following chemicals and substrates were
used in the fabrication of superhydrophobic Si nanowire (SH Si NW)
surfaces: acetone (99.5%, Sinopharm Chemical Reagent Co. Ltd, China);
ethanol (99.7%, Changshu Hong Sheng fine chemical Co. Ltd, China);
sulfuric acid (H2SO4, 98%, Sinopharm Chemical
Reagent Co. Ltd, China); hydrogen peroxide (H2O2, 30%, Shanghai Ling Feng Chemical Reagent Co. Ltd, China); silver
nitrate (AgNO3, 99.8%, Aladdin, China); hydrofluoric acid
(HF, 40%, Sinopharm Chemical Reagent Co. Ltd, China); Perfluoro-1,1,2,2-tetrahydrooctyltrichlorosilane
(fluorinated silane, 97%, Alfa Aesar); P type silicon wafers (Zhejiang
Li Jing Photoelectric Technology Co. Ltd, China).