinse, plasma-treated
for 20 s using normal pressure plasma in ambient air with a Piezobrush
PZ2 (relyon plasma GmbH, Germany)). A commercial 2PP DLW setup (Photonic
Professional GT2, NanoScribe GmbH, Germany) with a 63× NA = 1.5
objective and commercial Dip-in resin (IP-Dip, NanoScribe GmbH, Germany)
was used to print all calibration wedges on a single substrate. The
prints were developed with the standard procedure (20 min PGMEA, 5
min IPA, dried with nitrogen) and postcured with UV light (365 nm)
for 1 h.
calibration wedges38 (link) were designed in AutoCAD
2022 and exported as a .stl-file. They are 100 μm long with
a slope of 10, 15, 20, and 25°. Their widths are 40, 45, 50,
and 55 μm, respectively, to distinguish them. The length of
the base is 40 μm and the top is 20 μm. A fused silica
substrate (Multi-Dill, NanoScribe GmbH, Germany) was cleaned with
the standard procedure from NanoScribe (EtOH rinse, plasma-treated
for 20 s using normal pressure plasma in ambient air with a Piezobrush
PZ2 (relyon plasma GmbH, Germany)). A commercial 2PP DLW setup (Photonic
Professional GT2, NanoScribe GmbH, Germany) with a 63× NA = 1.5
objective and commercial Dip-in resin (IP-Dip, NanoScribe GmbH, Germany)
was used to print all calibration wedges on a single substrate. The
prints were developed with the standard procedure (20 min PGMEA, 5
min IPA, dried with nitrogen) and postcured with UV light (365 nm)
for 1 h.
3
Micro-Nano 3D Printed Micromodules
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The micromodules were fabricated by a micro–nano 3D printing system. First, the shape and size of the micromodules were designed using SOLIDWORKS software (Educational version). A mesh was generated and exported as an STL file for printing. The STL file was then imported into the DeScribe software (version number: 2.5.7, Nanoscribe GmbH, Karlsruhe, Germany), which enabled us to display a 3D preview of the model and set writing parameters, including rescaling, structure slicing, and plane filling lines, which represent the laser scanning paths. The micromodules were 3D microprinted using a two-photon laser direct writing system (Photonic Professional GT2, Nanoscribe GmbH, Germany) with an objective (25×, NA = 0.8) and IP-S resin, a material produced by Nanoscribe, on a glass substrate. The 2-PP printing was performed in oil mode. A femtosecond laser with a wavelength of 780 nm was used as the light source. Micromodules were developed using propylene glycol methyl ether acetate solution (PGMEA) for 20 min and isopropanol (IPA) for 30 s to remove the remaining resin solution. The micromodules were scratched off the substrate using a pipette tip and transferred to the chip.
4
3D Printing Biocompatible Microprobes
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Photonic Professional GT2 (Nanoscribe GmbH & Co. KG) is utilised to 3D print the proposed microprobe. In consideration of the microprobe dimensions and the need for biocompatibility, a 25x objective and the corresponding resin, IP-S (Kramer et al. 2020 ), are chosen for fabrication. The “solid” is selected as the “fill mode” while the “slicing” and “hatching” distances are 1 μm and 0.5 μm, respectively. For the development of the printed sample, isopropyl alcohol (IPA) and propylene glycol methyl ether acetate (PGMEA) are used as solvents.
5
Two-Photon Laser Printing of Microgeometries
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Viscous ink (5–10 mg) was transferred to a silanized cover slide (22 × 22 mm, 170 µm thickness) with a spatula and covered with a smaller circular slide, which was gently pressed on to ensure good contact between the ink and the glass slide and reduce solvent evaporation. Two‐photon laser printing was performed within a commercially available setup (Photonic Professional GT2, Nanoscribe GmbH & Co. KG) in an oil immersion configuration with a femtosecond laser (λ = 780 nm) focused by a 63x oil objective (NA = 1.4; WD = 190 µm; Zeiss). Employing Describe software (Nanoscribe), GWL files were generated from STL files of desired geometries and executed by the printer for 3D structure fabrication. Slicing was set to either 200 or 300 nm and hatching to 200 nm for all microgeometries. Printing was performed with a varied scan speed of from 2 to 2.5 mm s−1 and laser power in the range of 17.5 to 22.5 mW depending on the structure. For development, the cover slide was placed into the same solvent used for the ink preparation until all excess ink was dissolved.
6
Two-photon 3D Printing of 2D Materials
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A two-photon 3D printer
(Photonic Professional GT2, Nanoscribe, Germany) was used to generate
patterns in the 2D materials. The 2D materials were exposed in an
oil immersion configuration using a 63× objective (Plan-Apochromat
63×/1.4 oil DIC M27, item no. 420782-9900-000, Zeiss, Germany)
and applying a drop of immersion oil (Immersol 518F, Zeiss, Germany)
on the coverslip surface without 2D material. The 2D material plane
was then roughly focused by manually searching for the glass–air
interface with the 2D material visible using the embedded microscope
camera. At that stage, the built-in interface detection system of
the two-photon 3D printer can find the glass–air interface
with a resolution of less than 1 μm in the z-plane.
(Photonic Professional GT2, Nanoscribe, Germany) was used to generate
patterns in the 2D materials. The 2D materials were exposed in an
oil immersion configuration using a 63× objective (Plan-Apochromat
63×/1.4 oil DIC M27, item no. 420782-9900-000, Zeiss, Germany)
and applying a drop of immersion oil (Immersol 518F, Zeiss, Germany)
on the coverslip surface without 2D material. The 2D material plane
was then roughly focused by manually searching for the glass–air
interface with the 2D material visible using the embedded microscope
camera. At that stage, the built-in interface detection system of
the two-photon 3D printer can find the glass–air interface
with a resolution of less than 1 μm in the z-plane.
