Scanning electron microscopy (SEM) measurements were done on a Hitachi SU-70 Schottky field emission SEM using an acceleration voltage of 10.0 kV. Transmission electron microscopy (TEM) measurements were performed on a JEM 2100 LaB6 TEM using an acceleration voltage of 200 kV. Raman spectra were collected on a Horiba Jobin Yvon LabRAM Raman microscope (model: ARAMIS) with an excitation line of 532 nm. X-ray photoelectron spectroscopy (XPS) measurements were conducted on a high sensitivity Kratos AXIS 165 spectrometer. We measured the electrical properties of the devices using a Cascade probe station equipped with a Keithley-4200 SCS semiconductor parameter analyzer.
Axis 165 spectrometer
Manufactured by Shimadzu
The Axis 165 spectrometer is a laboratory instrument designed for the analysis and identification of chemical compounds. It utilizes X-ray photoelectron spectroscopy (XPS) technology to provide detailed information about the surface composition and electronic structure of materials. The Axis 165 spectrometer is capable of high-resolution measurements and can be used for a variety of applications in materials science, nanotechnology, and other related fields.
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Lab products found in correlation
6 protocols using axis 165 spectrometer
1
Comprehensive Material Characterization Techniques
2
Characterization of Electrode Surface Chemistry
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Raman measurements were carried out by a Horiba Jobin Yvon Labram Aramis using a 532 nm diode-pumped solid-state laser, attenuated to give ~900 μW power at the sample surface. Scanning electron microscopy (SEM) measurements were carried out by Hitachi SU-70 analytical SEM (Japan). Viscosity measurements were carried out using a CANNON-FENSKE viscometer. The surface chemistry of the electrodes after ALD coating was examined by XPS with a Kratos Axis 165 spectrometer. XPS data was collected using a monochromated Al Ka X-ray source (1486.7 eV). The working pressure of the chamber was lower than 6.6 × 10−9 Pa. All reported binding energy values were caLIBrated to the C 1s peak at 284.8 eV.
3
Characterization of Materials by X-Ray, Thermal, and Surface Analyses
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X-ray diffraction patterns were obtained on Bruker Smart 1000 (Bruker AXS Inc., USA) using CuKα radiation. The ACC/I2 was measured with the thermogravimetric analysis equipment (SDT Q600, TA Instruments) and heated in argon atmosphere with a heating rate of 10 °C min−1. The discharged sample was sealed by a plastic tape from exposure to air and moisture. SEM imaging was conducted using a Hitachi SU-70 field emission SEM. XPS analysis was measured using a Kratos Axis 165 spectrometer. Measurements were performed both before and after argon sputtering.
4
Characterization of Synthesized SWCNTs
5
Raman and XPS Analysis of SWCNTs
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The SWCNTs were precipitated
out from solutions and deposited on glass slides for Raman scattering
or on gold-coated silicon substrates for XPS measurements. XPS was
performed on a Kratos Axis 165 spectrometer at 25 and 175 °C
under ultrahigh vacuum (<1 × 10–8 Torr).
Raman spectra were measured on a LabRAM ARAMIS Raman microscope (Horiba
Scientific). The samples were excited with a He–Ne laser (632.8
nm) or a 532 nm laser at a power density of 0.014–0.14 mW μm–2. Each spectrum was obtained by averaging the data
collected from three different spots.
out from solutions and deposited on glass slides for Raman scattering
or on gold-coated silicon substrates for XPS measurements. XPS was
performed on a Kratos Axis 165 spectrometer at 25 and 175 °C
under ultrahigh vacuum (<1 × 10–8 Torr).
Raman spectra were measured on a LabRAM ARAMIS Raman microscope (Horiba
Scientific). The samples were excited with a He–Ne laser (632.8
nm) or a 532 nm laser at a power density of 0.014–0.14 mW μm–2. Each spectrum was obtained by averaging the data
collected from three different spots.
6
X-ray Photoelectron Spectroscopy Protocol
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X-ray photoelectron
spectroscopy (XPS) measurements were performed on a Kratos Axis 165
spectrometer with a monochromatic A1 Kα (1486.7 eV) X-ray source.
Peak fittings were performed with CasaXPS software, and a Shirley-type
background was applied to all spectra.
spectroscopy (XPS) measurements were performed on a Kratos Axis 165
spectrometer with a monochromatic A1 Kα (1486.7 eV) X-ray source.
Peak fittings were performed with CasaXPS software, and a Shirley-type
background was applied to all spectra.
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