7
3D Printing of Biocompatible Microstructures
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3D polymeric structures were printed using a two-photon 3D printer (Photonic Professional GT2, Nanoscribe) with low fluorescence and the non-cytotoxic (according to ISO 10993-5/USP 87) Nanoscribe resin IP-Visio. The IP-Visio resin was applied at room temperature onto functionalized ITO-coated glass slides and exposed in immersion configuration using a 25x objective (Objective LCI Plan-Neofluar 25x/0.8 Imm Corr DIC M27, product number 420852-9972-000, Zeiss). The two-photon printer used a laser beam at 780 nm wavelength, a pulse duration of around 100 fs, and a repetition rate of 80 MHz. After printing, the samples were submerged in PGMEA for 20 min, then transferred into isopropanol for 5 min. To increase the degree of crosslinking, post-print curing via UV-driven radical generation was performed (3 min, 220–450 nm wavelength, 10 mW/cm2) using an OAI Model 30 UV Light Source. Next, the samples were transferred to DI water at 65 °C for 10 min to facilitate the desorption of unreacted species and solvents. Then, the samples were carefully dried, avoiding air blowing on top of the printed structures to prevent possible mechanical damage and delamination. Finally, the dried samples were transferred to a petri dish, sealed with parafilm, and stored at room temperature until cell seeding.
8
Hydrogel Structures via Nanoscale 3D Printing
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The hydrogel structures are printed by a commercial TPP system (Photonic Professional GT2, Nanoscribe GmbH) with the oil-immersion mode using a 63× objective lens. Before the printing, an adhesion layer of 500 nm of SU-8 is spin-coated on the glass cover slip and polymerized with UV light using SU-8 2000.5 which is diluted from SU-8 2010 with Cyclopentanone. Then the printing is performed on top of the adhesion layer with a scanning speed of 8 mm/s while the laser power is adjusted for the calibration process. The printed samples are then developed in IPA for 1 h followed by an equilibrium bath in water for another 1 h.
9
Microcube Fabrication by Two-Photon Lithography
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The microcubes
were fabricated by three-dimensional two-photon polymerization lithography
on a fused silica substrate. A commercial femtosecond laser-based
lithography system (Photonic Professional GT2, Nanoscribe) was used
with a negative-tone photoresist (IP-Dip2, Nanoscribe). A 63×
objective with NA = 1.4 was used to achieve a lateral resolution of
approximately 200 nm. Standard dip-in laser lithography (DiLL) mode
is applied in this work. The microcubes were designed using computer-aided
design (CAD) software, SolidWorks (Dassault Systems, France). The
CAD models were exported in the STL file format and then imported
into computer-aided manufacturing (CAM) software, DeScribe (Nanoscribe
GmbH, Germany), to generate the laser writing path code. The hatching
(the distance between adjacent lateral lines) and slicing (the distance
between vertical layers) distances were both 100 nm. The laser power
was set as 40% of the maximum laser power, and the writing speed was
set as 10 mm/s. After printing, the sample was placed on an aluminum
mount and immersed in propylene glycol monomethyl ether acetate (PGMEA;
Sigma-Aldrich) for 20 min and for 2 min in isopropanol. Finally, the
sample was dried in air by evaporation. To increase the fabrication
output, galvanometer mirror scanning mode was selected. To reduce
the stitching errors, the size of the scanning field was limited to
100 μm × 100 μm.
were fabricated by three-dimensional two-photon polymerization lithography
on a fused silica substrate. A commercial femtosecond laser-based
lithography system (Photonic Professional GT2, Nanoscribe) was used
with a negative-tone photoresist (IP-Dip2, Nanoscribe). A 63×
objective with NA = 1.4 was used to achieve a lateral resolution of
approximately 200 nm. Standard dip-in laser lithography (DiLL) mode
is applied in this work. The microcubes were designed using computer-aided
design (CAD) software, SolidWorks (Dassault Systems, France). The
CAD models were exported in the STL file format and then imported
into computer-aided manufacturing (CAM) software, DeScribe (Nanoscribe
GmbH, Germany), to generate the laser writing path code. The hatching
(the distance between adjacent lateral lines) and slicing (the distance
between vertical layers) distances were both 100 nm. The laser power
was set as 40% of the maximum laser power, and the writing speed was
set as 10 mm/s. After printing, the sample was placed on an aluminum
mount and immersed in propylene glycol monomethyl ether acetate (PGMEA;
Sigma-Aldrich) for 20 min and for 2 min in isopropanol. Finally, the
sample was dried in air by evaporation. To increase the fabrication
output, galvanometer mirror scanning mode was selected. To reduce
the stitching errors, the size of the scanning field was limited to
100 μm × 100 μm.
10
Microendoscope Resolution Estimation Protocol
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Samples for microendoscope resolution estimates were fabricated using a Nanoscribe Photonic Professional GT2 two-photon polymerization 3D printer. The samples were printed in IP-S resin (Nanoscribe GmbH), an inherently autofluorescent resin that enables high-precision 3D printing of microstructures. We printed two different samples [Fig. S6(b) in the Supplementary Material ]: a sparse structure with an axial resolution (sphere-to-sphere spacing) of and a fine structure with a lateral and axial resolution of for evaluating the image reconstruction. The printing parameters and development time were optimized for the high aspect ratios and small features of these structures.
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